公开(公告)号：US20230335434A1

公开(公告)日：2023-10-19

申请号：US18208409

申请日：2023-06-12

Applicant: Applied Materials, Inc.

Inventor： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC: H01L21/768 ,  H01L21/48 ,  H01L21/02 ,  C23C16/02 ,  C23C16/455 ,  C23C16/458 ,  H01L21/285 ,  H01L21/687 ,  H01L23/532

CPC classification number: H01L21/76826 ,  H01L21/4871 ,  H01L21/0228 ,  C23C16/02 ,  C23C16/45553 ,  C23C16/4584 ,  H01L21/28568 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/76843 ,  H01L21/76861 ,  H01L21/76877 ,  H01L23/53266

Abstract: Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US20210087686A1

公开(公告)日：2021-03-25

申请号：US17028184

申请日：2020-09-22

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC: C23C16/455 ,  C23C16/44

Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US20230357927A1

公开(公告)日：2023-11-09

申请号：US18224206

申请日：2023-07-20

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45544 ,  C23C16/4408

Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US20200381295A1

公开(公告)日：2020-12-03

申请号：US16886116

申请日：2020-05-28

Applicant: Applied Materials, Inc.

Inventor： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC: H01L21/768 ,  H01L21/02 ,  H01L21/48

Abstract: Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US12054826B2

公开(公告)日：2024-08-06

申请号：US18224206

申请日：2023-07-20

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45544 ,  C23C16/4408

Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US11715667B2

公开(公告)日：2023-08-01

申请号：US17720836

申请日：2022-04-14

Applicant: Applied Materials, Inc.

Inventor： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC: C23C16/02 ,  C23C16/455 ,  C23C16/458 ,  H01L21/687 ,  H01L21/768 ,  H01L21/48 ,  H01L21/02 ,  H01L21/285 ,  H01L23/532

CPC classification number: H01L21/76826 ,  C23C16/02 ,  C23C16/4584 ,  C23C16/45553 ,  H01L21/0228 ,  H01L21/28568 ,  H01L21/4871 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/76843 ,  H01L21/76861 ,  H01L21/76877 ,  H01L23/53266

Abstract: Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US20210262092A1

公开(公告)日：2021-08-26

申请号：US17186594

申请日：2021-02-26

Applicant: Applied Materials, Inc.

Inventor： Muhammad M. Rasheed ,  Mandyam Sriram ,  Anqing Cui ,  Sanjeev Baluja ,  Kevin Griffin ,  Joseph AuBuchon

IPC: C23C16/455 ,  C23C16/44

Abstract: Gas delivery systems and methods of delivering a process gas are described. The gas delivery system includes an inert gas line and a first reactive gas line connected to a gas line with a purge gas flow. The flows of inert gas and first reactive gas are controlled so that the pressure at the end of the gas line remains substantially constant.

公开(公告)号：US11767590B2

公开(公告)日：2023-09-26

申请号：US17028184

申请日：2020-09-22

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45544 ,  C23C16/4408

Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US20220246471A1

公开(公告)日：2022-08-04

申请号：US17720836

申请日：2022-04-14

Applicant: Applied Materials, Inc.

Inventor： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC: H01L21/768 ,  C23C16/02 ,  C23C16/455 ,  C23C16/458 ,  H01L21/285 ,  H01L21/687 ,  H01L23/532

Abstract: Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US11335591B2

公开(公告)日：2022-05-17

申请号：US16886116

申请日：2020-05-28

Applicant: Applied Materials, Inc.

Inventor： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC: H01L21/768 ,  H01L21/48 ,  H01L21/02

Abstract: Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.