公开(公告)号：US4617192A

公开(公告)日：1986-10-14

申请号：US707173

申请日：1985-02-28

申请人： Aland K. Chin ,  Shobha Singh ,  LeGrand G. V. Uitert ,  George J. Zydzik

发明人： Aland K. Chin ,  Shobha Singh ,  LeGrand G. V. Uitert ,  George J. Zydzik

IPC分类号： H01L21/316 ,  H01L31/0216 ,  H01L31/105 ,  H01L33/00 ,  H01L33/44 ,  B05D3/06 ,  B05D5/06

CPC分类号： H01L33/44 ,  H01L21/02178 ,  H01L21/02269 ,  H01L21/31616 ,  H01L31/02161 ,  H01L31/105 ,  H01L33/0025

摘要： The invention is a process for putting down coatings of aluminum oxide on optical surfaces using electron-beam deposition in an oxygen-enriched atmosphere. Particularly good results are obtained when oxygen is flowed over or directed at the surface to be coated. Such coatings have extremely low losses compared to many conventional optical coatings and are particularly useful for anti-reflection coatings on various devices. In particular, for optical devices with indium phosphide surfaces operating at wavelengths near 1.3 .mu.m, the optical properties of aluminum oxide coatings are near optimum for anti-reflection coatings and the thermal expansion characteristics are a close match to those of indium phosphide.

摘要翻译： 本发明是在富氧气氛中使用电子束沉积将氧化铝涂层放在光学表面上的方法。 当氧气流过或指向待涂覆的表面时，可获得特别好的结果。 与许多常规光学涂层相比，这种涂层具有极低的损耗，并且特别适用于各种装置上的抗反射涂层。 特别地，对于磷化铟表面在1.3μm附近工作的光学器件，氧化铝涂层的光学性能对于抗反射涂层来说是接近最佳的，并且热膨胀特性与磷化铟接近。