公开(公告)号：US06619044B2

公开(公告)日：2003-09-16

申请号：US10206731

申请日：2002-07-26

申请人： Andrew W. Batchelor ,  Ben Banney ,  David McDonald ,  Tilak T. Chandratilleke

发明人： Andrew W. Batchelor ,  Ben Banney ,  David McDonald ,  Tilak T. Chandratilleke

IPC分类号： F25B2102

CPC分类号： F28F3/02 ,  F28F1/045 ,  F28F3/12 ,  F28F2260/02

摘要： A heat exchanger 17 for an electronic heat pump 11 includes a thermally conductive base plate 18 having first and second surfaces, the first surface being flat and adapted to make intimate surface contact with a surface of the electronic heat pump and the second surface being obverse to the first surface and supporting an array of thermally conductive fins 21. The adjacent fins 21 define there between a plurality of micro channels.

公开(公告)号：US06446442B1

公开(公告)日：2002-09-10

申请号：US09857668

申请日：2001-07-31

申请人： Andrew W. Batchelor ,  Ben Banney ,  David McDonald ,  Tilak T. Chandratilleke

发明人： Andrew W. Batchelor ,  Ben Banney ,  David McDonald ,  Tilak T. Chandratilleke

IPC分类号： F25B2102

CPC分类号： F25B21/02 ,  F25B25/00 ,  F25B2500/01

摘要： A heat exchanger 17 for an electronic heat pump 11 includes a thermally conductive base plate 18 having first and second surfaces, the first surface being flat and adapted to make intimate surface contact with a surface of the electronic heat pump and the second surface being obverse to the first surface and supporting an array of thermally conductive fins 21. The adjacent fins 21 define there between a plurality of micro channels.

公开(公告)号：US08698999B2

公开(公告)日：2014-04-15

申请号：US13041989

申请日：2011-03-07

申请人： Dirk Heinrich Ehm ,  Timo Laufer ,  Ben Banney ,  Jens Kugler ,  Ulrich Nieken ,  Franz Keller

发明人： Dirk Heinrich Ehm ,  Timo Laufer ,  Ben Banney ,  Jens Kugler ,  Ulrich Nieken ,  Franz Keller

IPC分类号： B60R1/06 ,  G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70933 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70983

摘要： In EUV lithography apparatuses (10), it is proposed, in order to lengthen the lifetime of contamination-sensitive components, to arrange them in a protection module. The protection module comprises a housing (23-29) having at least one opening (37-47), in which at least one component (13a, 13b, 15, 16, 18, 19) is arranged and at which one or more gas feeds (30-36) are provided in order to introduce a gas flow into the housing (23-29), which emerges through the at least one opening (37-47). In order to effectively prevent contaminating substances from penetrating into the protection module, a light source (48-56) is arranged at the at least one opening (37-47), which light source illuminates the opening (37-47) with one or more wavelengths by which the contaminating substances can be dissociated before they penetrate through the opening (37-47).

摘要翻译： 在EUV光刻设备（10）中，为了延长污染敏感元件的寿命，提出将它们安置在保护模块中。 保护模块包括具有至少一个开口（37-47）的壳体（23-29），其中布置有至少一个部件（13a，13b，15,16,18,19），并且一个或多个气体 提供进料（30-36）以便将气流引入通过至少一个开口（37-47）出现的壳体（23-29）中。 为了有效地防止污染物质渗透到保护模块中，光源（48-56）布置在至少一个开口（37-47）处，该光源照射开口（37-47），其中一个或 污染物质在穿透开口（37-47）之前可以分解的更多波长。