公开(公告)号：US20230335434A1

公开(公告)日：2023-10-19

申请号：US18208409

申请日：2023-06-12

申请人： Applied Materials, Inc.

发明人： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC分类号： H01L21/768 ,  H01L21/48 ,  H01L21/02 ,  C23C16/02 ,  C23C16/455 ,  C23C16/458 ,  H01L21/285 ,  H01L21/687 ,  H01L23/532

CPC分类号： H01L21/76826 ,  H01L21/4871 ,  H01L21/0228 ,  C23C16/02 ,  C23C16/45553 ,  C23C16/4584 ,  H01L21/28568 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/76843 ,  H01L21/76861 ,  H01L21/76877 ,  H01L23/53266

摘要： Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US20200381295A1

公开(公告)日：2020-12-03

申请号：US16886116

申请日：2020-05-28

申请人： Applied Materials, Inc.

发明人： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC分类号： H01L21/768 ,  H01L21/02 ,  H01L21/48

摘要： Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US11715667B2

公开(公告)日：2023-08-01

申请号：US17720836

申请日：2022-04-14

申请人： Applied Materials, Inc.

发明人： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC分类号： C23C16/02 ,  C23C16/455 ,  C23C16/458 ,  H01L21/687 ,  H01L21/768 ,  H01L21/48 ,  H01L21/02 ,  H01L21/285 ,  H01L23/532

CPC分类号： H01L21/76826 ,  C23C16/02 ,  C23C16/4584 ,  C23C16/45553 ,  H01L21/0228 ,  H01L21/28568 ,  H01L21/4871 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/76843 ,  H01L21/76861 ,  H01L21/76877 ,  H01L23/53266

摘要： Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US20220246471A1

公开(公告)日：2022-08-04

申请号：US17720836

申请日：2022-04-14

申请人： Applied Materials, Inc.

发明人： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC分类号： H01L21/768 ,  C23C16/02 ,  C23C16/455 ,  C23C16/458 ,  H01L21/285 ,  H01L21/687 ,  H01L23/532

摘要： Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.

公开(公告)号：US11335591B2

公开(公告)日：2022-05-17

申请号：US16886116

申请日：2020-05-28

申请人： Applied Materials, Inc.

发明人： Anqing Cui ,  Dien-Yeh Wu ,  Wei V. Tang ,  Yixiong Yang ,  Bo Wang

IPC分类号： H01L21/768 ,  H01L21/48 ,  H01L21/02

摘要： Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.