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    ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER
    1.
    发明申请
    ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER 有权

    公开(公告)号：US20250051949A1

    公开(公告)日：2025-02-13

    申请号：US18720906

    申请日：2022-12-20

    Applicant: BASF SE

    Inventor： Charlotte EMNET ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

    IPC: C25D3/38 ,  C25D5/00 ,  C25D7/12

    Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including
    (a) copper ions;
    (b) a grain refiner of formula G1a or G1b or salts thereof; (c) a complexing agent; and
    (d) optionally a buffer or a base to adjust the pH to a pH of from 7 to 13;
    wherein
    RG1 is selected from one or more H, C1 to C4 carboxyl, C1 to C4 alkyl, C1 to C6 alkoxy, halogen, and CN;
    RG2 is selected from one or more H, C1 to C4 carboxyl, C1 to C4 alkyl, C1 to C6 alkoxy, halogen, and CN; and
    XG1 is selected from C1 to 6 alkanediyl or a group —XG11—C(O)—O—XG12—;
    XG11 is selected from a chemical bond or C1 to C4 alkandiyl;
    XG12 is selected from a chemical bond or C1 to C4 alkandiyl; and wherein RG1 or RG2, comprises at least one C1 to C4 carboxyl group, or group XG1 is —XG11—C(O)—O—)—XG12—; wherein the pH of the composition is from 7 to 13.

    Composition For Copper Electroplating On A Cobalt Seed
    2.
    发明公开
    Composition For Copper Electroplating On A Cobalt Seed 审中-公开

    公开(公告)号：US20230265576A1

    公开(公告)日：2023-08-24

    申请号：US18005171

    申请日：2021-06-30

    Applicant: BASF SE

    Inventor： Charlotte EMNET ,  Verena STREMPEL ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Robert BRAENDLE ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

    IPC: C25D3/38

    CPC classification number: C25D3/38

    Abstract: Described herein is an acidic aqueous composition for copper electroplating including

    (a) copper ions;
    (b) bromide ions; and
    (c) at least one additive of formula S1






    where
    XS1 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl;
    RS1 is a monovalent

    (a) poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group, or
    (b) a poly(oxyethylene)-block-poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group;


    RS2, RS3, RS4

    (a) are selected from the group consisting of H, RS1, RS40, or
    (b) RS3 and an adjacent group RS4 or, if n>2, two adjacent groups RS4 may together form a divalent group XS3;


    RS40 is selected from the group consisting of (a) linear or branched C1-C20 alkyl, and (b) linear or branched C1-C20 alkenyl;
    XS3 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl; and
    n is an integer of from 1 to 6.

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