Quartz glass doped with rare earth element and production thereof
    1.
    发明授权
    Quartz glass doped with rare earth element and production thereof 失效
    掺杂稀土元素的石英玻璃及其制备

    公开(公告)号:US5262365A

    公开(公告)日:1993-11-16

    申请号:US778062

    申请日:1991-12-05

    摘要: Rare earth element doped silica glass according to the invention is prepared by doping silica-based glass co-doped with a rare earth element and aluminum additionally with fluorine and has excellent physical properties including remarkable light emission characteristics and an excellent capability of being fused with other silica-based glass. Such doped silica glass provides high amplification gains and a wide wavelength bandwidth and therefore can be used as a material for manufacturing miniaturized optical devices. Particularly, since the manufacturing process adapted to produce rare earth element doped silica glass according to the invention does not involve crystallization that normally characterizes the type of doped silica glass under consideration, the obtained doped silica glass is transparent and totally free from air bubbles. As a method for manufacturing rare earth doped silica glass according to the invention combines means for producing articles made of porous glass and a solution impregnation method, it provides easy and effective means for manufacturing rare earth doped silica glass which is co-doped with both a rare earth element and aluminum and highly transparent and therefore can be used as a suitable material for active optical devices.

    摘要翻译: PCT No.PCT / JP91 / 00134 Sec。 371 1991年12月5日第 102(e)日期1991年12月5日PCT 1991年2月5日提交PCT公布。 公开号WO91 / 11401 1991年8月8日。根据本发明的稀土元素掺杂二氧化硅玻璃通过掺杂稀土元素和铝另外掺杂的二氧化硅基玻璃掺杂制备,并且具有优异的物理性能,包括显着的发光特性和 与其他二氧化硅基玻璃融合的优异能力。 这种掺杂的石英玻璃提供高的放大增益和宽的波长带宽,因此可以用作制造小型化光学器件的材料。 特别地,由于根据本发明的适用于生产稀土元素掺杂石英玻璃的制造方法不涉及通常表征所考虑的掺杂石英玻璃的类型的结晶,所获得的掺杂石英玻璃是透明的并且完全没有气泡。 作为根据本发明的稀土掺杂石英玻璃的制造方法,结合了用于制造由多孔玻璃制成的制品和溶液浸渍方法的装置,其提供了用于制造稀土掺杂石英玻璃的简单和有效的手段,其掺杂有 稀土元素和铝,并且高度透明,因此可以用作有源光学器件的合适材料。

    Dispersion compensating fiber
    2.
    发明授权
    Dispersion compensating fiber 失效
    色散补偿光纤

    公开(公告)号:US5799123A

    公开(公告)日:1998-08-25

    申请号:US732609

    申请日:1996-10-16

    IPC分类号: G02B6/02

    摘要: There is provided a dispersion compensating fiber comprising a center core in which a first dopant is doped substantially uniformly, an outer core provided at the outer periphery of the center core, in which the first dopant is doped so as to decrease gradually toward the outer periphery, and a clad provided at the outer periphery of the outer core, in which a second dopant is doped. The second dopant of the outer core is doped so that the viscosity on at least the outer periphery side of the outer core is substantially equal to the viscosity of the clad.

    摘要翻译: 提供了一种色散补偿光纤,其包括基本均匀地掺杂有第一掺杂剂的中心纤芯,设置在中心纤芯的外周的外芯,其中第一掺杂剂被掺杂以朝向外周逐渐减小 以及设置在外芯的外周的包层,其中掺杂有第二掺杂剂。 外核的第二掺杂剂被掺杂,使得至少外芯的外周侧上的粘度基本上等于包层的粘度。

    Membrane for use in X-ray mask and method for preparing the same
    3.
    发明授权
    Membrane for use in X-ray mask and method for preparing the same 失效
    用于X射线掩模的膜及其制备方法

    公开(公告)号:US4940851A

    公开(公告)日:1990-07-10

    申请号:US111996

    申请日:1987-10-21

    CPC分类号: G03F1/22

    摘要: A membrane for use in an X-ray mask composed of a compound comprising at least three kinds of elements of boron (B), silicon (Si) and nitrogen (N) in which the content of silicon in the compound is at least 15 atomic percent, but less than 100 atomic percent, and the atomic ratio of Si/(B+Si) in the compound is at least 0.2, but less than one. The membrane is synthesized from source gases including at least the foregoing three kinds of elements by chemical reaction under such conditions that the ratio of nitrogen to boron plus silicon is at least one in the source gases and thereby depositing a film of the compound onto a substrate. Since the membrane thus prepared has a high transmittance in the visible region and X-ray and their residual stress can be readily controlled by adjusting the conditions for the formation of the membrane, it is suitable for the preparation of X-ray masks.

    摘要翻译: 一种用于由包含硼(B),硅(Si)和氮(N))的至少三种元素的化合物构成的X射线掩模的膜,其中化合物中的硅含量为至少15原子 百分比但小于100原子%,化合物中Si /(B + Si)的原子比为至少0.2,但小于1。 在源气体中氮与硼与硅的比例至少为1的条件下,通过化学反应在至少包含上述3种元素的源气体中合成膜,由此将化合物的膜沉积在基材上 。 由于如此制备的膜在可见光区域具有高透射率,并且通过调节形成膜的条件可以容易地控制X射线及其残余应力,因此适用于制备X射线掩模。