公开(公告)号：US20180197713A1

公开(公告)日：2018-07-12

申请号：US15849389

申请日：2017-12-20

Applicant: FEI Company

Inventor： Yakov Bobrov ,  Cecelia Anne Campochiaro

IPC: H01J37/18 ,  H01J37/28 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/18 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/162 ,  H01J2237/2006 ,  H01J2237/2448 ,  H01J2237/24564

Abstract: Provided are new techniques for fault analysis in IC semiconductor devices, including system designs and methods to enable the probing of circuitry within an IC device under test (DUT) using electron beam (e-beam) techniques while the DUT is being stimulated electrically, or while the device is active on its own or within a host system mounted in a circuit board or other module. The DUT could be a packaged IC, or an IC in some unpackaged form. To create a local evacuated volume immediately outside the e-beam tool, a sealing element is sealed against or around the DUT for a localized seal. Such an arrangement obviates the need for vacuum feedthroughs of possibly thousands of signals required to operate and monitor the DUT, and further enables probing of a DUT while it is operating in its normal environment, such as installed on a circuit board in its system, or on a tester.

公开(公告)号：US20060284090A1

公开(公告)日：2006-12-21

申请号：US11499776

申请日：2006-08-07

Applicant: Hans Koops ,  Peter Hoffrogge

Inventor： Hans Koops ,  Peter Hoffrogge

IPC: G21K7/00

CPC classification number: H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31732 ,  H01J2237/31744

Abstract: A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

公开(公告)号：US20060145087A1

公开(公告)日：2006-07-06

申请号：US11225376

申请日：2005-09-12

Applicant: N. Parker

Inventor： N. Parker

IPC: H01J3/14

CPC classification number: H01J37/256 ,  H01J9/42 ,  H01J37/09 ,  H01J37/147 ,  H01J37/244 ,  H01J2237/0492 ,  H01J2237/1501 ,  H01J2237/162 ,  H01J2237/188 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2594 ,  H01J2237/2817

Abstract: A charged particle optical system for testing, imaging or inspecting substrates comprises: a charged particle optical assembly configured to produce a line of charged particle beams equally spaced along a main scan axis, each beam being deflectable through a large angle along the main scan axis; and linear detector optics aligned along the main scan axis. The detector optics includes a linear secondary electron detector, a field free tube, voltage contrast plates and a linear backscattered electron detector. The large beam deflection is achieved using an electrostatic deflector for which the exit aperture is larger than the entrance aperture. One embodiment of the deflector includes: two parallel plates with chamfered inner surfaces disposed perpendicularly to the main scan axis; and a multiplicity of electrodes positioned peripherally in the gap between the plates, the electrodes being configured to maintain a uniform electric field transverse to the main scan axis.

Abstract translation: 用于测试，成像或检查基板的带电粒子光学系统包括：带电粒子光学组件，被配置为产生沿主扫描轴等距间隔的带电粒子束线，每个束可沿主扫描轴线以大角度偏转; 以及沿主扫描轴对准的线性检测器光学元件。 检测器光学器件包括线性二次电子检测器，无磁场管，电压对比板和线性背散射电子检测器。 使用静电偏转器实现大的光束偏转，出射孔大于入射孔。 偏转器的一个实施例包括：具有与主扫描轴垂直设置的倒角内表面的两个平行板; 以及多个电极位于板之间的间隙周边，电极被配置为保持横向于主扫描轴的均匀电场。

公开(公告)号：US20050103272A1

公开(公告)日：2005-05-19

申请号：US10923814

申请日：2004-08-24

Applicant: Hans Koops ,  Peter Hoffrogge

Inventor： Hans Koops ,  Peter Hoffrogge

IPC: C23C16/00

CPC classification number: H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31732 ,  H01J2237/31744

Abstract: A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

Abstract translation: 提供了一种用于处理工件的材料处理系统。 材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。 辐射优选由电子显微镜提供。 电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。 材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。 气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

公开(公告)号：US06649859B2

公开(公告)日：2003-11-18

申请号：US10083382

申请日：2002-02-27

Applicant: Yoshihisa Miura ,  Yuichi Aki

Inventor： Yoshihisa Miura ,  Yuichi Aki

IPC: B23K1500

CPC classification number: H01J37/3174 ,  B23K15/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/301 ,  H01J2237/162 ,  H01J2237/166

Abstract: In a partial-vacuum-type, electron-beam irradiation system having a construction such that a static-pressure floating pad is connected to a vacuum chamber incorporating an electron-beam column, and an electron-beam passes through an electron-beam passage of the static-pressure floating pad to impinge on a body to be irradiated in the condition where the static-pressure floating pad is contactlessly attracted to the body to be irradiated, a vacuum-seal valve for opening and closing the electron-beam passage is provided inside the static-pressure floating pad, and when the static-pressure floating pad is separated away from the body to be irradiated, the vacuum-seal valve is actuated to close the electron-beam passage, whereby the atmospheric air is prevented from flowing into the vacuum chamber.

Abstract translation: 在部分真空型电子束照射系统中，具有将静压浮动焊盘连接到包含电子束柱的真空室的结构，并且电子束通过电子束通过 提供静压浮动垫，以在静压浮动垫无接触地吸引到被照射体的状态下照射在被照射体上，提供用于打开和关闭电子束通道的真空密封阀 在静压浮动垫的内部，当静压浮动垫离开被照射体时，致动真空密封阀闭合电子束通路，防止大气流入 真空室。

公开(公告)号：US6031551A

公开(公告)日：2000-02-29

申请号：US785990

申请日：1997-01-21

Applicant: Alfred Hirt

Inventor： Alfred Hirt

IPC: B41C1/02 ,  B41C1/10 ,  B41J2/415 ,  B41M5/00 ,  G03G13/26 ,  G03G15/05 ,  G03G15/056 ,  H01J37/32

CPC classification number: H01J37/32458 ,  B41J2/415 ,  G03G15/056 ,  H01J2237/162 ,  H01J2237/334

Abstract: A printing head suitable for imaging a ferroelectric printing form is sealed relative to the printing form by a spring-elastic seal. In the discharge chamber of the printing head, at a low pressure, preferably less than 10 hPa, and especially in the presence of a gas with high ionization probability, a discharge plasma is created, from which charge carriers emerge onto the printing form as the result of activation between electrodes, with simultaneous focussing by the application of electric and/or magnetic fields between plates.

Abstract translation: 适合于铁电印刷形式成像的印刷头通过弹性弹性密封件相对于印刷形式被密封。 在打印头的放电室中，在低压，优选小于10hPa，特别是在存在具有高电离概率的气体的情况下，产生放电等离子体，电荷载体从该放电等离子体出现在印刷形式上 电极之间的激活的结果，同时通过在板之间施加电和/或磁场而聚焦。

公开(公告)号：US5190703A

公开(公告)日：1993-03-02

申请号：US633547

申请日：1990-12-24

Applicant: Peter W. Rose ,  Stephen L. Kaplan

Inventor： Peter W. Rose ,  Stephen L. Kaplan

IPC: C23C16/50 ,  H01J37/16 ,  H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32458 ,  H01J37/16 ,  H01J2237/162

Abstract: The present invention includes a plasma reactor chamber, which is generally constructed such that a large opening exists in a wall of the chamber. The reactor chamber is deployed remotely from a control console, such as on a robotic arm. A plasma generating means, such as RF electrodes is disposed within the chamber and a flexible vacuum seal is engaged to the outer edge of the chamber wall, surrounding the opening. Operating components, such as a vacuum pump, plasma gas supply and RF generator are disposed within the control console, and various supply lines join the operating components to the reactor chamber. In operation, the reactor chambler is placed against a portion of a surface that is to be treated, and a low pressure plasma is created within the chamber to treat the zone of the surface enclosed within the seal of the chamber. Particularly shaped seals for irregularly shaped surfaces and a rolling seal for movement of the reactor chamber relative to a surface are within the contemplation of the invention.

公开(公告)号：US20230395356A1

公开(公告)日：2023-12-07

申请号：US17834278

申请日：2022-06-07

Applicant: Applied Materials, Inc.

Inventor： Anantha Subramani ,  Yang Guo ,  Seyyed Fazeli ,  Kelvin Chan ,  Chandrashekara Baginagere ,  Brian Alvarez ,  Philip Kraus

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/458

CPC classification number: H01J37/32449 ,  H01J37/32715 ,  H01J37/32247 ,  C23C16/45536 ,  C23C16/4584 ,  H01J2237/162 ,  H01J2237/20214 ,  H01J2237/20235 ,  H01J2237/332

Abstract: A plasma treatment chamber comprises a chamber body having an opening in a top surface thereof. A rotatable pedestal is within the chamber body having a support surface to hold and rotate a workpiece in a processing region. A cross-flow pumping ring is over the opening in the chamber body to inject a gas flow in a direction generally parallel to and across a surface of the workpiece. A lid is over the cross-flow pumping ring, the lid having a plurality of microwave resonators to ignite the gas flow and form plasma.

公开(公告)号：US09865427B2

公开(公告)日：2018-01-09

申请号：US14704453

申请日：2015-05-05

Applicant: FEI COMPANY

Inventor： Martinus Petrus Maria Bierhoff ,  Bart Buijsse ,  Cornelis Sander Kooijman ,  Hugo Van Leeuwen ,  Hendrik Gezinus Tappel ,  Colin August Sanford ,  Sander Richard Marie Stoks ,  Steven Berger ,  Ben Jacobus Marie Bormans ,  Koen Arnoldus Wilhelmus Driessen ,  Johannes Antonius Hendricus W. G. Persoon

IPC: H01J37/26 ,  H01J37/18 ,  H01J37/21 ,  H01J37/302 ,  H01J37/16 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively.

公开(公告)号：US20160071699A1

公开(公告)日：2016-03-10

申请号：US14782885

申请日：2014-05-08

Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)

Inventor： Toshiki SEGAWA ,  Naoki OHBA ,  Yoshinori KUROKAWA

IPC: H01J37/32 ,  H01J37/34

CPC classification number: H01J37/3277 ,  C23C14/562 ,  H01J37/32513 ,  H01J37/32733 ,  H01J37/32807 ,  H01J37/3288 ,  H01J37/32899 ,  H01J37/3417 ,  H01J37/3447 ,  H01J2237/162 ,  H01J2237/20278 ,  H01J2237/332 ,  H01L21/67132

Abstract: Provided is a deposition device which can secure work space without vertical overlap of the deposition unit and the units upstream and downstream thereof. This deposition device is provided with a deposition unit (16), and upstream and downstream units (14, 18) arranged to the left and right thereof. The deposition unit (16) is provided with: a deposition roller (70); multiple guide rollers (72); a main chamber (64) having a deposition roller housing unit (74) and, thereabove, a guide roller housing unit (76); first and second process chambers (66, 68) which house multiple deposition process devices (84, 86) to the left and right of the deposition roller housing unit (74); and process chamber support units (104) for supporting the first and second process chambers (66, 68) so as to allow the first and second process chambers (66, 68) to move between a regular position for deposition and a retracted position retracted to the left or right, and between the retracted position and an exposure position separated in the front/back direction.

Abstract translation: 提供了一种能够在不沉积单元和其上游和下游的单元的垂直重叠的情况下确保工作空间的沉积装置。 该沉积装置设置有沉积单元（16），并且布置在其左侧和右侧的上游和下游单元（14,18）。 沉积单元（16）设置有沉积辊（70）; 多个导辊（72）; 具有沉积辊容纳单元（74）的主室（64），并且在其上方具有导辊容纳单元（76）; 第一和第二处理室（66,68），其容纳多个沉积处理装置（84,86）到沉积辊容纳单元（74）的左侧和右侧; 以及用于支撑第一和第二处理室（66,68）的处理室支撑单元（104），以便允许第一和第二处理室（66,68）在用于沉积的规则位置和缩回位置缩回到 在左/右之间以及在缩回位置和在前/后方向上分离的曝光位置之间。