MODELING FOR INDEXING AND SEMICONDUCTOR DEFECT IMAGE RETRIEVAL

    公开(公告)号:US20240177286A1

    公开(公告)日:2024-05-30

    申请号:US18070744

    申请日:2022-11-29

    CPC classification number: G06T7/0004 G01N21/9501 G06T2207/30148

    Abstract: The subject matter of this specification can be implemented in, among other things, methods, systems, computer-readable storage medium. A method can include a processing device storing a plurality of feature vectors representative of previously processed image frames that correspond to various substrate processing defects. The method further includes receiving first image data comprising one or more image frames indicative of a first substrate processing defect. The method further includes determining a first feature vector corresponding to the first image data. The method further includes determining a selection of the plurality of feature vectors based on a proximity between the first feature vector and each of the selection of the plurality of feature vectors. The method further includes determining second image data comprising one or more image frames corresponding to the selection of the plurality of embedding vectors and performing an action based on determining the second image data.

    OPTICAL INSPECTION-BASED AUTOMATIC DEFECT CLASSIFICATION

    公开(公告)号:US20250117915A1

    公开(公告)日:2025-04-10

    申请号:US18482209

    申请日:2023-10-06

    Abstract: Implementations disclosed describe, among other things, a systems and techniques for perform efficient inspection of a semiconductor manufacturing sample. The techniques include collecting optical inspection data for training sample(s) that have a plurality of defects. The techniques further include generating, using the optical inspection data, a training data set that includes descriptions, images, and ground truth classifications for the defects. The techniques further include using the training data set to train a plurality of machine learning (ML) classifiers to generate predicted classifications for the defects in the training sample(s). The techniques further include selecting, using the predicted classifications and the ground truth classifications, one or more ML classifiers that meet one or more accuracy criteria, and using the selected ML classifier(s) to classify defects in the semiconductor manufacturing sample.

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