公开(公告)号：US11728187B2

公开(公告)日：2023-08-15

申请号：US16229572

申请日：2018-12-21

Applicant: Axcelis Technologies, Inc.

Inventor： John Baggett ,  Joseph Ferrara

IPC: H01L21/67 ,  C23C16/458 ,  C23C16/52 ,  H01L21/683 ,  H01J37/32 ,  H01L21/265 ,  H01J37/317 ,  C23C16/44

CPC classification number: H01L21/67098 ,  C23C16/4412 ,  C23C16/4586 ,  C23C16/52 ,  H01J37/3171 ,  H01J37/32724 ,  H01L21/265 ,  H01L21/67248 ,  H01L21/6833

Abstract: A system, method, and apparatus for heating and cooling a component in chamber enclosing a chamber volume. Vacuum and purge gas ports are in fluid communication with the chamber volume. A heater apparatus selectively heats the heated apparatus to a process temperature. A vacuum valve provides selective fluid communication between a vacuum source and the vacuum port. A purge gas valve provides selective fluid communication between a purge gas source for a purge gas and the purge gas port. A controller controls the heater apparatus, vacuum and purge gas valves and to selectively flow the purge gas to the chamber volume when an equipment-safe temperature is reached. When an operator-safe temperature is reached, access to the chamber volume through an access port by an operator is permitted.

公开(公告)号：US11114330B2

公开(公告)日：2021-09-07

申请号：US16549239

申请日：2019-08-23

Applicant: Axcelis Technologies, Inc.

Inventor： John Baggett ,  Dave Shaner

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/683

Abstract: A workpiece support has a support surface where one or more standoffs are selectively removably coupled to the support surface. The one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface. A gap may be defined between the support surface and the workpiece. The one or more standoffs may be an electrically insulative film, such as a polyimide film that is selectively removably coupled to the support surface by an adhesive. The workpiece support may be an electrostatic chuck (ESC). Electrodes positioned below the support surface may electrostatically attract the workpiece toward the support, where a gas may be introduced in the gap.

公开(公告)号：US20210366746A1

公开(公告)日：2021-11-25

申请号：US17393737

申请日：2021-08-04

Applicant: Axcelis Technologies, Inc.

Inventor： Joseph Ferrara ,  Brian Terry ,  John Baggett

IPC: H01L21/67 ,  C23C14/48 ,  H01L21/683 ,  H01J37/317 ,  H01L21/687 ,  C23C14/56

Abstract: A heated chuck for an ion implantation system selectively clamps a workpiece to a carrier plate having heaters to selectively heat a clamping surface. A gap between a base plate and carrier plate of the heated chuck contains a heat transfer media. A cooling fluid source is coupled to cooling channels in the base plate. A controller operates the heated chuck in a first mode and second mode. In the first mode, the controller does not activate the heaters and flows the cooling fluid through the cooling channel, where heat is transferred through the heat transfer media and to the cooling fluid. In the second mode, the controller activates the heaters and optionally purges the cooling fluid from the cooling channel or otherwise alters its cooling capacity. A gas can be selectively provided in the gap to further control heat transfer in the first and second modes.

公开(公告)号：US20200066570A1

公开(公告)日：2020-02-27

申请号：US16549239

申请日：2019-08-23

Applicant: Axcelis Technologies, Inc.

Inventor： John Baggett ,  Dave Shaner

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/683

Abstract: A workpiece support has a support surface where one or more standoffs are selectively removably coupled to the support surface. The one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface. A gap may be defined between the support surface and the workpiece. The one or more standoffs may be an electrically insulative film, such as a polyimide film that is selectively removably coupled to the support surface by an adhesive. The workpiece support may be an electrostatic chuck (ESC). Electrodes positioned below the support surface may electrostatically attract the workpiece toward the support, where a gas may be introduced in the gap.

公开(公告)号：US11011397B2

公开(公告)日：2021-05-18

申请号：US16227399

申请日：2018-12-20

Applicant: Axcelis Technologies, Inc.

Inventor： John Baggett

IPC: H01L21/67 ,  H01L21/683 ,  H01L21/687

Abstract: A workpiece processing system and method provides an end effector coupled to a workpiece transfer apparatus. The end effector has support members for selectively contacting and supporting a workpiece. One or more temperature sensors are coupled to the support members and are configured to contact a backside of the workpiece to measure and define one or more measured temperatures of the workpiece. A heated chuck has a support surface at a predetermined temperature, and is configured to radiate heat from the support surface. A controller control the workpiece transfer apparatus to selectively support the workpiece at a predetermined distance from the support surface of the heated chuck to radiatively heat the workpiece, and to selectively transfer the workpiece from the end effector to the support surface of the heated chuck based, at least in part, on the one or more measured temperatures.

公开(公告)号：US10128084B1

公开(公告)日：2018-11-13

申请号：US15707473

申请日：2017-09-18

Applicant: Axcelis Technologies, Inc.

Inventor： John Baggett ,  Joe Ferrara ,  Brian Terry

IPC: H01L21/67 ,  G21K5/08 ,  H01J37/317 ,  H01L21/265 ,  H01J37/302 ,  H01J37/147 ,  G01K7/22 ,  H01J37/18

Abstract: A system and method is provided maintaining a temperature of a workpiece during an implantation of ions in an ion implantation system, where the ion implantation system is characterized with a predetermined set of parameters. A heated chuck is provided at a first temperature and heats the workpiece to the first temperature. Ions are implanted into the workpiece concurrent with the heating, and thermal energy is imparted into the workpiece by the ion implantation. A desired temperature of the workpiece is maintained within a desired accuracy during the implantation of ions by selectively heating the workpiece on the heated chuck to a second temperature. The desired temperature is maintained based, at least in part, on the characterization of the ion implantation system. Thermal energy imparted into the workpiece from the implantation is mitigated by the selective heating of the workpiece on the heated chuck at the second temperature.

公开(公告)号：US20180197761A1

公开(公告)日：2018-07-12

申请号：US15866209

申请日：2018-01-09

Applicant: Axcelis Technologies, Inc.

Inventor： Joseph Ferrara ,  Brian Terry ,  John Baggett

IPC: H01L21/67 ,  C23C14/48 ,  H01L21/683 ,  H01L21/687 ,  C23C14/56 ,  H01J37/317

CPC classification number: H01L21/67248 ,  C23C14/48 ,  C23C14/56 ,  H01J37/3171 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67213 ,  H01L21/6833 ,  H01L21/68728

Abstract: A heated chuck for an ion implantation system selectively clamps a workpiece to a carrier plate having heaters to selectively heat a clamping surface. A gap between a base plate and carrier plate of the heated chuck contains a heat transfer media. A cooling fluid source is coupled to cooling channels in the base plate. A controller operates the heated chuck in a first mode and second mode. In the first mode, the controller does not activate the heaters and flows the cooling fluid through the cooling channel, where heat is transferred through the heat transfer media and to the cooling fluid. In the second mode, the controller activates the heaters and optionally purges the cooling fluid from the cooling channel or otherwise alters its cooling capacity. A gas can be selectively provided in the gap to further control heat transfer in the first and second modes.

公开(公告)号：US20180138006A1

公开(公告)日：2018-05-17

申请号：US15350832

申请日：2016-11-14

Applicant: Axcelis Technologies, Inc.

Inventor： John Baggett ,  Neil Colvin

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0206 ,  H01J2237/022 ,  H01J2237/038

Abstract: An insulator for an ion source is positioned between the apertured ground electrode and apertured suppression electrode. The insulator has an elongate body having a first end and a second end, where one or more features are defined in the elongate body and increase a gas conductance path along a surface of the elongate body from the first end to the second end. One or more of the features is an undercut extending generally axially or at a non-zero angle from an axis of the elongate body into the elongate body. One of the features can be a rib extending from a radius of the elongate body.