公开(公告)号：US20160141155A1

公开(公告)日：2016-05-19

申请号：US15002213

申请日：2016-01-20

Applicant: Advanced Energy Industries, Inc.

Inventor： Skip B. Larson ,  Kenneth E. Nauman, JR.

IPC: H01J37/32

CPC classification number: H01J37/32944 ,  H01J37/32064 ,  H01J37/3299

Abstract: This disclosure describes systems, methods, and apparatuses for extinguishing electrical arcs in a plasma processing chamber. Once an arc is detected, the steady state voltage provided to the plasma processing chamber can be reduced, and the current being provided to the chamber decays below a steady state value as the arc is extinguished. When the current falls to or below a current threshold, the voltage can be ramped back up bringing the voltage and current back to steady state values. This technique enables power to return to a steady state level faster than traditional arc mitigation techniques.

Abstract translation: 本公开描述了用于在等离子体处理室中熄灭电弧的系统，方法和装置。 一旦检测到电弧，可以减小提供给等离子体处理室的稳态电压，并且当电弧熄灭时，提供给室的电流衰减到低于稳态值。 当电流下降到或低于电流阈值时，可以将电压反斜坡，使电压和电流恢复到稳定状态值。 这种技术使电源能够比传统的电弧缓解技术更快地恢复到稳定状态。

公开(公告)号：US10373811B2

公开(公告)日：2019-08-06

申请号：US14809084

申请日：2015-07-24

Applicant: Advanced Energy Industries, Inc.

Inventor： David Christie ,  Skip B. Larson

IPC: C23C14/34 ,  H01J37/34

Abstract: A system and method for single magnetron sputtering are described. One example includes a system having a power supply, a plasma chamber enclosing a substrate, an anode, and a target for depositing a thin film material on the substrate. This example also has a datastore with uncoated anode characterization data and an anode sputtering adjustment system including an anode analysis component to generate a first health value. The first health value is indicative of whether the anode is coated with a dielectric material. This example also has an anode power controller to receive the first health value and provide an anode-energy-control signal to the pulse controller of the pulsed DC power supply to adjust a second anode sputtering energy relative to a first anode sputtering energy to eject at least a portion of the dielectric material from the anode.

公开(公告)号：US10217618B2

公开(公告)日：2019-02-26

申请号：US15002213

申请日：2016-01-20

Applicant: Advanced Energy Industries, Inc.

Inventor： Skip B. Larson ,  Kenneth E. Nauman, Jr.

IPC: H01L21/67 ,  H01J37/32

Abstract: This disclosure describes systems, methods, and apparatuses for extinguishing electrical arcs in a plasma processing chamber. Once an arc is detected, the steady state voltage provided to the plasma processing chamber can be reduced, and the current being provided to the chamber decays below a steady state value as the arc is extinguished. When the current falls to or below a current threshold, the voltage can be ramped back up bringing the voltage and current back to steady state values. This technique enables power to return to a steady state level faster than traditional arc mitigation techniques.

公开(公告)号：US20170022604A1

公开(公告)日：2017-01-26

申请号：US14809084

申请日：2015-07-24

Applicant: Advanced Energy Industries, Inc.

Inventor： David Christie ,  Skip B. Larson

IPC: C23C14/35 ,  H01J37/34

CPC classification number: H01J37/3476 ,  C23C14/3485 ,  C23C14/3492 ,  H01J37/3405 ,  H01J37/3438 ,  H01J37/3488

Abstract: A system and method for single magnetron sputtering are described. One example includes a system having a power supply, a plasma chamber enclosing a substrate, an anode, and a target for depositing a thin film material on the substrate. This example also has a datastore with uncoated anode characterization data and an anode sputtering adjustment system including an anode analysis component to generate a first health value. The first health value is indicative of whether the anode is coated with a dielectric material. This example also has an anode power controller to receive the first health value and provide an anode-energy-control signal to the pulse controller of the pulsed DC power supply to adjust a second anode sputtering energy relative to a first anode sputtering energy to eject at least a portion of the dielectric material from the anode.

Abstract translation: 描述了用于单磁控溅射的系统和方法。 一个实例包括具有电源的系统，包围衬底的等离子体室，阳极和用于在衬底上沉积薄膜材料的靶。 该示例还具有未涂覆的阳极表征数据的数据存储区和包括阳极分析组件以产生第一健康值的阳极溅射调整系统。 第一健康值表示阳极是否涂有电介质材料。 该示例还具有阳极功率控制器以接收第一健康值并且向脉冲DC电源的脉冲控制器提供阳极能量控制信号，以相对于第一阳极溅射能量调节第二阳极溅射能量以在 来自阳极的电介质材料的至少一部分。