公开(公告)号：US09023669B2

公开(公告)日：2015-05-05

申请号：US13186740

申请日：2011-07-20

申请人： Atsushi Hiramoto ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Yoshiyuki Fukumoto ,  Atsunori Terasaki

发明人： Atsushi Hiramoto ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Yoshiyuki Fukumoto ,  Atsunori Terasaki

IPC分类号： H01L21/3065 ,  B41J2/16

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2002/14467 ,  H01L21/30655

摘要： A processing method of a silicon substrate including forming a second opening in a bottom portion of a first opening using a patterning mask having a pattern opening by plasma reactive ion etching. The reactive ion etching is performed with a shield structure formed in or on the silicon substrate, the shield structure preventing inside of the first opening from being exposed to the plasma.

摘要翻译： 一种硅衬底的处理方法，包括使用具有通过等离子体反应离子蚀刻的图案开口的图案化掩模在第一开口的底部形成第二开口。 反应离子蚀刻通过形成在硅衬底中或之上的屏蔽结构进行，防止第一开口内部的屏蔽结构暴露于等离子体。

公开(公告)号：US08398212B2

公开(公告)日：2013-03-19

申请号：US12635948

申请日：2009-12-11

申请人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

发明人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

IPC分类号： B41J2/05

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1634

摘要： An ink jet head includes a Si substrate with a surface having a {100} orientation; a passage holding ink on the Si substrate; an ink discharge port which is communicatively connected to the passage and through which ink is ejected; and a supply port which extends through the Si substrate, which is communicatively connected to the passage, and which supplies ink to the passage. The supply port has walls having two {111} planes facing each other.

摘要翻译： 喷墨头包括具有{100}取向的表面的Si衬底; 在Si衬底上保持油墨的通道; 墨水排出口，其连通地连接到通道并通过其喷射墨水; 以及供应端口，其延伸穿过Si衬底，其通信地连接到通道，并且向通道供应墨水。 供应端口具有彼此面对的两个{111}平面的壁。

公开(公告)号：US20120028383A1

公开(公告)日：2012-02-02

申请号：US13186740

申请日：2011-07-20

申请人： Atsushi Hiramoto ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Yoshiyuki Fukumoto ,  Atsunori Terasaki

发明人： Atsushi Hiramoto ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Yoshiyuki Fukumoto ,  Atsunori Terasaki

IPC分类号： H01L21/3065

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2002/14467 ,  H01L21/30655

摘要： A processing method of a silicon substrate including forming a second opening in a bottom portion of a first opening using a patterning mask having a pattern opening by plasma reactive ion etching. The reactive ion etching is performed with a shield structure formed in or on the silicon substrate, the shield structure preventing inside of the first opening from being exposed to the plasma.

摘要翻译： 一种硅衬底的处理方法，包括使用具有通过等离子体反应离子蚀刻的图案开口的图案化掩模在第一开口的底部形成第二开口。 反应离子蚀刻通过形成在硅衬底中或之上的屏蔽结构进行，防止第一开口内部的屏蔽结构暴露于等离子体。

公开(公告)号：US20100156990A1

公开(公告)日：2010-06-24

申请号：US12629238

申请日：2009-12-02

申请人： Masafumi Morisue ,  Takumi Suzuki ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Atsushi Hiramoto

发明人： Masafumi Morisue ,  Takumi Suzuki ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Atsushi Hiramoto

IPC分类号： B41J2/14 ,  B23P17/00

CPC分类号： B41J2/1404 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  B41J2002/14467 ,  Y10T29/494

摘要： A liquid discharge head includes an Si substrate which is provided with an element for generating energy used in discharging a liquid and a liquid supply port which is provided to pass through the Si substrate from first surface to rear surface so as to supply a liquid to the element. A method of manufacturing the substrate includes: forming a plurality of concave portions on the rear surface of the Si substrate of which a plane orientation is {100}, the concave portions facing the first surface and aligned in rows along a direction the first surface; and forming a plurality of the supply ports by carrying out a crystal axis anisotropic etching on the Si substrate through the concave portions using an etching liquid of which an etching rate of the {100} plane of the Si substrate is slower than that of the {110} plane of the Si substrate.

摘要翻译： 液体排出头包括：Si基板，其设置有用于产生用于排出液体的能量的元件和液体供给口，所述液体供给口被设置成从第一表面到后表面穿过Si基板，从而将液体供应到 元件。 一种制造基板的方法包括：在Si基板的背面上形成多个凹部，其中平面取向为{100}，凹面朝向第一表面并且沿着<100>方向排成一列 第一表面 并且通过使用其中Si衬底的{100}面的蚀刻速率比{D“的{100}面的蚀刻速度慢的蚀刻液，通过凹部对Si衬底进行晶轴各向异性蚀刻来形成多个供给口， 110}面。

公开(公告)号：US08366951B2

公开(公告)日：2013-02-05

申请号：US12629238

申请日：2009-12-02

申请人： Masafumi Morisue ,  Takumi Suzuki ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Atsushi Hiramoto

发明人： Masafumi Morisue ,  Takumi Suzuki ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Atsushi Hiramoto

IPC分类号： G01D15/00

CPC分类号： B41J2/1404 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  B41J2002/14467 ,  Y10T29/494

摘要： A liquid discharge head includes an Si substrate which is provided with an element for generating energy used in discharging a liquid and a liquid supply port which is provided to pass through the Si substrate from a first surface to a rear surface so as to supply a liquid to the element. A method of manufacturing the substrate includes: forming a plurality of concave portions on the rear surface of the Si substrate of which a plane orientation is {100}, the concave portions facing the first surface and aligned in rows along a direction of the Si substrate; and forming a plurality of the liquid supply ports by carrying out a crystal axis anisotropic etching on the Si substrate through the concave portions using an etching liquid of which an etching rate of the {100} plane of the Si substrate is slower than that of the {110} plane of the Si substrate.

摘要翻译： 液体排出头包括：Si基板，其设置有用于产生用于排出液体的能量的元件;以及液体供给口，其被设置成从第一表面到后表面穿过Si基板，以便供应液体 到元素 制造基板的方法包括：在Si基板的后表面上形成多个凹部，其平面取向为{100}，所述凹部面向第一表面并沿着<100> Si衬底; 并且通过使用其中Si衬底的{100}面的蚀刻速率慢于所述Si衬底的蚀刻速率的蚀刻液，通过所述凹部对所述Si衬底进行晶轴各向异性蚀刻来形成多个所述液体供给口 {110}面的Si衬底。

公开(公告)号：US20100149260A1

公开(公告)日：2010-06-17

申请号：US12635948

申请日：2009-12-11

申请人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

发明人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

IPC分类号： B41J2/135 ,  G11B5/127

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1634

摘要： An ink jet head includes a Si substrate with a surface having a {100} orientation; a passage holding ink on the Si substrate; an ink discharge port which is communicatively connected to the passage and through which ink is ejected; and a supply port which extends through the Si substrate, which is communicatively connected to the passage, and which supplies ink to the passage. The supply port has walls having two {111} planes facing each other.

摘要翻译： 喷墨头包括具有{100}取向的表面的Si衬底; 在Si衬底上保持油墨的通道; 墨水排出口，其连通地连接到通道并通过其喷射墨水; 以及供应端口，其延伸穿过Si衬底，其通信地连接到通道，并且向通道供应墨水。 供应端口具有彼此面对的两个{111}平面的壁。

公开(公告)号：US08017307B2

公开(公告)日：2011-09-13

申请号：US10568341

申请日：2005-06-27

申请人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Hiroe Ishikura ,  Akihiko Okano

发明人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Hiroe Ishikura ,  Akihiko Okano

IPC分类号： G03F7/20

CPC分类号： B41J2/1603 ,  B41J2/1404 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  B41J2202/11 ,  G03F7/095 ,  Y10T29/49401

摘要： A method for manufacturing a minute structure comprises a step of forming an ionizing radiation decomposing type positive type resist layer including a methyl isopropenyl ketone as a first positive type photosensitive material layer, a step of forming an ionizing radiation decomposing type positive type resist layer including a photosensitive material of a copolymer as a second positive type photosensitive material layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer, and development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer to form a convex shape pattern.

摘要翻译： 微细结构体的制造方法包括形成电离辐射分解型正型抗蚀剂层的步骤，该电离辐射分解型正型抗蚀剂层包括甲基异丙烯基酮作为第一正型感光材料层，形成电离辐射分解型正型抗蚀剂层的步骤包括 作为通过第一正型感光材料层上的第二波长范围的电离辐射致敏的作为第二正型感光材料层的共聚物的感光材料，在上述第二正型感光材料层中形成所需图案的步骤 材料层和使用显影溶液的显影，然后，在上述第一正型感光材料层中形成所需图案以形成凸形图案的步骤。

公开(公告)号：US08419168B2

公开(公告)日：2013-04-16

申请号：US13218851

申请日：2011-08-26

申请人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Yoshiyuki Fukumoto ,  Masafumi Morisue

发明人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Yoshiyuki Fukumoto ,  Masafumi Morisue

IPC分类号： B41J2/04

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1645 ,  Y10T29/49401

摘要： Provided is a liquid ejection head including a substrate including a liquid supply port and an energy generating element, in which the liquid supply port has at least one groove shape formed in a wall surface thereof, the at least one groove shape extending from a rear surface, which is a surface opposite to a front surface on which the energy generating element is formed, toward the front surface.

摘要翻译： 本发明提供一种液体喷射头，其特征在于，包括：液体供给口和能量产生元件的基板，所述液体供给口和能量产生元件的壁面形成有至少一个槽形状，所述至少一个槽形状从后表面 ，其是形成有能量产生元件的正面的表面朝向前表面。

公开(公告)号：US08227043B2

公开(公告)日：2012-07-24

申请号：US10565658

申请日：2005-06-27

申请人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Etsuko Hino ,  Hiroe Ishikura ,  Akihiko Okano

发明人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Etsuko Hino ,  Hiroe Ishikura ,  Akihiko Okano

IPC分类号： B05D1/36 ,  B05D7/00

CPC分类号： G03F7/038 ,  B41J2/1603 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2002/14475 ,  Y10T29/49401

摘要： A method for manufacturing a liquid discharge head includes the steps of: forming a solid layer for forming a flow path on a substrate on which an energy generating element is arranged to generate energy that is used to discharge liquid; forming, on the substrate where the solid layer is mounted, a coating layer for coating the solid layer; forming a discharge port used to discharge a liquid, through a photolithographic process, in the coating layer deposited on the solid layer; and removing the solid layer to form a flow path that communicates with the energy element and the discharge port. A material used for the coating layer contains a cationically polymerizable chemical compound, a cationic photopolymerization initiator and an inhibitor of cationic photopolymerization, and a material of the solid layer that forms a boundary with a portion where the discharge port of the coating layer is formed contains a copolymer of methacrylic acid and methacrylate ester.

摘要翻译： 一种液体排出头的制造方法，其特征在于，包括以下步骤：在基板上形成固体层，所述基板上配置能量产生元件，以产生用于排出液体的能量; 在固体固体层的基板上形成用于涂覆固体层的涂层; 形成用于通过光刻工艺在沉积在固体层上的涂层中排出液体的排出口; 并且去除固体层以形成与能量元件和排出口连通的流路。 用于涂层的材料包含阳离子可聚合化合物，阳离子光聚合引发剂和阳离子光聚合抑制剂，并且与形成涂层的排出口的部分形成边界的固体层的材料包含 甲基丙烯酸和甲基丙烯酸酯的共聚物。

公开(公告)号：US20070099121A1

公开(公告)日：2007-05-03

申请号：US10576249

申请日：2005-06-27

申请人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Etsuko Hino ,  Hiroe Ishikura ,  Akihiko Okano

发明人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Etsuko Hino ,  Hiroe Ishikura ,  Akihiko Okano

IPC分类号： G03C5/00

CPC分类号： B41J2/1639 ,  B41J2/1603 ,  B41J2/1631 ,  B41J2002/14475 ,  G03F7/038

摘要： According to the present invention, a method for manufacturing a liquid discharge head includes the steps of depositing a solid layer for forming a flow path on a substrate on which an energy generating element is arranged to generate energy that is used to discharge liquid, forming, on the substrate where the solid layer is mounted, a coating layer for coating the solid layer, forming a discharge port used to discharge a liquid, through a photolithographic process, in the coating layer formed on the solid layer, and removing the solid layer to form a flow path that communicates with the energy element and the discharge port, whereby a material used for the coating layer contains a cationically polymerizable chemical compound, cationic photopolymerization initiator and a inhibitor of cationic photopolymerization, and whereby a material of the solid layer that forms a boundary with a portion where the discharge port of the coating layer is formed contains a copolymer of methacrylic anhydride and methacrylate ester.

摘要翻译： 根据本发明，一种液体排出头的制造方法包括以下步骤：在其上布置能量产生元件的基板上沉积形成流路的固体层，以产生用于排出液体的能量， 在固体层安装的基板上，涂布固体层的涂层，通过光刻工艺形成用于排出液体的排出口，在固体层上形成的涂层中去除固体层 形成与能量元件和排出口连通的流路，由此用于涂层的材料含有阳离子聚合化学化合物，阳离子光聚合引发剂和阳离子光聚合抑制剂，由此形成固体层的材料 与形成涂层的排出口的部分的边界包含甲基丙烯酸酐的共聚物 甲基丙烯酸酯和甲基丙烯酸酯。