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公开(公告)号:US12077880B2
公开(公告)日:2024-09-03
申请号:US17243158
申请日:2021-04-28
Applicant: Applied Materials, Inc.
Inventor: Zhepeng Cong , Nyi Oo Myo , Tao Sheng , Yong Zheng
IPC: C30B25/16 , C23C14/50 , C23C14/54 , C23C16/458 , C23C16/46 , C23C16/52 , C30B23/00 , C30B23/06 , C30B25/10 , C30B25/12 , G01N21/55 , B41J2/16 , G01B11/06 , H01L21/02 , H01L21/66 , H01L21/67
CPC classification number: C30B25/16 , C23C14/50 , C23C14/541 , C23C14/547 , C23C16/4583 , C23C16/46 , C23C16/52 , C30B23/002 , C30B23/063 , C30B25/10 , C30B25/12 , G01N21/55 , B01J2219/00443 , B41J2/1642 , G01B11/0625 , G01N2201/062 , H01L21/02266 , H01L21/02271 , H01L21/67253 , H01L22/12 , H01L22/26
Abstract: Embodiments of the present disclosure generally relate to apparatus, systems, and methods for in-situ film growth rate monitoring. A thickness of a film on a substrate is monitored during a substrate processing operation that deposits the film on the substrate. The thickness is monitored while the substrate processing operation is conducted. The monitoring includes directing light in a direction toward a crystalline coupon. The direction is perpendicular to a heating direction. In one implementation, a reflectometer system to monitor film growth during substrate processing operations includes a first block that includes a first inner surface. The reflectometer system includes a light emitter disposed in the first block and oriented toward the first inner surface, and a light receiver disposed in the first block and oriented toward the first inner surface. The reflectometer system includes a second block opposing the first block.