Junction-isolated blocking voltage structures with integrated protection structures
    1.
    发明授权
    Junction-isolated blocking voltage structures with integrated protection structures 有权
    具有集成保护结构的隔离隔离电压结构

    公开(公告)号:US09356011B2

    公开(公告)日:2016-05-31

    申请号:US14446205

    申请日:2014-07-29

    Abstract: Junction-isolated blocking voltage devices and methods of forming the same are provided. In certain implementations, a blocking voltage device includes an anode terminal electrically connected to a first p-well, a cathode terminal electrically connected to a first n-well, a ground terminal electrically connected to a second p-well, and an n-type isolation layer for isolating the first p-well from a p-type substrate. The first p-well and the first n-well operate as a blocking diode. The blocking voltage device further includes a PNPN silicon controlled rectifier (SCR) associated with a P+ region formed in the first n-well, the first n-well, the first p-well, and an N+ region formed in the first p-well. Additionally, the blocking voltage device further includes an NPNPN bidirectional SCR associated with an N+ region formed in the first p-well, the first p-well, the n-type isolation layer, the second p-well, and an N+ region formed in the second p-well.

    Abstract translation: 提供了隔离隔离电压装置及其形成方法。 在某些实施方案中,阻断电压装置包括电连接到第一p阱的阳极端子,电连接到第一n阱的阴极端子,电连接到第二p阱的接地端子,以及n型 用于将第一p阱与p型衬底隔离的隔离层。 第一个p阱和第一个n阱作为阻塞二极管工作。 阻断电压装置还包括与形成在第一n阱,第一n阱,第一p阱以及形成在第一p阱中的N +区相关的PN +可控硅整流器(SCR) 。 另外,阻断电压装置还包括与形成在第一p阱,第一p阱,n型隔离层,第二p阱以及形成在第一p阱中的N +区域相关联的N +区域的NPNPN双向SCR 第二个p井。

    JUNCTION-ISOLATED BLOCKING VOLTAGE STRUCTURES WITH INTEGRATED PROTECTION STRUCTURES
    2.
    发明申请
    JUNCTION-ISOLATED BLOCKING VOLTAGE STRUCTURES WITH INTEGRATED PROTECTION STRUCTURES 有权
    具有集成保护结构的隔断隔离电压结构

    公开(公告)号:US20140332843A1

    公开(公告)日:2014-11-13

    申请号:US14446205

    申请日:2014-07-29

    Abstract: Junction-isolated blocking voltage devices and methods of forming the same are provided. In certain implementations, a blocking voltage device includes an anode terminal electrically connected to a first p-well, a cathode terminal electrically connected to a first n-well, a ground terminal electrically connected to a second p-well, and an n-type isolation layer for isolating the first p-well from a p-type substrate. The first p-well and the first n-well operate as a blocking diode. The blocking voltage device further includes a PNPN silicon controlled rectifier (SCR) associated with a P+ region formed in the first n-well, the first n-well, the first p-well, and an N+ region formed in the first p-well. Additionally, the blocking voltage device further includes an NPNPN bidirectional SCR associated with an N+ region formed in the first p-well, the first p-well, the n-type isolation layer, the second p-well, and an N+ region formed in the second p-well.

    Abstract translation: 提供了隔离隔离电压装置及其形成方法。 在某些实施方案中,阻断电压装置包括电连接到第一p阱的阳极端子,电连接到第一n阱的阴极端子,电连接到第二p阱的接地端子,以及n型 用于将第一p阱与p型衬底隔离的隔离层。 第一个p阱和第一个n阱作为阻塞二极管工作。 阻断电压装置还包括与形成在第一n阱,第一n阱,第一p阱以及形成在第一p阱中的N +区相关的PN +可控硅整流器(SCR) 。 另外,阻断电压装置还包括与形成在第一p阱,第一p阱,n型隔离层,第二p阱以及形成在第一p阱中的N +区域相关联的N +区域的NPNPN双向SCR 第二个p井。

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