公开(公告)号：US20240029997A1

公开(公告)日：2024-01-25

申请号：US18478826

申请日：2023-09-29

Applicant: Applied Materials, Inc.

Inventor： Paul J. Murphy ,  Frank Sinclair ,  Jun Lu ,  Daniel Tieger ,  Anthony Renau

IPC: H01J37/317 ,  H01J37/30 ,  C23C14/48

CPC classification number: H01J37/3171 ,  H01J37/3007 ,  C23C14/48 ,  H01L21/265

Abstract: An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.

公开(公告)号：US11574796B1

公开(公告)日：2023-02-07

申请号：US17382041

申请日：2021-07-21

Applicant: Applied Materials, Inc.

Inventor： Jun Lu ,  Frank Sinclair ,  Shane W. Conley ,  Michael Honan

IPC: H01J37/00 ,  H01J37/30 ,  H01J37/02 ,  H01J37/317

Abstract: An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.

公开(公告)号：US11569063B2

公开(公告)日：2023-01-31

申请号：US17221033

申请日：2021-04-02

Applicant: Applied Materials, Inc.

Inventor： Paul J. Murphy ,  Frank Sinclair ,  Jun Lu ,  Daniel Tieger ,  Anthony Renau

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/304 ,  H01J37/32 ,  H01J37/05

Abstract: An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.

公开(公告)号：US20220319806A1

公开(公告)日：2022-10-06

申请号：US17221033

申请日：2021-04-02

Applicant: Applied Materials, Inc.

Inventor： Paul J. Murphy ,  Frank Sinclair ,  Jun Lu ,  Daniel Tieger ,  Anthony Renau

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/05 ,  H01J37/304 ,  H01J37/32

Abstract: An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.

公开(公告)号：US20230021619A1

公开(公告)日：2023-01-26

申请号：US17382041

申请日：2021-07-21

Applicant: Applied Materials, Inc.

Inventor： Jun Lu ,  Frank Sinclair ,  Shane W. Conley ,  Michael Honan

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/02

Abstract: An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.