公开(公告)号：US20240068096A1

公开(公告)日：2024-02-29

申请号：US18199223

申请日：2023-05-18

Applicant: Applied Materials, Inc.

Inventor： Anantha K. SUBRAMANI ,  Seyyed Abdolreza FAZELI ,  Yang GUO ,  Chandrashekara BAGINAGERE ,  Ramcharan SUNDAR ,  Steven MOSBRUCKER ,  John LEE ,  Yiyang WAN ,  Shumao ZHANG ,  Dhritiman Subha KASHYAP ,  Azhar ALI M.A

IPC: C23C16/455 ,  C23C16/505

CPC classification number: C23C16/4557 ,  C23C16/505

Abstract: In some embodiments, a showerhead assembly includes a heated showerhead having a heater plate and a gas distribution plate coupled together; an ion filter spaced from the heated showerhead; a spacer ring in contact between the heated showerhead and the ion filter; a remote plasma region between the heated showerhead and the ion filter; an upper isolator spaced from the spacer ring and supported on the ion filter; a sealing ring fastened to the heated showerhead sealing against the upper isolator and pushing the upper isolator against the ion filter; a gap between a bottom of the gas distribution plate and a top of the ion filter, the gap being in fluid communication with the remote plasma region; a first passage extending through the heater plate; and a second passage in communication with the first passage and extending through the gas distribution plate, the second passage extending to the gap.

公开(公告)号：US20220319822A1

公开(公告)日：2022-10-06

申请号：US17848573

申请日：2022-06-24

Applicant: Applied Materials, Inc.

Inventor： John Joseph MAZZOCCO ,  Anantha K. SUBRAMANI ,  Yang GUO

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/50 ,  C23C14/14 ,  H01J37/32 ,  C23C14/58

Abstract: Apparatus and methods for forming and using internally divisible physical vapor deposition (PVD) process chambers using shutter disks are provided herein. In some embodiments, an internally divisible process chamber may include an upper chamber portion having a conical shield, a conical adaptor, a cover ring, and a target, a lower chamber portion having a substrate support having inner and outer deposition rings, and wherein the substrate support is vertically movable, and a shutter disk assembly configured to internally divide the process chamber and create a separate sealed deposition cavity and a separate sealed oxidation cavity, wherein the shutter disk assembly includes one or more seals disposed along its outer edges and configured to contact at least one of the conical shield, the conical adaptor, or the deposition rings to form the separate sealed deposition and oxidation cavities.

公开(公告)号：US20220139684A1

公开(公告)日：2022-05-05

申请号：US17183587

申请日：2021-02-24

Applicant: Applied Materials, Inc.

Inventor： John Joseph MAZZOCCO ,  Anantha K. SUBRAMANI ,  Yang GUO

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/50 ,  C23C14/14 ,  C23C14/58 ,  H01J37/32

Abstract: Apparatus and methods for forming and using internally divisible physical vapor deposition (PVD) process chambers using shutter disks are provided herein. In some embodiments, an internally divisible process chamber may include an upper chamber portion having a conical shield, a conical adaptor, a cover ring, and a target, a lower chamber portion having a substrate support having inner and outer deposition rings, and wherein the substrate support is vertically movable, and a shutter disk assembly configured to internally divide the process chamber and create a separate sealed deposition cavity and a separate sealed oxidation cavity, wherein the shutter disk assembly includes one or more seals disposed along its outer edges and configured to contact at least one of the conical shield, the conical adaptor, or the deposition rings to form the separate sealed deposition and oxidation cavities.

公开(公告)号：US20230335377A1

公开(公告)日：2023-10-19

申请号：US17721417

申请日：2022-04-15

Applicant: Applied Materials, Inc.

Inventor： Anantha K. SUBRAMANI ,  Seyyed Abdolreza FAZELI ,  Yang GUO ,  Chandrashekara BAGINAGERE ,  Ramcharan SUNDAR ,  Yunho KIM ,  Rajasekhar PATIBANDLA

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/505

CPC classification number: H01J37/3244 ,  H01J37/32422 ,  H01J37/32357 ,  C23C16/45565 ,  C23C16/505 ,  H01J2237/332

Abstract: Methods and apparatus for substrate processing are described. In some embodiments a showerhead assembly includes a heated showerhead having a heater and a gas diffusion plate coupled to the heater, the gas diffusion plate having a plurality of channels extending through the gas diffusion plate; an ion filter spaced from the heated showerhead, the ion filter having a first side facing the heated showerhead and a second side opposite the first side, the ion filter having a plurality of channels extending through the ion filter; a heat transfer ring in contact between the heated showerhead and the ion filter, the heat transfer ring being thermally conductive and electrically insulative, the heat transfer ring comprised of a plurality of elements spaced from one another along an interface between the heated showerhead and the ion filter; and a remote plasma region defined between the heated showerhead and the ion filter.