公开(公告)号：US20230395356A1

公开(公告)日：2023-12-07

申请号：US17834278

申请日：2022-06-07

Applicant: Applied Materials, Inc.

Inventor： Anantha Subramani ,  Yang Guo ,  Seyyed Fazeli ,  Kelvin Chan ,  Chandrashekara Baginagere ,  Brian Alvarez ,  Philip Kraus

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/458

CPC classification number: H01J37/32449 ,  H01J37/32715 ,  H01J37/32247 ,  C23C16/45536 ,  C23C16/4584 ,  H01J2237/162 ,  H01J2237/20214 ,  H01J2237/20235 ,  H01J2237/332

Abstract: A plasma treatment chamber comprises a chamber body having an opening in a top surface thereof. A rotatable pedestal is within the chamber body having a support surface to hold and rotate a workpiece in a processing region. A cross-flow pumping ring is over the opening in the chamber body to inject a gas flow in a direction generally parallel to and across a surface of the workpiece. A lid is over the cross-flow pumping ring, the lid having a plurality of microwave resonators to ignite the gas flow and form plasma.