公开(公告)号：US20180061617A1

公开(公告)日：2018-03-01

申请号：US15663124

申请日：2017-07-28

Applicant: Applied Materials, Inc.

Inventor： Jianqi WANG ,  Yogita PAREEK ,  Julia BAUWIN ,  Kevin A. PAPKE

IPC: H01J37/32 ,  H01L21/67 ,  C23C16/56 ,  C23C16/40

CPC classification number: H01J37/32504 ,  C23C16/40 ,  C23C16/56 ,  H01J37/32477 ,  H01J37/32495 ,  H01J2237/0213 ,  H01J2237/334 ,  H01L21/67069

Abstract: Implementations of the present disclosure provide a chamber component for use in a processing chamber. The chamber component includes a body for use in a plasma processing chamber, a barrier oxide layer formed on at least a portion of an exposed surface of the body, the barrier oxide layer having a density of about 2 gm/cm3 or greater, and an aluminum oxyfluoride layer formed on the barrier oxide layer, the aluminum oxyfluoride layer having a thickness of about 2 nm or greater.