Level sensor, lithographic apparatus, and substrate surface positioning method
    1.
    发明授权
    Level sensor, lithographic apparatus, and substrate surface positioning method 有权
    液位传感器,光刻设备和基板表面定位方法

    公开(公告)号:US08675210B2

    公开(公告)日:2014-03-18

    申请号:US13603168

    申请日:2012-09-04

    IPC分类号: G01B11/14

    摘要: A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译: 用于测量衬底表面的位置的电平传感器包括:投影单元,包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅,使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元,其包括第一和第二测量检测器,第一和第二捕获检测器,检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅,其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件,经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD
    2.
    发明申请
    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
    水平传感器,光刻设备和基板表面定位方法

    公开(公告)号:US20130077079A1

    公开(公告)日:2013-03-28

    申请号:US13603168

    申请日:2012-09-04

    IPC分类号: G03F9/00 G01B11/06

    摘要: A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译: 用于测量衬底表面的位置的电平传感器包括:投影单元,包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅,使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元,其包括第一和第二测量检测器,第一和第二捕获检测器,检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅,其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件,经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号:US20100231881A1

    公开(公告)日:2010-09-16

    申请号:US12722902

    申请日:2010-03-12

    IPC分类号: G03B27/54 G01B11/14 G01B11/24

    CPC分类号: G01B11/0608 G03F9/7034

    摘要: The invention provides a level sensor configured to measure a height level of a substrate comprising: a projection unit to project a measurement beam on the substrate, a detection unit to receive the measurement beam after reflection on the substrate, a processing unit to calculate a height level on the basis of the reflected measurement beam received by the detection unit, wherein the level sensor further comprises a tilt measuring device, wherein the tilt measuring device is arranged to receive at least partially the reflected measurement beam, and configured to provide a tilt signal representative for a tilt of the substrate with respect to a nominal plane.

    摘要翻译: 本发明提供一种水平传感器,其被配置为测量基板的高度水平,包括:投影单元,用于将测量光束投影在基板上;检测单元,用于在基板上反射之后接收测量光束;处理单元,用于计算高度 基于由所述检测单元接收的所述反射的测量光束的水平面,其中所述液位传感器还包括倾斜测量装置,其中所述倾斜测量装置被布置成至少部分地接收所述反射的测量光束,并且被配置为提供倾斜信号 代表衬底相对于标称平面的倾斜。