SILICON SUPER JUNCTION STRUCTURES FOR INCREASED VOLTAGE

    公开(公告)号:US20240282809A1

    公开(公告)日:2024-08-22

    申请号:US18171090

    申请日:2023-02-17

    CPC classification number: H01L29/0619 H01L29/0696 H01L29/1095 H01L29/66477

    Abstract: A super junction device with an increased voltage rating may be formed by decreasing the width of the P-type region and increasing the doping concentration, while also increasing the height of the overall device. However, instead of etching a trench in the N-type material to fill with the P-type material, a trench may be etched for both the P-type region and an adjacent N-type region. This allows the height of the overall device to be increased while maintaining a feasible aspect ratio for the trench. The P-type material may then be formed as a sidewall liner on the trench that is relatively thin compared to the remaining width of the trench. The trench may then be filled with N-type material such that the P-type region fills the space between the N-type regions without any voids or seams, while having a width that would be unattainable using traditional etch-and-fill methods for the P-type region alone.

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