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公开(公告)号:US20210110995A1
公开(公告)日:2021-04-15
申请号:US16735125
申请日:2020-01-06
Applicant: Applied Materials, Inc.
Inventor: Shreyansh P. Patel , Graham Wright , Daniel Alvarado , Daniel R. Tieger , Brian S. Gori , William R. Bogiages, JR. , Benjamin Oswald , Craig R. Chaney
IPC: H01J37/302 , H01J37/08
Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.
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公开(公告)号:US20230260745A1
公开(公告)日:2023-08-17
申请号:US18136738
申请日:2023-04-19
Applicant: Applied Materials, Inc.
Inventor: Shreyansh P. Patel , Graham Wright , Daniel Alvarado , Daniel R. Tieger , Brian S. Gori , William R. Bogiages, Jr. , Benjamin Oswald , Craig R. Chaney
IPC: H01J37/302 , H01J37/08
CPC classification number: H01J37/302 , H01J37/08 , H01J37/3171
Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.
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公开(公告)号:US10896799B1
公开(公告)日:2021-01-19
申请号:US16555064
申请日:2019-08-29
Applicant: Applied Materials, Inc.
Inventor: Klaus Becker , Carlos M. Goulart , Daniel Alvarado , Daniel R. Tieger , Alexander S. Perel
Abstract: An IHC ion source with multiple configurations is disclosed. For example, an IHC ion source comprises a chamber, having at least one electrically conductive wall, and a cathode and a repeller disposed on opposite ends of the chamber. Electrodes are disposed on one or more walls of the ion source. Bias voltages are applied to at least one of the cathode, repeller and the electrodes, relative to the electrically conductive wall of the chamber. Further, the IHC ion source comprises a configuration circuit, which receives the various voltages as input voltages, and provides selected output voltages to the cathode, repeller and electrodes, based on user input. In this way, the IHC ion source can be readily reconfigured for different applications without rewiring the power supplies, as is currently done. This configuration circuit may be utilized with other types of ion sources as well.
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公开(公告)号:US10600611B2
公开(公告)日:2020-03-24
申请号:US16190649
申请日:2018-11-14
Applicant: APPLIED Materials, Inc.
Inventor: Klaus Becker , Daniel Alvarado , Michael St. Peter , Graham Wright
Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.
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公开(公告)号:US20210375585A1
公开(公告)日:2021-12-02
申请号:US17403223
申请日:2021-08-16
Applicant: Applied Materials, Inc.
Inventor: Shreyansh P. Patel , Graham Wright , Daniel Alvarado , Daniel R. Tieger , Brian S. Gori , William R. Bogiages, JR. , Benjamin Oswald , Craig R. Chaney
IPC: H01J37/302 , H01J37/08
Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.
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公开(公告)号:US11170973B2
公开(公告)日:2021-11-09
申请号:US16735125
申请日:2020-01-06
Applicant: Applied Materials, Inc.
Inventor: Shreyansh P. Patel , Graham Wright , Daniel Alvarado , Daniel R. Tieger , Brian S. Gori , William R. Bogiages, Jr. , Benjamin Oswald , Craig R. Chaney
IPC: H01J37/302 , H01J37/08 , H01J37/317
Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.
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7.
公开(公告)号:US10957509B1
公开(公告)日:2021-03-23
申请号:US16676996
申请日:2019-11-07
Applicant: Applied Materials, Inc.
Inventor: Graham Wright , Daniel Alvarado , Shreyansh P. Patel , Daniel R. Tieger
Abstract: An ion source with an insertable target holder for holding a solid dopant material is disclosed. The insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder has a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. The porous surface may be a portion of a perforated crucible, a portion of a perforated retention cap, or a porous insert.
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公开(公告)号:US20190180971A1
公开(公告)日:2019-06-13
申请号:US16190649
申请日:2018-11-14
Applicant: APPLIED Materials, Inc.
Inventor: Klaus Becker , Daniel Alvarado , Michael St. Peter , Graham Wright
Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.
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公开(公告)号:US11854760B2
公开(公告)日:2023-12-26
申请号:US17353171
申请日:2021-06-21
Applicant: Applied Materials, Inc.
Inventor: Graham Wright , Eric Donald Wilson , Daniel Alvarado , Robert C. Lindberg , Jacob Mullin
CPC classification number: H01J27/022 , H01J27/14
Abstract: A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.
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公开(公告)号:US11664192B2
公开(公告)日:2023-05-30
申请号:US17403223
申请日:2021-08-16
Applicant: Applied Materials, Inc.
Inventor: Shreyansh P. Patel , Graham Wright , Daniel Alvarado , Daniel R. Tieger , Brian S. Gori , William R. Bogiages, Jr. , Benjamin Oswald , Craig R. Chaney
IPC: H01J37/302 , H01J37/08 , H01J37/317
CPC classification number: H01J37/302 , H01J37/08 , H01J37/3171
Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.
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