ATMOSPHERIC-PRESSURE PLASMA PROCESSING METHOD
    1.
    发明申请
    ATMOSPHERIC-PRESSURE PLASMA PROCESSING METHOD 审中-公开
    大气压力等离子体处理方法

    公开(公告)号:US20160348292A1

    公开(公告)日:2016-12-01

    申请号:US15231229

    申请日:2016-08-08

    申请人: APJeT, Inc.

    IPC分类号: D06B19/00 D06B1/02

    摘要: Methods for atmospheric pressure plasma discharge processing using powered electrodes having elongated planar surfaces; grounded electrodes having elongated planar surfaces parallel to and coextensive with the elongated surfaces of the powered electrodes, and spaced-apart a chosen distance therefrom, forming plasma regions, are described. RF power is provided to the at least one powered electrode, both powered and grounded electrodes may be cooled, and a plasma gas is flowed through the plasma regions at atmospheric pressure; whereby a plasma is formed in the plasma regions. The material to be processed may be moved into close proximity to the exit of the plasma gas from the plasma regions perpendicular to the gas flow, and perpendicular to the elongated electrode dimensions, whereby excited species generated in the plasma exit the plasma regions and impinge unimpeded onto the material.

    摘要翻译: 使用具有细长平面的动力电极进行大气压等离子体放电处理的方法; 描述了具有与被动电极的细长表面平行并且共同延伸的细长平面的接地电极,并且与其间隔开一定距离,形成等离子体区域。 RF功率被提供给至少一个供电电极,电源和接地电极都可以被冷却,等离子体气体在大气压力下流过等离子体区域; 由此在等离子体区域中形成等离子体。 待处理的材料可以被移动到离垂直于气流的等离子体区域等离子体气体的出口附近,并且垂直于细长的电极尺寸,由此在等离子体中产生的激发物质离开等离子体区域并且不受阻碍地撞击 在材料上。