公开(公告)号：US6081381A

公开(公告)日：2000-06-27

申请号：US178783

申请日：1998-10-26

申请人： Andrey Shalapenok ,  Ihar Hurevich ,  Dimitri Velikov ,  James Ritter ,  Alexander Shkolnik

发明人： Andrey Shalapenok ,  Ihar Hurevich ,  Dimitri Velikov ,  James Ritter ,  Alexander Shkolnik

IPC分类号： G02B26/06 ,  G02B27/48 ,  G02B27/10

CPC分类号： G02B27/48 ,  G02B26/06

摘要： A method and apparatus for elimination of speckle pattern in optical system by reducing coherence. The invention is based on the use of a rotating microlens array having a rotational speed chosen with reference to laser parameter. For a continuous laser this relationship consists in that the exposure time is sufficient for overlapping at least 10.sup.4 spot sizes of the speckle. For a pulse laser, the laser pulse time should be sufficient for shifting the speckle spot at least by the magnitude of its diameter. Several embodiments with modified coherence reduction units are available. One modified embodiment describes a rotating inclined plate which enhances coherence reduction by scanning the over the surface of the diffuser. Another embodiment describes the use of an optical conical rod with total internal reflection for creation of a plurality of non-coherent light sources.

摘要翻译： 一种减少相干性消除光学系统中散斑图案的方法和装置。 本发明基于使用具有参考激光参数选择的旋转速度的旋转微透镜阵列。 对于连续激光，这种关系在于曝光时间足以重叠斑点的至少104个斑点大小。 对于脉冲激光器，激光脉冲时间应足以使散斑至少等于其直径的大小。 具有修改的相干减少单元的几个实施例是可用的。 一个修改的实施例描述了一种旋转的倾斜板，其通过扫描扩散器的表面来增强相干性降低。 另一实施例描述了使用具有全内反射的光学圆锥形棒来产生多个非相干光源。

公开(公告)号：US06407870B1

公开(公告)日：2002-06-18

申请号：US09429775

申请日：1999-10-28

申请人： Ihar Hurevich ,  Dimitri Velikov ,  James Ritter ,  Andrey Shalapenok ,  Alexander Shkolnik

发明人： Ihar Hurevich ,  Dimitri Velikov ,  James Ritter ,  Andrey Shalapenok ,  Alexander Shkolnik

IPC分类号： G02B1308

CPC分类号： G02B19/0057 ,  G02B19/0014 ,  G02B27/09 ,  G02B27/0961 ,  G02B27/0966

摘要： An optical system comprising a first array of individual beam shaping elements and a second array of beam shaping elements placed between a light source, e.g., a linear array of individual laser diodes and a reshaped beam receiver, e.g., an optical fiber cable. The inhomogeneous beams emitted from the laser diodes are passed in sequence through the first and second stages so that the first stage reshaped the cross section of the beam, e.g., in the fast-axis direction and the second stage reshapes the cross section of the beam, e.g., in the slow-axis direction. As a result, the output beams of the system may have a cross section reshaped to any desired configuration, e.g., suitable for inputting into the optical fiber cable and having divergences individually adjusted in mutually perpendicular directions.

摘要翻译： 一种光学系统，包括单独的光束整形元件的第一阵列和放置在光源（例如单个激光二极管的线性阵列）和重新成形的光束接收器（例如光纤电缆）之间的光束整形元件的第二阵列。 从激光二极管发射的不均匀光束依次通过第一和第二级，使得第一级重新形成光束的横截面，例如在快轴方向上，并且第二阶段重塑光束的横截面 ，例如，在慢轴方向。 结果，系统的输出光束可以具有重新成形为任何所需配置的横截面，例如适于输入到光纤电缆中并具有在相互垂直的方向上分别调节的发散。

公开(公告)号：US06250250B1

公开(公告)日：2001-06-26

申请号：US09272646

申请日：1999-03-18

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： C23C1600

CPC分类号： H01J37/32009 ,  H01J37/32568

摘要： A multiple-cell plasma source consists of a pair of perforated plate-like cathodes and a perforated plate-like anode between the both cathode plates. Perforations in all three plates are coaxial and form a plurality of cells in which a Penning discharge plasma is generated due to the passage of axial components of the magnetic field through the individual cells. Since in all cells the plasma flow components are generated and work independently, there are no limitations for an increase in the surface area of the upper cathode plate, which has plasma emitting holes, so that the plasma source can treat objects of a large surface area. The plasma source of the invention has various means for controlling and adjusting the plasma pattern, distribution, parameters, and shape.

摘要翻译： 多单元等离子体源由一对多孔板状阴极和两个阴极板之间的多孔板状阳极组成。 所有三个板中的穿孔是同轴的并且形成多个单元，其中由于磁场的轴向分量通过单个单元而产生Penning放电等离子体。 由于在所有的电池中都产生等离子体流动成分并独立工作，所以对于具有等离子体发射孔的上部阴极板的表面积的增加没有限制，使得等离子体源可以处理大面积的物体 。 本发明的等离子体源具有用于控制和调整等离子体图案，分布，参数和形状的各种装置。

公开(公告)号：US06242749B1

公开(公告)日：2001-06-05

申请号：US09240469

申请日：1999-01-30

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： H01J2702

CPC分类号： H01J37/08 ,  H01J27/14

摘要： The invention provides a multiple-cell ion-beam source in which magnetic poles of all adjacent cells have alternating polarities, i.e., the cells arranged in a single row from the center to the periphery of the cathode plate have polarities in the order of N-S-N-S-N . . . , etc. As a result, the direction of magnetic lines of forces in the aforementioned rows alternates, and therefore the magnetic flux is not accumulated towards the center. This means that the source of such a construction does not have dimensional limitations and ensures uniform distribution of the ion-beam current density over the entire surface of the object. Intensity of the magnetic field for each individual cell can be controlled individually. This allows adjustment in the distribution of the ion-beam current density over the surface of the object.

摘要翻译： 本发明提供一种多单元离子束源，其中所有相邻单元的磁极具有交替极性，即，从阴极板的中心到周边排列成单列的单元具有N-S-N-S-N的顺序的极性。 。 。 等等。结果，上述行中的磁力线的方向交替，因此磁通量不向中心累积。 这意味着这种结构的源不具有尺寸限制并且确保离子束电流密度在物体的整个表面上的均匀分布。 可以单独控制每个单个电池的磁场强度。 这允许调整离子束电流密度在物体表面上的分布。

公开(公告)号：US6037717A

公开(公告)日：2000-03-14

申请号：US225159

申请日：1999-01-04

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： H01J27/08 ,  H01J37/08

CPC分类号： H01J27/143 ,  H01J2237/08

摘要： A cold-cathode ion source with a closed-loop ion-emitting slit which is provided with means for generating a cyclically-variable, e.g., alternating or pulsating electric or magnetic field in an anode-cathode space. These means may be made in the form of an alternating-voltage generator which generates alternating voltage on one of the cathode parts that form the ion-emitting slit, whereas the other slit-forming part is grounded. The alternating voltage deviates the ion beam in the slit with the same frequency of the alternating voltage. In accordance with another embodiment, the aforementioned means may be an electromagnetic coil which generates a magnetic field which passes through the ion-emitting slit, thus acting on the condition of the spatial-charge formation and, hence, on concentration of ions in the ion beam. The cold-cathode ion source may be of any type, i.e., with the ion beam emitted in the direction perpendicular to the direction of drift of electrons in the ion-emitting slit or with the direction of emission of the beam which coincides with the direction of electron drift.

摘要翻译： 具有闭环离子发射狭缝的冷阴极离子源，其设置有用于在阳极 - 阴极空间中产生可循环变化的例如交变或脉动电场或磁场的装置。 这些装置可以以交流电压发生器的形式制成，其在形成离子发射狭缝的阴极部分之一上产生交流电压，而另一个狭缝形成部分接地。 交变电压以相同的交流电压频率使狭缝中的离子束偏离。 根据另一实施例，上述装置可以是产生穿过离子发射狭缝的磁场的电磁线圈，因此作用于空间电荷形成的条件，并因此作用于离子的离子浓度 光束。 冷阴极离子源可以是任何类型的，即离子束沿垂直于离子发射狭缝中的电子漂移方向的方向发射，或者与辐射方向一致的方向发射 的电子漂移。

公开(公告)号：US06236163B1

公开(公告)日：2001-05-22

申请号：US09420615

申请日：1999-10-18

申请人： Yuri Maishev ,  James Ritter ,  Yuri Terentiev ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Yuri Terentiev ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： H01J724

CPC分类号： H01J27/143 ,  H01J37/08 ,  H01J2237/0825

摘要： A multiple-beam ion-beam assembly consisting of two or more concentrically arranged ring-shaped ion-beam sources having ion-beam slits that emit a plurality of ion beams which overlap on the surface being treated and thus ensure uniformity in distribution of ion currents on the treated surface. Since the ion-beam assembly consists of a plurality of individual source, uniform treatment can be performed on a large surface area. Several embodiments of the invention cover the systems with individual sources adjustable with respect to one another, with an oblique angle of incidence of beams emitted from individual source, and with combination of oblique angles and adjustable sources.

摘要翻译： 由具有离子束狭缝的两个或更多个同心布置的环形离子束源组成的多光束离子束组件，其发射在被处理的表面上重叠的多个离子束，从而确保离子电流的分布均匀 在被处理的表面上。 由于离子束组件由多个单独的源组成，所以可以在大的表面积上进行均匀的处理。 本发明的几个实施例覆盖具有相对于彼此可调节的各个源的系统，具有从各个源发射的光束的倾斜入射角以及倾斜角度和可调节源的组合。

公开(公告)号：US06214183B1

公开(公告)日：2001-04-10

申请号：US09240468

申请日：1999-01-30

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： C23C1434

CPC分类号： C23C14/3442 ,  C23C14/46 ,  H01J37/3053 ,  H01J37/3408

摘要： A combined ion-source and sputtering magnetron apparatus of the invention comprises a vacuum working chamber that contains a sputtering magnetron, an object to be treated fixed inside the housing of the chamber, and an ion-beam source installed within the working chamber between the object and the sputtering magnetron. In a preferred embodiment, the ion source is a cold-cathode ion source with a closed loop ion-emitting slit and drift of electrons in crossed electric and magnetic fields. The ion source emits the ion beam in the radial inward or outward direction onto the surface of the magnetron target at an oblique angle to the target surface. The bombardment of the target surface with the ion beam generates a large amount of sputtered particles. In addition, the ion bombardment forms a large amount of secondary electrons which are accelerated in the direction away from the target and are held in the crossed electric and magnetic fields of the magnetron target. These electrons ionize molecules of a working gas and forms a plasma. Ions are extracted from the plasma towards the target and sputter its material. This process is maintained in a steady mode. The apparatus is shown in various embodiments including a conveyor treatment.

摘要翻译： 本发明的组合离子源和溅射磁控管装置包括真空工作室，其包含溅射磁控管，待处理物体固定在腔室的壳体内部，以及安装在工件室内的离子束源 和溅射磁控管。 在优选实施例中，离子源是具有闭环离子发射狭缝的冷阴极离子源和交叉电场和磁场中的电子漂移。 离子源以径向向内或向外的方向将离子束以与目标表面成倾斜角度的方式发射到磁控管靶的表面上。 用离子束轰击目标表面产生大量的溅射颗粒。 此外，离子轰击形成大量的二次电子，其在远离靶的方向上加速并保持在磁控管靶的交叉电场和磁场中。 这些电子使工作气体的分子离子化并形成等离子体。 将离子从等离子体中提取到靶并溅射其材料。 该过程保持在稳定模式。 该装置在包括输送机处理的各种实施例中示出。

公开(公告)号：US06246059B1

公开(公告)日：2001-06-12

申请号：US09263058

申请日：1999-03-06

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： H01J2702

CPC分类号： H01J27/022

摘要： A cold-cathode type ion-beam source with a closed-loop ion-emitting slit and electrons drifting in crosses electric and magnetic fields is characterized by the absence of a metal anode which is replaced by a pair of positively charged bodies, such as concentric rings of a conductive material which are located inside a hollow housing of the ion source and are connected to a source of a positive potential. The ion-emitting slit is located between these rings in an upstream position in the direction of propagation of the ion beam. Replacement of a metallic anode with an anodic plasma, i.e., with a “virtual anode”, which is formed by a Penning-type discharge, descreases contamination of the ion beam by products of erosion of a metallic anode and increases the ion beam current, which results in more effective ionization of the workout gas.

摘要翻译： 具有闭环离子发射狭缝的冷阴极型离子束源和跨越电场和磁场漂移的电子的特征在于没有金属阳极被一对带正电荷的物体所取代，例如同心 导电材料的环位于离子源的中空壳体内并且连接到正电位的源。 离子发射狭缝位于这些环之间的离子束传播方向的上游位置。 用阳极等离子体（即，通过Penning型放电形成的“虚拟阳极”）来替换金属阳极，通过金属阳极的侵蚀产物降低离子束的污染并增加离子束电流， 这导致锻炼气体的更有效的电离。

公开(公告)号：US06238526B1

公开(公告)日：2001-05-29

申请号：US09249681

申请日：1999-02-14

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： C23C1400

CPC分类号： H01J37/3178 ,  C23C14/46 ,  H01J27/20 ,  H01J2237/3146

摘要： The invention provides a sputtering system which consists of an ion beam and a target of a sputterable material. A distinguishing feature of the system of the invention is that the sputtering target forms a guide channel for an ion beam and sputtered particles, so that a portion of the ions collides with the walls of the target inside a closed volume of the target and forms neutral sputterable particles impinging the object. The other part of the ions goes directly to the object and participates in an ion-assisted overcoating. Thus, the special form of the target improves efficiency of sputtering, prevents scattering and the loss of the sputterable material. The system can be realized in various embodiments. One of the embodiments provides a multiple-cell system in which each cell has an individual ion-emitting slit formed by the end of a cathode rod of one cathode plate and the opening in the second cathode plate. Tubular or plate-like channeling targets are connected to the ion slits without any gaps in the form of a geometrical extensions of the individual ion-emitting slits. Another embodiment allows adjustment in the position of the rods with respect to the targets.

摘要翻译： 本发明提供一种由离子束和可溅射材料的靶组成的溅射系统。 本发明的系统的一个突出特征在于，溅射靶形成用于离子束和溅射颗粒的引导通道，使得一部分离子在靶的封闭体积内与靶的壁碰撞并形成中性 撞击物体的可溅射颗粒。 离子的另一部分直接进入物体并参与离子辅助涂层。 因此，目标的特殊形式提高溅射效率，防止溅射和损失可溅射材料。 该系统可以在各种实施例中实现。 其中一个实施例提供了一种多单元系统，其中每个单元具有由一个阴极板的阴极杆的端部和第二个阴极板中的开口形成的单独的离子发射狭缝。 管状或板状沟道靶连接到离子狭缝，而没有各个离子发射狭缝的几何延伸形式的任何间隙。 另一个实施例允许调节棒相对于靶的位置。

公开(公告)号：US20090054876A1

公开(公告)日：2009-02-26

申请号：US11895079

申请日：2007-08-24

申请人： German Borodulin ,  Alexander Shkolnik

发明人： German Borodulin ,  Alexander Shkolnik

IPC分类号： A61M27/00

CPC分类号： A61M25/0017 ,  A61M25/002 ,  A61M25/0111

摘要： A catheter assembly suitable for intermittent catheterization comprising a cylindrical casing composed of two telescopically moveable parts one of which is connectable to and moveable with a piston which is rigidly connected to a urinary catheter. The interior of the cylindrical casing is filled with a lubricating, anesthetic, antiseptic liquid, or the like, which during catheterization is injected into the urethra and urinary bladder through the catheter under the effect of movement of the piston simultaneously with the insertion of the catheter into the urethra. The device is provided with an anti-infective cap which is inserted into the first third of the urethra and is used as a guide for inserting the catheter into the urethra without physical contact with the part if the urethra which is a harbor of infections.

摘要翻译： 适于间歇导管的导管组件包括由两个可伸缩运动部件组成的圆柱形壳体，其中一个可连接的部件可连接到刚性连接到导尿管的活塞并且可与活塞运动。 圆柱形壳体的内部填充有润滑，麻醉，防腐液体等，其在通过活塞的运动的作用下在插管导管期间通过导管注射到尿道和膀胱中，同时插入导管 进入尿道。 该装置设置有抗感染帽，其插入尿道的第一三分之一并且用作用于将导管插入尿道而不与身体接触的导向件，如果是感染港口的尿道。