公开(公告)号：US10483086B2

公开(公告)日：2019-11-19

申请号：US14978120

申请日：2015-12-22

Applicant: Axcelis Technologies, Inc.

Inventor： Andy M. Ray ,  Edward C. Eisner ,  Bo H. Vanderberg

IPC: H01J37/30 ,  H01J37/304 ,  H01J37/317

Abstract: An ion implantation system and method are provided where an ion beam is tuned to a first process recipe. The ion beam is scanned along a scan plane at a first frequency, defining a first scanned ion beam. A beam profiling apparatus is translated through the first scanned ion beam and one or more properties of the first scanned ion beam are measured across a width of the first scanned ion, thus defining a first beam profile associated with the first scanned ion beam. The ion beam is then scanned at a second frequency, thus defining a second scanned ion beam, wherein the second frequency is less than the first frequency. A second beam profile associated with the second scanned ion beam is determined based, at least in part, on the first beam profile. Ions are subsequently implanted into a workpiece via the second scanned ion beam.

公开(公告)号：US20160189928A1

公开(公告)日：2016-06-30

申请号：US14979663

申请日：2015-12-28

Applicant: Axcelis Technologies, Inc.

Inventor： Bo H. Vanderberg ,  Andy M. Ray

IPC: H01J37/304 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3045 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/24405 ,  H01J2237/24514 ,  H01J2237/24528 ,  H01J2237/24535

Abstract: A method for improving the productivity of a hybrid scan implanter by determining an optimum scan width is provided. A method of tuning a scanned ion beam is provided, where a desired beam current is determined to implant a workpiece with desired properties. The scanned beam is tuned utilizing a setup Faraday cup. A scan width is adjusted to obtain an optimal scan width using setup Faraday time signals. Optics are tuned for a desired flux value corresponding to a desired dosage. Uniformity of a flux distribution is controlled when the desired flux value is obtained. An angular distribution of the ion beam is further measured.

Abstract translation: 提供了一种通过确定最佳扫描宽度来提高混合扫描注入机的生产率的方法。 提供了一种调整扫描离子束的方法，其中确定期望的束电流以将具有期望特性的工件植入。 扫描的光束利用设置的法拉第杯进行调谐。 调整扫描宽度以使用设置法拉第时间信号获得最佳扫描宽度。 调整光学对应于期望剂量的期望通量值。 当获得期望的通量值时，控制通量分布的均匀性。 进一步测量离子束的角度分布。

公开(公告)号：US20160189926A1

公开(公告)日：2016-06-30

申请号：US14978120

申请日：2015-12-22

Applicant: Axcelis Technologies, Inc.

Inventor： Andy M. Ray ,  Edward C. Eisner ,  Bo H. Vanderberg

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/3171 ,  H01J2237/24514 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01J2237/30483 ,  H01J2237/31703

Abstract: An ion implantation system and method are provided where an ion beam is tuned to a first process recipe. The ion beam is scanned along a scan plane at a first frequency, defining a first scanned ion beam. A beam profiling apparatus is translated through the first scanned ion beam and one or more properties of the first scanned ion beam are measured across a width of the first scanned ion, thus defining a first beam profile associated with the first scanned ion beam. The ion beam is then scanned at a second frequency, thus defining a second scanned ion beam, wherein the second frequency is less than the first frequency. A second beam profile associated with the second scanned ion beam is determined based, at least in part, on the first beam profile. Ions are subsequently implanted into a workpiece via the second scanned ion beam.

Abstract translation: 提供离子注入系统和方法，其中离子束被调谐到第一处理配方。 沿着扫描平面以第一频率扫描离子束，限定第一扫描离子束。 光束成像设备通过第一扫描离子束平移，并且跨越第一扫描离子的宽度测量第一扫描离子束的一个或多个特性，从而限定与第一扫描离子束相关联的第一光束轮廓。 然后以第二频率扫描离子束，从而限定第二扫描离子束，其中第二频率小于第一频率。 至少部分地基于第一光束轮廓确定与第二扫描离子束相关联的第二光束轮廓。 随后通过第二扫描离子束将离子植入工件。

公开(公告)号：US09711329B2

公开(公告)日：2017-07-18

申请号：US14979663

申请日：2015-12-28

Applicant: Axcelis Technologies, Inc.

Inventor： Bo H. Vanderberg ,  Andy M. Ray

IPC: G21K5/04 ,  H01J37/304 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3045 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/24405 ,  H01J2237/24514 ,  H01J2237/24528 ,  H01J2237/24535

Abstract: A method for improving the productivity of a hybrid scan implanter by determining an optimum scan width is provided. A method of tuning a scanned ion beam is provided, where a desired beam current is determined to implant a workpiece with desired properties. The scanned beam is tuned utilizing a setup Faraday cup. A scan width is adjusted to obtain an optimal scan width using setup Faraday time signals. Optics are tuned for a desired flux value corresponding to a desired dosage. Uniformity of a flux distribution is controlled when the desired flux value is obtained. An angular distribution of the ion beam is further measured.