公开(公告)号：US20170069464A1

公开(公告)日：2017-03-09

申请号：US15214063

申请日：2016-07-19

Applicant: Applied Materials, Inc.

Inventor： Zheng John YE ,  Abdul Aziz KHAJA ,  Amit Kumar BANSAL ,  Kwangduk Douglas LEE ,  Xing LIN ,  Jianhua ZHOU ,  Addepalli Sai SUSMITA ,  Juan Carlos ROCHA-ALVAREZ

IPC: H01J37/32 ,  H01L21/67 ,  C23C16/50 ,  H01L21/683

CPC classification number: H01J37/32082 ,  C23C16/50 ,  C23C16/5096 ,  H01J37/32715 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/6831

Abstract: Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.

Abstract translation: 本公开的实施方式一般涉及用于产生和控制等离子体的方法和装置，例如与等离子体室一起使用的RF滤波器。 在一个实施方式中，提供了等离子体处理装置。 等离子体处理装置包括室主体，封闭处理容积的动力气体分配歧管和射频（RF）过滤器。 具有基板支撑表面的基座设置在处理体积中。 包括一个或多个加热元件的加热组件设置在基座内用于控制基板支撑表面的温度分布。 包括调谐电极的调谐组件设置在基座之间的一个或多个加热元件和基板支撑表面之间。 RF滤波器包括空心电感器，其中至少一个加热元件，调谐电极和气体分配歧管电耦合到RF滤波器。