公开(公告)号：US11866821B2

公开(公告)日：2024-01-09

申请号：US16806656

申请日：2020-03-02

Applicant: Applied Materials, Inc.

Inventor： Shuran Sheng ,  Lin Zhang ,  Jiyong Huang ,  Joseph C. Werner ,  Stanley Wu ,  Mahesh Adinath Kanawade ,  Yikai Chen ,  Yixing Lin ,  Ying Ma

IPC: C23C16/44 ,  C01F17/265 ,  C23C16/458 ,  C01F17/229 ,  C01F17/218

CPC classification number: C23C16/4404 ,  C01F17/265 ,  C23C16/4405 ,  C23C16/4581 ,  C23C16/4585 ,  C01F17/218 ,  C01F17/229

Abstract: Embodiments of the present disclosure generally relate to an apparatus and a method for cleaning a processing chamber. In one embodiment, a substrate support cover includes a bulk member coated with a fluoride coating. The substrate support cover is placed on a substrate support disposed in the processing chamber during a cleaning process. The fluoride coating does not react with the cleaning species. The substrate support cover protects the substrate support from reacting with the cleaning species, leading to reduced condensation formed on chamber components, which in turn leads to reduced contamination of the substrate in subsequent processes.

公开(公告)号：US10934620B2

公开(公告)日：2021-03-02

申请号：US15822276

申请日：2017-11-27

Applicant: Applied Materials, Inc.

Inventor： Ying Ma ,  Daemian Raj ,  Jay D. Pinson, II ,  DongQing Li ,  Jingmei Liang ,  Yizhen Zhang

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/54 ,  H01J37/32 ,  C23C16/452 ,  C23C16/458

Abstract: Implementations described herein generally relate to an apparatus for forming flowable films. In one implementation, the apparatus is a processing chamber including a first RPS coupled to a lid of the processing chamber and a second RPS coupled to a side wall of the processing chamber. The first RPS is utilized for delivering deposition radicals into a processing region in the processing chamber and the second RPS is utilized for delivering cleaning radicals into the processing region. The processing chamber further includes a radical delivery ring disposed between a showerhead and a substrate support for delivering cleaning radicals from the second RPS into the processing region. Having separate RPSs for deposition and clean along with introducing radicals from the RPSs into the processing region using separate delivery channels minimizes cross contamination and cyclic change on the RPSs, leading to improved deposition rate drifting and particle performance.

公开(公告)号：US10428426B2

公开(公告)日：2019-10-01

申请号：US15494186

申请日：2017-04-21

Applicant: Applied Materials, Inc.

Inventor： Daemian Raj ,  Ying Ma ,  DongQing Li ,  Jay D. Pinson, II

IPC: C23C16/40 ,  C23C16/50 ,  C23C16/44 ,  C23C16/455 ,  H01J37/32 ,  C23C16/452 ,  C23C16/54

Abstract: A method and apparatus for a deposition chamber is provided and includes a twin chamber that includes a first remote plasma system coupled and dedicated to a first processing region, a second remote plasma system coupled and dedicated to a second processing region, and a third remote plasma system shared by the first processing region and the second processing region.

公开(公告)号：US20240387145A1

公开(公告)日：2024-11-21

申请号：US18692954

申请日：2021-09-17

Applicant: Applied Materials, Inc.

Inventor： Jong Yun Kim ,  William Nehrer ,  Sang Jeong Oh ,  Ying Ma

IPC: H01J37/32 ,  C25D11/02

Abstract: Exemplary diffusers for a substrate processing chamber may include a diffuser body that is characterized by a first surface on an inlet side of the diffuser body and a second surface on an outlet side of the diffuser body. The diffuser body may define a plurality of apertures through a thickness of the diffuser body. The first surface may not be anodized. The second surface may be anodized.

公开(公告)号：US10763154B2

公开(公告)日：2020-09-01

申请号：US16114558

申请日：2018-08-28

Applicant: Applied Materials, Inc.

Inventor： Ying Ma ,  Yixi Tian ,  Shih Chang Chen ,  Jin Sun ,  Rodolfo Perez ,  Stanley Wu

IPC: H01L21/687 ,  G01B21/30 ,  G01B5/00 ,  H01L21/67

Abstract: The present disclosure relates to a flexible support to aid in a measurement of flatness of a susceptor. The flexible support has a first support block having a substantially flat upper surface and a lower surface having a first aperture formed therein. The flexible support further has a second support block having a substantially flat lower surface and an upper surface having a second aperture formed therein. The flexible support further has a support pin configured to be receivable in the first aperture and the second aperture, the support pin configured to retain the first support block and the second support block in a spaced apart relation while allowing restricted motion of the first support block relative to the second support block via deformation of the support pin. The flexible support further has a guide disposed between the first support block and the second support block, the guide configured to allow the first support block and the second support block to move axially relative to the guide.