公开(公告)号：US20230256483A1

公开(公告)日：2023-08-17

申请号：US18139246

申请日：2023-04-25

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Stefan KELLER ,  Jae Won LEE ,  Takashi ANJIKI ,  Dieter HAAS

IPC: B08B7/04 ,  B08B3/08 ,  B08B7/00 ,  B08B9/08 ,  C23C14/12 ,  C23C14/24 ,  C23C14/56 ,  H10K71/00 ,  H10K71/16

CPC classification number: B08B7/04 ,  B08B3/08 ,  B08B7/0035 ,  B08B9/08 ,  C23C14/12 ,  C23C14/24 ,  C23C14/566 ,  H10K71/00 ,  H10K71/164 ,  H10K71/166 ,  B08B2209/08

Abstract: The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.

公开(公告)号：US20210308725A1

公开(公告)日：2021-10-07

申请号：US16318052

申请日：2017-04-28

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Stefan KELLER ,  Jae Won LEE ,  Takashi ANJIKI ,  Dieter HAAS

IPC: B08B7/04 ,  B08B7/00 ,  B08B3/08 ,  B08B9/08 ,  C23C14/12 ,  C23C14/24 ,  C23C14/56 ,  H01L51/00 ,  H01L51/56

Abstract: The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.