公开(公告)号：US20180138522A1

公开(公告)日：2018-05-17

申请号：US15572115

申请日：2016-05-11

Applicant: Applied Materials, Inc.

Inventor： Giback PARK ,  Michael Yu-Tak YOUNG ,  Byung-Sung Leo KWAK ,  Jeffrey L. FRANKLIN ,  Kyu CHO II

IPC: H01M6/40 ,  H01S5/183 ,  H01S5/20 ,  H01M10/052

CPC classification number: H01M6/40 ,  H01M10/0436 ,  H01M10/052 ,  H01M10/0562 ,  H01M10/0585 ,  H01S5/183 ,  H01S5/20

Abstract: A method of fabricating electrochemical devices may comprise: providing a layer of dielectric material on a metal electrode; enhancing light absorption in the layer of dielectric material within the visible and near UV range, forming a layer of enhanced dielectric material; and laser ablating substantially all of the enhanced dielectric material in select areas of the layer using a laser with a wavelength in the visible and near UV range, wherein the laser ablating leaves the metal electrode substantially intact. In some embodiments, the layer may be provided engineered for higher laser light absorption within the visible and near ultraviolet range, without the need for enhancing. An electrochemical device may comprise: a substrate; a stack of active device layers formed on the substrate; and an encapsulation layer covering the stack, engineered to strongly absorb laser light within the visible and near ultraviolet range.