Apparatus for matching a variable load impedance with an RF power
generator impedance
    1.
    发明授权
    Apparatus for matching a variable load impedance with an RF power generator impedance 失效
    用于将可变负载阻抗与RF发电机阻抗相匹配的装置

    公开(公告)号:US5654679A

    公开(公告)日:1997-08-05

    申请号:US662886

    申请日:1996-06-13

    IPC分类号: H03H7/40

    CPC分类号: H03H7/40

    摘要: An apparatus for matching the variable impedance of a load with the fixed impedance of a radio frequency (RF) power generator to provide maximum power transfer. The impedance matching network further allows an RF power generator to vary the frequency of the voltage applied to a load, e.g., a plasma chamber as may be utilized in semiconductor or flat panel plasma display manufacturing processes. The impedance matching network further utilizes fixed solid state components to adjust the impedance of the attached load to provide maximum power transfer between the generator and the load. A parallel switched capacitor network is controlled by an electrical switching means such as PIN diodes to turn fixed capacitors on or off. A means for varying the frequency of the applied voltage is used to match the impedance of the load with the impedance of the RF power generator within milliseconds.

    摘要翻译: 一种用于将负载的可变阻抗与射频(RF)发电机的固定阻抗进行匹配以提供最大功率传输的装置。 阻抗匹配网络还允许RF功率发生器改变施加到诸如半导体或平板等离子体显示器制造工艺中可能使用的诸如等离子体室之类的负载的电压的频率。 阻抗匹配网络进一步利用固定固态分量来调节所连接负载的阻抗,从而在发电机和负载之间提供最大功率传输。 并联开关电容网络由诸如PIN二极管之类的电开关装置来控制以打开或关闭固定电容器。 用于改变施加电压的频率的手段用于将负载的阻抗与毫微秒内的RF发生器的阻抗相匹配。

    RF power control device for RF plasma applications
    2.
    发明授权
    RF power control device for RF plasma applications 有权
    射频等离子体应用的射频功率控制装置

    公开(公告)号:US06791274B1

    公开(公告)日:2004-09-14

    申请号:US10620129

    申请日:2003-07-15

    IPC分类号: H01J724

    CPC分类号: H01J37/32174 H01J37/32082

    摘要: There is provided by this invention an improved rf power control device for plasma applications for optimization of the feedback control voltage in the presence of harmonic and non-harmonic spurious frequencies. In this system, an oscillator and mixer, similar to those normally used in radio receiver applications are placed at the sampled output of the solid state rf signal source used for plasma ignition. The sampled output is mixed to a low frequency and filtered to remove the spurious frequencies that is created in the non-linear plasma. In this way, the feedback power control essentially ignores the spurious frequencies. In this application, the oscillator and mixer do not interfere with other desirable system characteristics and effectively isolate the feedback control voltage from changes in plasma spurious content. This allows rf power to be delivered to the plasma with greater accuracy than would otherwise be possible with conventional power control device and methods.

    摘要翻译: 本发明提供了一种用于等离子体应用的改进的射频功率控制装置,用于在存在谐波和非谐波杂散频率的情况下优化反馈控制电压。 在该系统中,类似于在无线电接收机应用中通常使用的振荡器和混频器被放置在用于等离子体点火的固态rf信号源的采样输出端。 将采样输出混合到低频并进行滤波以去除在非线性等离子体中产生的杂散频率。 以这种方式,反馈功率控制基本上忽略了杂散频率。 在本应用中,振荡器和混频器不会干扰其他所需的系统特性,并有效地将反馈控制电压与等离子体杂散内容的变化隔离开来。 这允许rf功率以比常规功率控制装置和方法可能的方式更高的精度传送到等离子体。

    Method and apparatus for monitoring parameters of an RF powered load in
the presence of harmonics
    3.
    发明授权
    Method and apparatus for monitoring parameters of an RF powered load in the presence of harmonics 失效
    在存在谐波的情况下监视RF供电负载的参数的方法和装置

    公开(公告)号:US6046594A

    公开(公告)日:2000-04-04

    申请号:US798881

    申请日:1997-02-11

    申请人: Anton Mavretic

    发明人: Anton Mavretic

    摘要: A method and apparatus for measuring electrical characteristics (e.g. current, voltage, phase, etc.) between a power source and a load at a set of harmonic frequencies to determine information about the load (e.g., load impedance, power dissipation, etc). According to one aspect of the invention, a first circuit detects a set of electrical characteristics (e.g., current, voltage, and/or phase) of a signal between the power source and the load. A second circuit, coupled to the first circuit to receive the set of electrical characteristics, provides data representing the set of electrical characteristics at a harmonic frequency associated with the signal. A third circuit, coupled to the second circuit, receives the data and determines information about the load (e.g., impedance, power dissipation, discharge current, etc.) at the harmonic frequency. The information could be used in any number of ways, such as controlling an impedance matching network that may be used in conjunction with the power source and the load, identifying/monitoring a load condition(s), etc.

    摘要翻译: 用于测量在一组谐波频率下的电源和负载之间的电特性(例如,电流,电压,相位等)的方法和装置,以确定关于负载的信息(例如,负载阻抗,功率耗散等)。 根据本发明的一个方面,第一电路检测电源和负载之间的信号的一组电特性(例如,电流,电压和/或相位)。 耦合到第一电路以接收该组电特性的第二电路提供表示与该信号相关联的谐波频率处的一组电特性的数据。 耦合到第二电路的第三电路接收数据并确定谐波频率处的负载(例如,阻抗,功率耗散,放电电流等)的信息。 该信息可以以任何数量的方式使用,例如控制可以与电源和负载一起使用的阻抗匹配网络,识别/监视负载条件等。

    Weighing devices using electronic circuitry
    4.
    发明授权
    Weighing devices using electronic circuitry 失效
    使用电子电路称重设备

    公开(公告)号:US4350216A

    公开(公告)日:1982-09-21

    申请号:US186315

    申请日:1980-09-11

    申请人: Anton Mavretic

    发明人: Anton Mavretic

    摘要: A bathroom scale which uses an electronic circuit for providing a digital output voltage in response to the placing of a weight thereon, the electronic circuit having operational amplifier circuits which use both a positive power supply and a negative power supply, the latter assuring that the op-amps always return to a stabilized ground reference point to assure repeatability of weight measurement. The unit includes means for permitting the digital output voltage to reach a steady state value during a selected time period after a weight is placed on the scale and for preventing such steady state value from changing after such selected time period. The gain of the op-amp circuitry is adjustable to permit scale calibration to be performed.

    摘要翻译: 一种浴室秤,其使用电子电路来响应于在其上放置重物而提供数字输出电压,该电子电路具有使用正电源和负电源的运算放大器电路,后者确保操作 总是返回稳定的地面参考点,以确保重量测量的重复性。 该单元包括用于在将重量放置在刻度上之后的选定时间段内允许数字输出电压达到稳定状态值的装置,并且用于在这样的选定时间段之后防止这种稳态值改变。 运算放大器电路的增益可调,以便执行刻度校准。

    RF power control device for RF plasma applications
    5.
    再颁专利
    RF power control device for RF plasma applications 有权
    射频等离子体应用的射频功率控制装置

    公开(公告)号:USRE42917E1

    公开(公告)日:2011-11-15

    申请号:US11519242

    申请日:2006-09-11

    IPC分类号: H01J7/24 H01P5/08 C23C16/00

    CPC分类号: H01J37/32174 H01J37/32082

    摘要: There is provided by this invention an improved rf power control device for plasma applications for optimization of the feedback control voltage in the presence of harmonic and non-harmonic spurious frequencies. In this system, an oscillator and mixer, similar to those normally used in radio receiver applications are placed at the sampled output of the solid state rf signal source used for plasma ignition. The sampled output is mixed to a low frequency and filtered to remove the spurious frequencies that is created in the non-linear plasma. In this way, the feedback power control essentially ignores the spurious frequencies. In this application, the oscillator and mixer do not interfere with other desirable system characteristics and effectively isolate the feedback control voltage from changes in plasma spurious content. This allows rf power to be delivered to the plasma with greater accuracy than would otherwise be possible with conventional power control device and methods.

    摘要翻译: 本发明提供了一种用于等离子体应用的改进的射频功率控制装置,用于在存在谐波和非谐波杂散频率的情况下优化反馈控制电压。 在该系统中,类似于在无线电接收机应用中通常使用的振荡器和混频器被放置在用于等离子体点火的固态rf信号源的采样输出端。 将采样输出混合到低频并进行滤波以去除在非线性等离子体中产生的杂散频率。 以这种方式,反馈功率控制基本上忽略了杂散频率。 在本应用中,振荡器和混频器不会干扰其他所需的系统特性,并有效地将反馈控制电压与等离子体杂散内容的变化隔离开来。 这允许rf功率以比常规功率控制装置和方法可能的方式更高的精度传送到等离子体。

    Method and apparatus for matching a variable load impedance with an RF power generator impedance
    6.
    发明授权
    Method and apparatus for matching a variable load impedance with an RF power generator impedance 有权
    用于将可变负载阻抗与RF发生器阻抗进行匹配的方法和装置

    公开(公告)号:US06424232B1

    公开(公告)日:2002-07-23

    申请号:US09451512

    申请日:1999-11-30

    IPC分类号: H03H740

    摘要: Matching the variable impedance of a load with the fixed impedance of a radio frequency (RF) power generator to provide maximum power transfer. The impedance matching network further allows a RF power generator to vary the frequency of the voltage applied to a load, e.g., a plasma chamber as may be utilized in semiconductor or flat panel plasma display manufacturing processes. The impedance matching network further utilizes fixed solid state components to adjust the impedance of the attached load to provide maximum power transfer between the generator and the load. A parallel switched capacitor network is controlled by an electrical switching means such as PIN diodes to turn fixed capacitors on or off. A means for varying the frequency of the applied voltage is used to match the impedance of the load with the impedance of the RF power generator within milliseconds.

    摘要翻译: 将负载的可变阻抗与射频(RF)发电机的固定阻抗匹配,以提供最大功率传输。 阻抗匹配网络还允许RF功率发生器改变施加到诸如半导体或平板等离子体显示器制造工艺中可能使用的诸如等离子体室之类的负载的电压的频率。 阻抗匹配网络进一步利用固定固态分量来调整所连接负载的阻抗,以在发电机和负载之间提供最大的功率传输。 并联开关电容网络由诸如PIN二极管之类的电开关装置来控制以打开或关闭固定电容器。 用于改变施加电压的频率的手段用于将负载的阻抗与毫微秒内的RF发生器的阻抗相匹配。