公开(公告)号：US20240128061A1

公开(公告)日：2024-04-18

申请号：US18233760

申请日：2023-08-14

Applicant: Applied Materials, Inc.

Inventor： FARZAD HOUSHMAND ,  KELVIN CHAN ,  RUIYING HAO ,  WAYNE FRENCH

IPC: H01J37/32

CPC classification number: H01J37/32715 ,  H01J37/32357 ,  H01J37/32449 ,  H01J2237/20214 ,  H01J2237/334

Abstract: Embodiments disclosed herein include a semiconductor processing tool. In an embodiment, the semiconductor processing tool comprises a pedestal, an annular separator over the pedestal to define a first domain within the annular separator and a second domain outside of the annular separator, a first gas inlet within the annular separator, and a second gas inlet outside of the annular separator.

公开(公告)号：US20230124304A1

公开(公告)日：2023-04-20

申请号：US17903892

申请日：2022-09-06

Applicant: Applied Materials, Inc.

Inventor： Kelvin Chan ,  RUIYING HAO ,  WAYNE FRENCH ,  FARZAD HOUSHMAND

IPC: C23C16/455 ,  C23C14/54 ,  C23C16/52

Abstract: Embodiments include a gas distribution assembly for a semiconductor processing chamber. In an embodiment, the gas distribution assembly comprises a flow ratio controller (FRC). In an embodiment, a first line from the FRC goes to an ampoule, and a second line from the FRC goes to a main line. In an embodiment, a third line from the ampoule goes to the main line. In an embodiment, a mass flow meter is coupled to the main line.