公开(公告)号：US20190051499A1

公开(公告)日：2019-02-14

申请号：US15671909

申请日：2017-08-08

Applicant: Applied Materials, Inc.

Inventor： Deepak Doddabelavangala SRIKANTAIAH ,  Sheshraj L. TULSHIBAGWALE ,  Saravjeet SINGH ,  Alexander TAM

IPC: H01J37/32 ,  B05B1/00 ,  B05B1/18

Abstract: Embodiments of the disclosure relate to a multi-plate faceplate having a first plate and a second plate. The first plate has a plurality of first plate openings. The second plate has a first surface, an opposed second surface and a plurality of second plate openings extending therethrough. The first surface is mechanically coupled to the first plate. A second plate opening has a conical portion configured to be fluidly coupled to a first plate opening and decreasing in cross-section in the depth direction thereof from the second surface. A surface of the conical portion is coated with a protective coating adjacent to the first and second surfaces. In another embodiment, the first plate has a protrusion extending therefrom into a recess formed inwardly of the first surface. The protrusion has a passage extending therethrough fluidly connected to the recess, which is fluidly connected to the second plate opening.

公开(公告)号：US20150380220A1

公开(公告)日：2015-12-31

申请号：US14747367

申请日：2015-06-23

Applicant: Applied Materials, Inc.

Inventor： Tien Fak TAN ,  Dmitry LUBOMIRSKY ,  Kirby H. FLOYD ,  Son T. NGUYEN ,  David PALAGASHVILI ,  Alexander TAM ,  Shaofeng CHEN

IPC: H01J37/32

CPC classification number: H01J37/32724 ,  H01J37/32522 ,  H01J37/32715

Abstract: Implementations of the disclosure generally provide an improved pedestal heater for a processing chamber. The pedestal heater includes a temperature-controlled plate having a first surface and a second surface opposing the first surface. The temperature-controlled plate includes an inner zone comprising a first set of heating elements, an outer zone comprising a second set of heating elements, the outer zone surrounding the inner zone, and a continuous thermal choke disposed between the inner zone and the outer zone, and a substrate receiving plate having a first surface and a second surface opposing the first surface, the second surface of the substrate receiving plate is coupled to the first surface of the temperature-controlled plate. The continuous thermal choke enables a very small temperature gradient to be created and manipulated between the inner zone and the outer zone, allowing center-fast or edge-fast etching profile to achieve on a surface of the substrate.

Abstract translation: 本公开的实施方案通常为处理室提供改进的基座加热器。 基座加热器包括温度控制板，其具有第一表面和与第一表面相对的第二表面。 温度控制板包括内部区域，该内部区域包括第一组加热元件，外部区域包括第二组加热元件，围绕内部区域的外部区域以及设置在内部区域和外部区域之间的连续热扼流圈 以及具有与第一表面相对的第一表面和第二表面的基板接收板，基板接收板的第二表面耦合到温度控制板的第一表面。 连续热扼流圈使得能够在内部区域和外部区域之间产生和操纵非常小的温度梯度，允许在衬底的表面上实现中心快速或边缘快速蚀刻轮廓。

公开(公告)号：US20130298835A1

公开(公告)日：2013-11-14

申请号：US13751889

申请日：2013-01-28

Applicant: APPLIED MATERIALS, INC.

Inventor： Alexander TAM ,  Anzhong CHANG ,  Sumedh ACHARYA

IPC: B05B1/18

CPC classification number: B05B1/18 ,  C23C16/45519 ,  C23C16/45565 ,  C23C16/52 ,  C30B25/14 ,  H01L21/67115

Abstract: A method and apparatus that includes a processing chamber that includes a showerhead with separate inlets and channels for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume is provided. The showerhead includes one or more cleaning gas conduits configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. The showerhead may include a plurality of metrology ports configured to deliver a cleaning gas directly into the processing volume of the chamber while by-passing the processing gas channels. As a result, the processing chamber components can be cleaned more efficiently and effectively than by introducing cleaning gas into the chamber only through the processing gas channels.

Abstract translation: 提供了一种包括处理室的方法和装置，该处理室包括具有单独的入口和通道的喷头，用于将不同的处理气体输送到室的处理容积中，而不会在进入处理容积之前混合气体。 淋浴头包括一个或多个清洁气体管道，其配置成在旁路处理气体通道的同时将清洁气体直接输送到室的处理容积中。 淋浴头可以包括多个计量端口，其配置成在旁路处理气体通道的同时将清洁气体直接输送到室的处理容积中。 结果，与仅通过处理气体通道将清洁气体引入室中相比，可以更有效和有效地清洁处理室部件。