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    Ion source with multiple configurations
    3.
    发明授权
    Ion source with multiple configurations 有权

    公开(公告)号：US10896799B1

    公开(公告)日：2021-01-19

    申请号：US16555064

    申请日：2019-08-29

    Applicant: Applied Materials, Inc.

    Inventor： Klaus Becker ,  Carlos M. Goulart ,  Daniel Alvarado ,  Daniel R. Tieger ,  Alexander S. Perel

    IPC: H01J37/08 ,  H01J27/08 ,  H01J37/24 ,  H01J37/248 ,  H01J37/16 ,  H01J27/02

    Abstract: An IHC ion source with multiple configurations is disclosed. For example, an IHC ion source comprises a chamber, having at least one electrically conductive wall, and a cathode and a repeller disposed on opposite ends of the chamber. Electrodes are disposed on one or more walls of the ion source. Bias voltages are applied to at least one of the cathode, repeller and the electrodes, relative to the electrically conductive wall of the chamber. Further, the IHC ion source comprises a configuration circuit, which receives the various voltages as input voltages, and provides selected output voltages to the cathode, repeller and electrodes, based on user input. In this way, the IHC ion source can be readily reconfigured for different applications without rewiring the power supplies, as is currently done. This configuration circuit may be utilized with other types of ion sources as well.

    Ion source crucible for solid feed materials
    4.
    发明授权
    Ion source crucible for solid feed materials 有权

    公开(公告)号：US10600611B2

    公开(公告)日：2020-03-24

    申请号：US16190649

    申请日：2018-11-14

    Applicant: APPLIED Materials, Inc.

    Inventor： Klaus Becker ,  Daniel Alvarado ,  Michael St. Peter ,  Graham Wright

    IPC: H01J37/08 ,  H01J37/34 ,  H01J37/32

    Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.

    Insertable target holder for improved stability and performance for solid dopant materials
    7.
    发明授权
    Insertable target holder for improved stability and performance for solid dopant materials 有权

    公开(公告)号：US10957509B1

    公开(公告)日：2021-03-23

    申请号：US16676996

    申请日：2019-11-07

    Applicant: Applied Materials, Inc.

    Inventor： Graham Wright ,  Daniel Alvarado ,  Shreyansh P. Patel ,  Daniel R. Tieger

    IPC: H01J27/02 ,  H01J27/20 ,  H01J37/34

    Abstract: An ion source with an insertable target holder for holding a solid dopant material is disclosed. The insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder has a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. The porous surface may be a portion of a perforated crucible, a portion of a perforated retention cap, or a porous insert.

    Ion Source Crucible For Solid Feed Materials
    8.
    发明申请
    Ion Source Crucible For Solid Feed Materials 审中-公开

    公开(公告)号：US20190180971A1

    公开(公告)日：2019-06-13

    申请号：US16190649

    申请日：2018-11-14

    Applicant: APPLIED Materials, Inc.

    Inventor： Klaus Becker ,  Daniel Alvarado ,  Michael St. Peter ,  Graham Wright

    IPC: H01J37/08 ,  H01J37/34

    Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.

    Crucible design for liquid metal in an ion source
    9.
    发明授权
    Crucible design for liquid metal in an ion source 有权

    公开(公告)号：US11854760B2

    公开(公告)日：2023-12-26

    申请号：US17353171

    申请日：2021-06-21

    Applicant: Applied Materials, Inc.

    Inventor： Graham Wright ,  Eric Donald Wilson ,  Daniel Alvarado ,  Robert C. Lindberg ,  Jacob Mullin

    IPC: H01J27/02 ,  H01J27/14

    CPC classification number: H01J27/022 ,  H01J27/14

    Abstract: A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.

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