Dense array of field emitters using vertical ballasting structures
    3.
    发明授权
    Dense array of field emitters using vertical ballasting structures 有权
    使用垂直压载结构的致密阵列的场发射器

    公开(公告)号:US08198106B2

    公开(公告)日:2012-06-12

    申请号:US12233859

    申请日:2008-09-19

    IPC分类号: H01L21/00

    CPC分类号: H01J1/3042 H01J2201/319

    摘要: A field emitter array structure is provided. The field emitter array structure includes a plurality of vertical un-gated transistor structures formed on a semiconductor substrate. The semiconductor substrate includes a plurality of vertical pillar structures to define said un-gated transistor structures. A plurality of emitter structures are formed on said vertical un-gated transistor structures. Each of said emitter structures is positioned in a ballasting fashion on one of said vertical un-gated transistor structures so as to allow said vertical ungated transistor structure to effectively provide high dynamic resistance with large saturation currents.

    摘要翻译: 提供场发射器阵列结构。 场发射极阵列结构包括形成在半导体衬底上的多个垂直未门控晶体管结构。 半导体衬底包括多个垂直柱结构,以限定所述未门控晶体管结构。 在所述垂直非门控晶体管结构上形成多个发射极结构。 所述发射极结构中的每一个以压载方式定位在所述垂直非门控晶体管结构之一上,以便允许所述垂直非门控晶体管结构有效地提供具有较大饱和电流的高动态电阻。