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公开(公告)号：US5663019A
公开(公告)日：1997-09-02
申请号：US930514
申请日：1992-11-10
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/00 , G03F9/00
CPC分类号： G03F7/0007 , G03F7/0035 , G02F1/133512 , G02F1/133516
摘要： A color filter is made easily and uniformly employing electrodeposition.A specific positive type photosensitive resin layer is formed on a transparent electrode formed on a transparent substrate and, then a step for exposing and developing to obtain a desired pattern and a step for forming a desired colored layer by electrodeposition are repeated without peeling of the resin layer.
摘要翻译： PCT No.PCT / JP92 / 00079 Sec。 371日期：1992年11月10日 102（e）日期1992年11月10日PCT提交1992年1月29日PCT公布。 出版物WO92 / 14172 日期：1992年8月20日使用电沉积轻松均匀地制作滤色片。 在形成在透明基板上的透明电极上形成特定的正型感光性树脂层，然后重复曝光和显影以获得所需图案的步骤和通过电沉积形成所需着色层的步骤，而不会剥离树脂 层。
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2.发明授权Process for plating a metallic deposit between functional pattern lines on a substrate 失效在基板上的功能图案线之间镀金属沉积物的工艺
公开(公告)号：US5213850A
公开(公告)日：1993-05-25
申请号：US759756
申请日：1991-09-12
CPC分类号： H05K3/184 , C23C18/1605 , C23C18/1879 , C23C18/1882 , C23C18/2066 , C23C18/285 , C23C18/30 , C23C18/36
摘要： Disclosed is a process for plating a metallic deposit between functional pattern lines on a substrate, comprising (a) forming a cured film containing a catalyst for electroless plating on the substrate, (b) forming functional pattern lines on said cured film, and (c) conducting electroless plating.
摘要翻译： 公开了一种在基板上的功能图案线之间镀金属沉积物的方法，包括（a）在基板上形成含有无电解电镀用催化剂的固化膜，（b）在所述固化膜上形成功能图案线，（c ）进行化学镀。
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公开(公告)号：US5186801A
公开(公告)日：1993-02-16
申请号：US749294
申请日：1991-08-23
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/00 , G03F7/16 , G09F9/30
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/0035 , G03F7/164
摘要： The present invention provides an improved process for forming a color filter for a color display. The process comprises:(a) forming a transparent electroconductive layer on a substrate,(b) forming a negative type photosensitive resin layer having a desired color by electrodeposition on the transparent electroconductive layer,(c) exposing the photosensitive resin layer to light through a negative mask having a desired pattern followed by developing to form a patterned color layer, and(d) effecting the steps (b) and (c) necessary times to form patterned layers having required colors.
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公开(公告)号：US4902592A
公开(公告)日：1990-02-20
申请号：US221043
申请日：1988-07-18
IPC分类号： B05D5/06 , G02B5/20 , G02F1/1335
CPC分类号： G02F1/133516
摘要： A process for preparing a color display comprising the following steps:(a) preparing an uncolored base plate comprising a base plate, an electroconductive layer formed on said base plate and a photosensitive resin layer formed thereon, said photosensitive resin layer being patterned by exposing to light through a mask and developing it to let a portion of the electroconductive layer to be colored appear,(b) forming a color layer by electrodeposition on the portion of the electroconductive layer to be colored,(c) transferring the color layer onto a transfer plate, and(d) further transferring and fixing the color layer onto a transparent substrate from the transfer plate,wherein if the color display is colored with more than one color, the processes (a) to (d) are repeated for the other colors, but once said uncolored base plate is formed, the processes (b) to (d) are repeated.
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公开(公告)号：US4853092A
公开(公告)日：1989-08-01
申请号：US186074
申请日：1988-04-25
IPC分类号： C25D13/00 , G02F1/1335 , G09F9/30
CPC分类号： G02F1/133516
摘要： The first embodiment of the present invention is a process for producing a multicolor display comprising the following steps (a) a transfer panel which has thereon electroconductive layers insulated with each other is immersed in an electrodeposition bath, in which a voltage is applied to one or more of said electroconductive layers to be colored with a same color to form the color layer thereon, (b) said step (a) is repeated with the other colors to form a multicolor layer, and (c) said multicolor layer is transferred onto a transparent substrate. The second embodiment of the present invention is an improved process of the first embodiment, wherein both the multicolor layer and the electroconductive layer are transferred onto the transparent substrate.
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公开(公告)号：US5181984A
公开(公告)日：1993-01-26
申请号：US773119
申请日：1991-10-08
CPC分类号： H05K3/281 , H05K2203/0152 , H05K2203/066 , H05K2203/135 , H05K3/0079 , Y10S430/136
摘要： The present invention provides a process for forming a solder mask on an electric circuit board without any defects. The process comprises forming an electric circuit on a substrate, coating a negative type photosensitive solder resist on the obtained electric circuit board, and then exposing to light through a negative film followed by developing, characterized in that the negative type photosensitive solder resist is electrodepositable and said coating of the solder resist is conducted by electrocoating the resist on an electroconductive transfer substrate which is different from the electric circuit board and then transferring the coated film onto the electric circuit board.
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公开(公告)号：US5213946A
公开(公告)日：1993-05-25
申请号：US716977
申请日：1991-06-18
IPC分类号： G03F7/039 , H01L21/027 , H01L21/30
CPC分类号： G03F7/039 , Y10S430/106
摘要： A novel positive type photosensitive resinous composition comprising a base resin having in at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: ##STR1## in which R.sub.1 and R.sub.2 are the same or different groups and each represents hydrogen atom, alkyl, acyl, phenyl, naphthyl, anthryl or benzyl group and R.sub.1 and R.sub.2, taken together with the carbon atom, may be an alicyclic ring, the composition further comprising a group containing an acid-decomposable bond, the content of said iminosulfonate group being 1.times.10.sup.-5 to 3.times.10.sup.-3 equivalent/g of the base resin. The present composition, when irradiated with radiation with 200 to 400 nm wavelength, can generate strong sulfonic acid groups, and is specifically useful as a photoresist for a circuit board, integrated circuit and the like.
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8.发明授权
公开(公告)号：US5175076A
公开(公告)日：1992-12-29
申请号：US805671
申请日：1991-12-17
IPC分类号： G03F7/033
CPC分类号： G03F7/033 , Y10S430/111 , Y10S430/12 , Y10S430/121
摘要： A water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises:(A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) and .alpha., .beta.-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha., .beta.-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components;(B) a basic nitrogen atom-containing compound;(C) an ethylenically unsaturated monomer; and(D) a photopolymerization initiator.
摘要翻译： PCT No.PCT / US87 / 02372 Sec。 371日期1990年7月12日 102（e）日期1990年7月12日PCT提交1987年9月22日PCT公布。 出版物WO88 / 02135 日本，1988年3月24日。适用于制造具有高耐水性油墨，高回弹性和优异形状稳定性的凸版印刷版的水显影感光性树脂板，其包含：（A）包含 （i）脂族共轭二烯单体（ii）和α，β-烯属不饱和羧酸和（iii）多官能乙烯基单体，任选具有（iv）单官能乙烯基单体，脂族共轭二烯单体（i） ，α，β-烯属不饱和羧酸（ii），多官能乙烯基单体（iii）和单官能乙烯基单体（iv）分别为约5至95摩尔％，约1至30摩尔％，约0.1 〜10摩尔％，0〜70摩尔％。 （B）含碱性氮原子的化合物; （C）烯属不饱和单体; 和（D）光聚合引发剂。
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9.发明授权Toner for electrostatic photography containing resin coated silica particles 失效含有树脂涂层二氧化硅颗粒的静电摄影用调色剂
公开(公告)号：US4288517A
公开(公告)日：1981-09-08
申请号：US149834
申请日：1980-05-14
CPC分类号： G03G9/10 , G03G9/08 , Y10S430/105
摘要： A toner composition for electrostatic photography which comprises (A) toner powder comprising a base resin and a coloring agent and having an average particle size of not more than 30 microns and (B) silica powder coated on its surface with the base resin of the toner powder.
摘要翻译： 一种用于静电摄影的调色剂组合物，其包含（A）包含基础树脂和着色剂并且具有不超过30微米的平均粒径的调色剂粉末和（B）在其表面上涂覆有调色剂的基础树脂的二氧化硅粉末 粉末。
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10.发明授权Positive type photosensitive resinous composition with 1,2 quinone diazide sulfonyl unit 失效具有1,2-醌二叠氮基磺酰基单元的正型感光性树脂组合物
公开(公告)号：US4999274A
公开(公告)日：1991-03-12
申请号：US255193
申请日：1988-10-27
申请人： Mamoru Seio , Kanji Nishijima , Katsukiyo Ishikawa
发明人： Mamoru Seio , Kanji Nishijima , Katsukiyo Ishikawa
CPC分类号： G03F7/0233
摘要： The invention provides a positive type photosensitive resinous composition comprising a resin obtained by the reaction of a polyepoxide compound, an aromatic or heterocyclic carboxylic acid bearing a phenolic hydroxyl group(s) and 1,2-quinondiazido sulfonic acid halide with the use of those three components in a defined proportion, which is useful for microfabrication photo-resist and photosensitive materials for use in lithographic plates because of excellent flexibility and adhesion to supporting substrates, when developed, non-exposed area are extremely resistive toward swelling.
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