公开(公告)号：US12077880B2

公开(公告)日：2024-09-03

申请号：US17243158

申请日：2021-04-28

Applicant: Applied Materials, Inc.

Inventor： Zhepeng Cong ,  Nyi Oo Myo ,  Tao Sheng ,  Yong Zheng

IPC: C30B25/16 ,  C23C14/50 ,  C23C14/54 ,  C23C16/458 ,  C23C16/46 ,  C23C16/52 ,  C30B23/00 ,  C30B23/06 ,  C30B25/10 ,  C30B25/12 ,  G01N21/55 ,  B41J2/16 ,  G01B11/06 ,  H01L21/02 ,  H01L21/66 ,  H01L21/67

CPC classification number: C30B25/16 ,  C23C14/50 ,  C23C14/541 ,  C23C14/547 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  C30B23/002 ,  C30B23/063 ,  C30B25/10 ,  C30B25/12 ,  G01N21/55 ,  B01J2219/00443 ,  B41J2/1642 ,  G01B11/0625 ,  G01N2201/062 ,  H01L21/02266 ,  H01L21/02271 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/26

Abstract: Embodiments of the present disclosure generally relate to apparatus, systems, and methods for in-situ film growth rate monitoring. A thickness of a film on a substrate is monitored during a substrate processing operation that deposits the film on the substrate. The thickness is monitored while the substrate processing operation is conducted. The monitoring includes directing light in a direction toward a crystalline coupon. The direction is perpendicular to a heating direction. In one implementation, a reflectometer system to monitor film growth during substrate processing operations includes a first block that includes a first inner surface. The reflectometer system includes a light emitter disposed in the first block and oriented toward the first inner surface, and a light receiver disposed in the first block and oriented toward the first inner surface. The reflectometer system includes a second block opposing the first block.