公开(公告)号：US20230335377A1

公开(公告)日：2023-10-19

申请号：US17721417

申请日：2022-04-15

Applicant: Applied Materials, Inc.

Inventor： Anantha K. SUBRAMANI ,  Seyyed Abdolreza FAZELI ,  Yang GUO ,  Chandrashekara BAGINAGERE ,  Ramcharan SUNDAR ,  Yunho KIM ,  Rajasekhar PATIBANDLA

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/505

CPC classification number: H01J37/3244 ,  H01J37/32422 ,  H01J37/32357 ,  C23C16/45565 ,  C23C16/505 ,  H01J2237/332

Abstract: Methods and apparatus for substrate processing are described. In some embodiments a showerhead assembly includes a heated showerhead having a heater and a gas diffusion plate coupled to the heater, the gas diffusion plate having a plurality of channels extending through the gas diffusion plate; an ion filter spaced from the heated showerhead, the ion filter having a first side facing the heated showerhead and a second side opposite the first side, the ion filter having a plurality of channels extending through the ion filter; a heat transfer ring in contact between the heated showerhead and the ion filter, the heat transfer ring being thermally conductive and electrically insulative, the heat transfer ring comprised of a plurality of elements spaced from one another along an interface between the heated showerhead and the ion filter; and a remote plasma region defined between the heated showerhead and the ion filter.