公开(公告)号：US20240304430A1

公开(公告)日：2024-09-12

申请号：US18666251

申请日：2024-05-16

申请人： Applied Materials, Inc.

发明人： Mehdi Vaez-Iravani ,  Todd J. Egan ,  Kyle Ross Tantiwong

IPC分类号： H01J37/32 ,  C23C14/34 ,  C23C14/54 ,  C23C16/44 ,  C23C16/52 ,  G01N21/01 ,  H01J37/34

CPC分类号： H01J37/32972 ,  C23C14/34 ,  C23C14/54 ,  C23C16/4401 ,  C23C16/52 ,  G01N21/01 ,  H01J37/32477 ,  H01J37/3476 ,  H01J2237/3321

摘要： Implementations disclosed describe a system that includes a deposition chamber, a light source to produce an incident beam of light, wherein the incident beam of light is to illuminate a region of the deposition chamber, and a camera to collect a scattered light originating from the illuminated region of the deposition chamber, wherein the scattered light is to be produced upon interaction of the first incident beam of light with particles inside the illuminated region of the deposition chamber. The described system may optionally have a processing device, coupled to the camera, to generate scattering data for a plurality of locations of the illuminated region, wherein the scattering data for each location comprises intensity of the scattered light originating from this location.

公开(公告)号：US12002665B2

公开(公告)日：2024-06-04

申请号：US16946348

申请日：2020-06-17

申请人： Applied Materials, Inc.

发明人： Mehdi Vaez-Iravani ,  Todd J. Egan ,  Kyle Ross Tantiwong

IPC分类号： H01J37/32 ,  C23C14/34 ,  C23C14/54 ,  C23C16/44 ,  C23C16/52 ,  G01N21/01 ,  H01J37/34

CPC分类号： H01J37/32972 ,  C23C14/34 ,  C23C14/54 ,  C23C16/4401 ,  C23C16/52 ,  G01N21/01 ,  H01J37/32477 ,  H01J37/3476 ,  H01J2237/3321

摘要： Implementations disclosed describe a system that includes a deposition chamber, a light source to produce an incident beam of light, wherein the incident beam of light is to illuminate a region of the deposition chamber, and a camera to collect a scattered light originating from the illuminated region of the deposition chamber, wherein the scattered light is to be produced upon interaction of the first incident beam of light with particles inside the illuminated region of the deposition chamber. The described system may optionally have a processing device, coupled to the camera, to generate scattering data for a plurality of locations of the illuminated region, wherein the scattering data for each location comprises intensity of the scattered light originating from this location.

公开(公告)号：US20210005436A1

公开(公告)日：2021-01-07

申请号：US16946348

申请日：2020-06-17

申请人： Applied Materials, Inc.

发明人： Mehdi Vaez-Iravani ,  Todd J. Egan ,  Kyle Ross Tantiwong

IPC分类号： H01J37/32 ,  H01J37/34 ,  C23C14/34 ,  C23C14/54 ,  C23C16/52 ,  C23C16/44

摘要： Implementations disclosed describe a system that includes a deposition chamber, a light source to produce an incident beam of light, wherein the incident beam of light is to illuminate a region of the deposition chamber, and a camera to collect a scattered light originating from the illuminated region of the deposition chamber, wherein the scattered light is to be produced upon interaction of the first incident beam of light with particles inside the illuminated region of the deposition chamber. The described system may optionally have a processing device, coupled to the camera, to generate scattering data for a plurality of locations of the illuminated region, wherein the scattering data for each location comprises intensity of the scattered light originating from this location.