公开(公告)号：US20240069452A1

公开(公告)日：2024-02-29

申请号：US18261150

申请日：2022-02-01

申请人： Applied Materials, Inc.

发明人： Assaf KIDRON ,  Jiawei SHI ,  Liang-Yuh CHEN ,  Che-Kai CHANG ,  Tsu-Hui YANG ,  Nimrod SMITH ,  Grant WANG ,  Preston FUNG ,  Vasuman Ghanapaati SRIRANGARAJAN ,  Davidi KALIR ,  Rudolf C. BRUNNER

IPC分类号： G03F7/00

CPC分类号： G03F7/70833 ,  G03F7/70275 ,  G03F7/709

摘要： Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IRS's). The IRS's are in a processing positon prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.