摘要:
The present invention discloses a method for the production of sub-micron structures on magnetic materials using electron beam lithography. A subtractive process is disclosed wherein a portion of a magnetic material layer is removed from the substrate using conventional lithography, and the remaining portion of the magnetic material layer is patterned by e-beam lithography. A additive process is also disclosed wherein a thin magnetic seed layer is deposited on the substrate, a portion of which is removed by conventional lithography and replaced with a non-magnetic conducting layer. The remaining portion of magnetic seed layer is patterned by e-beam lithography and the final magnetic structure produced by electroplating.
摘要:
One embodiment of the present invention provides a slider including a slider body, a magnetic reader disposed on the slider body, a magnetic writer disposed on the slider body, and an electronic lapping guide disposed on the slider body. The slider also includes a first row of contact pads disposed on the slider body and coupled to the magnetic reader and the magnetic writer and a second row of contact pads disposed on the slider body and coupled to the electronic lapping guide. The electronic lapping guide may be electrically isolated from the magnetic reader and magnetic writer.
摘要:
One embodiment of the present invention provides a slider including a slider body, a magnetic reader disposed on the slider body, a magnetic writer disposed on the slider body, and an electronic lapping guide disposed on the slider body. The slider also includes a first row of contact pads disposed on the slider body and coupled to the magnetic reader and the magnetic writer and a second row of contact pads disposed on the slider body and coupled to the electronic lapping guide. The electronic lapping guide may be electrically isolated from the magnetic reader and magnetic writer.