公开(公告)号：US5384167A

公开(公告)日：1995-01-24

申请号：US31492

申请日：1993-03-15

申请人： Atsushi Nishiwaki ,  Norihito Ikemiya ,  Hiroshi Uchiyama ,  Hideo Inagaki ,  Yasuo Sawada ,  Kazumi Ogino

发明人： Atsushi Nishiwaki ,  Norihito Ikemiya ,  Hiroshi Uchiyama ,  Hideo Inagaki ,  Yasuo Sawada ,  Kazumi Ogino

IPC分类号： C23C16/50 ,  C23C8/36 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  B05D3/06

CPC分类号： C23C8/36

摘要： This invention provides a method for the surface treatment of a metal, which comprises the steps of: placing at least a surface to be treated of a metal to be treated between two electrodes facing each other under an atmosphere of a mixed gas consisting of an inert gas and a reactant gas; and plasma exciting said mixed gas under atmospheric pressure to effect glow discharge between said electrodes. The method of the present invention uses an apparatus simpler than that used in a conventional method and can inject into the surface layer of a metal, even those elements which have been difficult to with the conventional method, and can readily modify surface properties of a metal such as surface hardness, surface wettability, etc.

摘要翻译： 本发明提供了一种用于表面处理金属的方法，其包括以下步骤：在由惰性气体组成的混合气体的气氛下，将待处理金属的至少一个待处理表面放置在彼此面对的两个电极之间 气体和反应气体; 以及在大气压下等离子体激发所述混合气体，以在所述电极之间实现辉光放电。 本发明的方法使用比常规方法中使用的装置更简单的装置，并且可以注入到金属的表面层中，甚至是用常规方法难以达到的元素，并且可以容易地改变金属的表面性质 如表面硬度，表面润湿性等

公开(公告)号：US20080251108A1

公开(公告)日：2008-10-16

申请号：US11663324

申请日：2005-09-14

申请人： Tatsuo Nagai ,  Norihito Ikemiya ,  Haruyoshi Yamakawa ,  Hideki Kobayashi ,  Hiroshi Morita

发明人： Tatsuo Nagai ,  Norihito Ikemiya ,  Haruyoshi Yamakawa ,  Hideki Kobayashi ,  Hiroshi Morita

IPC分类号： B08B13/00

CPC分类号： C25B1/28 ,  B08B3/08 ,  B08B3/14 ,  C02F2103/346 ,  H01L21/67057

摘要： If incorporated in a cleaning system using persulfuric acid, the invention serves for continuous cleaning while increasing the persulfuric acid concentration adequately to ensure enhanced cleaning performance. The invention provides a feeding apparatus that feeds persulfuric acid to a cleaning apparatus. The cleaning system uses an electrolysis reactor 10 that regenerates the persulfuric acid solution by performing electrolytic reaction to produce persulfate ions from sulfate ions contained in the solution, and a circulation line 4, 5, 6 that circulates the persulfuric acid solution between the cleaning vessel 1 and the electrolysis reactor 10. Configured as above, the invention can provides a feeding apparatus. The cleaning system comprises said configuration and a cleaning vessel 1 that cleans objects 30 using a persulfuric acid solution 2 as cleaning fluid.

摘要翻译： 如果加入使用过硫酸的清洁系统中，本发明用于连续清洗，同时适当地增加过硫酸浓度以确保增强的清洁性能。 本发明提供一种将过硫酸供给到清洁装置的进料装置。 清洗系统使用电解反应器10，该电解反应器10通过进行电解反应，从溶液中含有的硫酸根离子生成过硫酸根离子，再循环过硫酸溶液;以及循环管线4,5,6，其将过硫酸溶液循环在清洗容器1 如上所述，本发明可以提供一种供给装置。 清洁系统包括所述构造和使用过硫酸溶液2作为清洁流体清洁物体30的清洁容器1。

公开(公告)号：US20110247929A1

公开(公告)日：2011-10-13

申请号：US12998181

申请日：2009-09-18

申请人： Tatsuo Nagai ,  Norihito Ikemiya ,  Katsuhito Yoshida ,  Shigeru Yoshida

发明人： Tatsuo Nagai ,  Norihito Ikemiya ,  Katsuhito Yoshida ,  Shigeru Yoshida

IPC分类号： C25B11/12 ,  B05D5/12 ,  H01B5/00

CPC分类号： C02F1/46109 ,  C02F2001/46138 ,  C23C16/271 ,  C25B11/0447

摘要： A diamond electrode having an oxidation resistant diamond film which will not separate from the electrode during electrolysis with highly oxidizing materials. The thickness of the diamond film is 20 pm or more and the diamond film should preferably cover opposite side surfaces of a substrate in such a manner as to also cover end surfaces 2a of the substrate. The surfaces of the substrate are covered with a plurality of diamond layers to form the film using repeated steps of forming separate diamond layers with each diamond layer having a thickness of 10 to 30 pm on one of the surfaces of the substrate and then forming a diamond layer having a thickness of 10 to 30 pm on the other surface of the substrate. Thus, it is possible to form a nonporous surface of diamond layer and prevent deterioration of an electrode caused by the separation of a diamond film.

摘要翻译： 具有抗氧化金刚石膜的金刚石电极，其在用高度氧化的材料电解期间不会与电极分离。 金刚石膜的厚度为20μm以上，并且金刚石膜优选以覆盖基板的端面2a的方式覆盖基板的相对侧面。 衬底的表面被多个金刚石层覆盖，以通过重复的步骤形成单独的金刚石层，每个金刚石层的厚度为10至30μm，其中一个表面上形成金刚石，然后形成金刚石 层在基板的另一个表面上具有10至30μm的厚度。 因此，可以形成金刚石层的无孔表面，并防止金刚石膜分离引起的电极劣化。

公开(公告)号：US09593424B2

公开(公告)日：2017-03-14

申请号：US11663324

申请日：2005-09-14

申请人： Tatsuo Nagai ,  Norihito Ikemiya ,  Haruyoshi Yamakawa ,  Hideki Kobayashi ,  Hiroshi Morita

发明人： Tatsuo Nagai ,  Norihito Ikemiya ,  Haruyoshi Yamakawa ,  Hideki Kobayashi ,  Hiroshi Morita

IPC分类号： C25B1/28 ,  B08B3/08 ,  B08B3/14 ,  H01L21/67 ,  C02F103/34

CPC分类号： C25B1/28 ,  B08B3/08 ,  B08B3/14 ,  C02F2103/346 ,  H01L21/67057

摘要： If incorporated in a cleaning system using persulfuric acid, the invention serves for continuous cleaning while increasing the persulfuric acid concentration adequately to ensure enhanced cleaning performance. The invention provides a feeding apparatus that feeds persulfuric acid to a cleaning apparatus. The cleaning system uses an electrolysis reactor 10 that regenerates the persulfuric acid solution by performing electrolytic reaction to produce persulfate ions from sulfate ions contained in the solution, and a circulation line 4, 5, 6 that circulates the persulfuric acid solution between the cleaning vessel 1 and the electrolysis reactor 10. Configured as above, the invention can provides a feeding apparatus. The cleaning system comprises said configuration and a cleaning vessel 1 that cleans objects 30 using a persulfuric acid solution 2 as cleaning fluid.

摘要翻译： 如果加入使用过硫酸的清洁系统中，本发明用于连续清洗，同时适当地增加过硫酸浓度以确保增强的清洁性能。 本发明提供一种将过硫酸供给到清洁装置的进料装置。 清洗系统使用电解反应器10，该电解反应器10通过进行电解反应，从溶液中含有的硫酸根离子生成过硫酸根离子，再循环过硫酸溶液;以及循环管线4,5,6，其将过硫酸溶液循环在清洗容器1 如上所述，本发明可以提供一种供给装置。 清洁系统包括所述构造和使用过硫酸溶液2作为清洁流体清洁物体30的清洁容器1。