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公开(公告)号：US20240429077A1
公开(公告)日：2024-12-26
申请号：US18821569
申请日：2024-08-30
Applicant: APPLIED MATERIALS, INC.
Inventor： Varoujan Chakarian , Blake W. Erickson
Abstract: The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more groups of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tube (PMT) array or based on photodiodes (e.g., avalanche photodiodes (APDs)).
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公开(公告)号：US20230078567A1
公开(公告)日：2023-03-16
申请号：US17447745
申请日：2021-09-15
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Zhaozhao Zhu , Blake W. Erickson , Chunlei Zhang
IPC: G01N21/55
Abstract: Implementations disclosed describe a system including a light source, an optical sensor, and a processing device. The light source directs, during a first time, a probe light into a processing chamber through a window. The light source ceases, during a second time, directing the probe light into the processing chamber through the window. The optical sensor detects, during the first time, a first intensity of a first light. The first light includes a portion of the probe light reflected from the window and a light transmitted from an environment of the processing chamber through the window. The optical sensor detects, during the second time, a second intensity of a second light. The second light includes the light transmitted from the environment of the processing chamber through the window. The processing device determines, using the first intensity and the second intensity, a transmission coefficient of the window.
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公开(公告)号：US20220020617A1
公开(公告)日：2022-01-20
申请号：US16932630
申请日：2020-07-17
Applicant: APPLIED MATERIALS, INC.
Inventor： Varoujan Chakarian , Blake W. Erickson
Abstract: The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more groups of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tube (PMT) array or based on photodiodes (e.g., avalanche photodiodes (APDs)).
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公开(公告)号：US12009191B2
公开(公告)日：2024-06-11
申请号：US16946263
申请日：2020-06-12
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Blake W. Erickson , Zhaozhao Zhu , Michael David Willwerth , Barry Paul Craver
CPC classification number: H01J37/32972 , G01B11/0625 , G01B11/0683 , H01J37/32467 , H01J37/32862 , H01J37/32963 , H01L22/26 , H01J2237/24585 , H01J2237/332
Abstract: A system includes a transparent crystal, at least part of which is embedded within a wall and a liner of a processing chamber. The transparent crystal has a proximal end and a distal end, the distal end having a distal surface exposed to an interior of the processing chamber. A transparent thin film is deposited on the distal surface and has chemical properties substantially matching those of the liner. A light coupling device is to: transmit light, from a light source, through the proximal end of the transparent crystal, and focus, into a spectrometer, light received reflected back from a combination of the distal surface, a surface of the transparent thin film, and a surface of a process film layer deposited on the transparent thin film. The spectrometer is to detect a first spectrum within the focused light that is representative of the process film layer.
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Patent Agency Ranking
公开(公告)号：US20230298872A1
公开(公告)日：2023-09-21
申请号：US17696791
申请日：2022-03-16
Applicant: Applied Materials, Inc.
Inventor： Jeffrey Yat Shan Au , Joshua Thomas Maher , Varoujan Chakarian , Sidharth Bhatia , Patrick Tae , Zhaozhao Zhu , Blake W. Erickson
IPC: H01J37/32
CPC classification number: H01J37/32972 , H01J37/32926 , H01J2237/334
Abstract: A method includes receiving, by a processing device, first sensor data indicating a state of a wall corresponding to a first processing chamber. The first sensor data includes optical spectral data. The method further includes determining, by the processing device, a first value based on the first sensor data. The first value corresponds to a first amount of a product disposed along a surface of the wall at a first time. The method further includes determining, by the processing device, a first update to a first process operation associated with the first processing chamber based on the first value. The method further includes performing, by the processing device, one or more of (i) preparing a notification indicating the first update for presentation on a graphical user interface (GUI), or (ii) causing performance of the first process operation in accordance with the first update.
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公开(公告)号：US20240361239A1
公开(公告)日：2024-10-31
申请号：US18767516
申请日：2024-07-09
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Zhaozhao Zhu , Blake W. Erickson , Chunlei Zhang
IPC: G01N21/55
CPC classification number: G01N21/55 , G01N2021/558
Abstract: Implementations disclosed describe a system including a light source, an optical sensor, and a processing device. The light source directs, during a first time, a probe light into a processing chamber through a window. The light source ceases, during a second time, directing the probe light into the processing chamber through the window. The optical sensor detects, during the first time, a first intensity of a first light. The first light includes a portion of the probe light reflected from the window and a light transmitted from an environment of the processing chamber through the window. The optical sensor detects, during the second time, a second intensity of a second light. The second light includes the light transmitted from the environment of the processing chamber through the window. The processing device determines, using the first intensity and the second intensity, a transmission coefficient of the window.
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7.发明公开公开(公告)号：US20240290592A1
公开(公告)日：2024-08-29
申请号：US18655748
申请日：2024-05-06
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Blake W. Erickson , Zhaozhao Zhu , Michael David Willwerth , Barry Paul Craver
CPC classification number: H01J37/32972 , G01B11/0625 , G01B11/0683 , H01J37/32467 , H01J37/32862 , H01J37/32963 , H01L22/26 , H01J2237/24585 , H01J2237/332
Abstract: A method includes embedding at least part of a transparent crystal within a wall and a liner of a processing chamber, depositing a transparent thin film on a surface of the transparent crystal that is exposed to an interior of the processing chamber and depositing a process film layer on the transparent thin film. The method includes receiving light reflected back from a surface of the transparent thin film and a surface of the process film layer and detecting, by a spectrometer within the received light, a first spectrum that is representative of the process film layer. The method includes calculating, by a processing device coupled to the spectrometer, a process drift of the processing chamber based at least in part on the first spectrum.
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公开(公告)号：US12031910B2
公开(公告)日：2024-07-09
申请号：US17447745
申请日：2021-09-15
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Zhaozhao Zhu , Blake W. Erickson , Chunlei Zhang
IPC: G01N21/55
CPC classification number: G01N21/55 , G01N2021/558
Abstract: Implementations disclosed describe a system including a light source, an optical sensor, and a processing device. The light source directs, during a first time, a probe light into a processing chamber through a window. The light source ceases, during a second time, directing the probe light into the processing chamber through the window. The optical sensor detects, during the first time, a first intensity of a first light. The first light includes a portion of the probe light reflected from the window and a light transmitted from an environment of the processing chamber through the window. The optical sensor detects, during the second time, a second intensity of a second light. The second light includes the light transmitted from the environment of the processing chamber through the window. The processing device determines, using the first intensity and the second intensity, a transmission coefficient of the window.
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公开(公告)号：US20210391157A1
公开(公告)日：2021-12-16
申请号：US16946263
申请日：2020-06-12
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Blake W. Erickson , Zhaozhao Zhu , Michael David Willwerth , Barry Paul Craver
Abstract: A system includes a transparent crystal, at least part of which is embedded within a wall and a liner of a processing chamber. The transparent crystal has a proximal end and a distal end, the distal end having a distal surface exposed to an interior of the processing chamber. A transparent thin film is deposited on the distal surface and has chemical properties substantially matching those of the liner. A light coupling device is to: transmit light, from a light source, through the proximal end of the transparent crystal, and focus, into a spectrometer, light received reflected back from a combination of the distal surface, a surface of the transparent thin film, and a surface of a process film layer deposited on the transparent thin film. The spectrometer is to detect a first spectrum within the focused light that is representative of the process film layer.
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