Thin film transistor and photoelectric device thereof

    公开(公告)号:US10475826B2

    公开(公告)日:2019-11-12

    申请号:US15971086

    申请日:2018-05-04

    Abstract: A thin film transistor includes a gate electrode, a semiconductor layer, a gate dielectric layer, a first dielectric layer, a source electrode, and a drain electrode. The gate electrode is disposed on a substrate. The semiconductor layer is disposed on the substrate and overlaps with the gate electrode. The gate dielectric layer is disposed between the gate electrode and the semiconductor layer. The first dielectric layer is disposed on the substrate and covers two sides of the gate electrode or the semiconductor layer. The dielectric constant of the first dielectric layer is less than the dielectric constant of the gate dielectric layer, and the dielectric constant of the first dielectric layer is less than 4. The source electrode and the drain electrode are disposed on the substrate. The source electrode is separated from the drain electrode, and the source electrode and the drain electrode separately contact the semiconductor layer.

    Method of bonding and debonding substrate
    2.
    发明授权
    Method of bonding and debonding substrate 有权
    粘合和剥离基材的方法

    公开(公告)号:US09278512B2

    公开(公告)日:2016-03-08

    申请号:US14167350

    申请日:2014-01-29

    Abstract: A substrate bonding and debonding method includes the steps of: providing a substrate; forming a first silicone glue layer on a peel-off region of the substrate and a second silicone glue layer on a peripheral region of the substrate, in which the first and second silicone glue layers contain the same silicone main agent and silicone curing agent in a different ratio; adhering an opposite substrate to the first and second silicone glue layers; curing the first and second silicone glue layers to bond the substrate to the opposite substrate; and separating a portion of the substrate from the opposite substrate.

    Abstract translation: 基板接合和剥离方法包括以下步骤:提供基板; 在所述基板的剥离区域上形成第一硅胶层,以及在所述基板的周边区域上形成第二硅胶层,其中所述第一和第二硅胶层在其中包含相同的硅氧烷主剂和硅氧烷固化剂 不同比例 将相对的基板粘附到第一和第二硅胶层上; 固化第一和第二硅胶层以将基底粘合到相对的基底上; 以及将衬底的一部分与相对衬底分离。

Patent Agency Ranking