公开(公告)号：US20210149308A1

公开(公告)日：2021-05-20

申请号：US17157634

申请日：2021-01-25

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. JOHNSTON ,  Preston FUNG ,  Sean SCREWS ,  Cheuk Ming LEE ,  Jae Myung YOO

IPC: G03F7/20

Abstract: The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

公开(公告)号：US20240069452A1

公开(公告)日：2024-02-29

申请号：US18261150

申请日：2022-02-01

Applicant: Applied Materials, Inc.

Inventor： Assaf KIDRON ,  Jiawei SHI ,  Liang-Yuh CHEN ,  Che-Kai CHANG ,  Tsu-Hui YANG ,  Nimrod SMITH ,  Grant WANG ,  Preston FUNG ,  Vasuman Ghanapaati SRIRANGARAJAN ,  Davidi KALIR ,  Rudolf C. BRUNNER

IPC: G03F7/00

CPC classification number: G03F7/70833 ,  G03F7/70275 ,  G03F7/709

Abstract: Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IRS's). The IRS's are in a processing positon prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.