公开(公告)号：US20240060201A1

公开(公告)日：2024-02-22

申请号：US17753653

申请日：2020-09-08

Applicant: BASF SE

Inventor： Marco ARNOLD ,  Alexander FLUEGEL ,  Elisabeth KUTTNER ,  Doris KREMZOW-GRAW ,  Nadine ENGELHARDT ,  Johannes KASCHEL

IPC: C25D3/32 ,  C25D3/64 ,  C07C321/20 ,  C07C335/18 ,  C07D213/32 ,  C07D277/26 ,  C07D233/60

CPC classification number: C25D3/32 ,  C25D3/64 ,  C07C321/20 ,  C07C335/18 ,  C07D213/32 ,  C07D277/26 ,  C07D233/60

Abstract: An aqueous composition including (a) metal ions including tin ions and silver ions and (b) at least one complexing agent of formula C11


RC12-XC11-RC11   (C11)

and their salts,



where
XC11 is selected from

(a) a divalent 5 or 6 membered aromatic N-heterocyclic group;
(b) a divalent 6 membered aromatic carbocyclic group; and
(c) a divalent 5 or 6 membered aliphatic N-heterocyclic group including one N atom and optionally a second heteroatom selected from N and O;


 all of which may be unsubstituted or substituted by one or more OH or one or more RC14;
RC11 is selected from










 ; and
RC12 is selected from RC11, XC11-RC11, H, OH, NRC142, C1 to C10 alkyl, and C1 to C10 alkoxy

公开(公告)号：US20230265576A1

公开(公告)日：2023-08-24

申请号：US18005171

申请日：2021-06-30

Applicant: BASF SE

Inventor： Charlotte EMNET ,  Verena STREMPEL ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Robert BRAENDLE ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

IPC: C25D3/38

CPC classification number: C25D3/38

Abstract: Described herein is an acidic aqueous composition for copper electroplating including

(a) copper ions;
(b) bromide ions; and
(c) at least one additive of formula S1






where
XS1 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl;
RS1 is a monovalent

(a) poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group, or
(b) a poly(oxyethylene)-block-poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group;


RS2, RS3, RS4

(a) are selected from the group consisting of H, RS1, RS40, or
(b) RS3 and an adjacent group RS4 or, if n>2, two adjacent groups RS4 may together form a divalent group XS3;


RS40 is selected from the group consisting of (a) linear or branched C1-C20 alkyl, and (b) linear or branched C1-C20 alkenyl;
XS3 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl; and
n is an integer of from 1 to 6.

公开(公告)号：US20220298664A1

公开(公告)日：2022-09-22

申请号：US17805144

申请日：2022-06-02

Applicant: BASF SE

Inventor： Nadine ENGELHARDT ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Lucas Benjamin HENDERSON

IPC: C25D3/18 ,  C25D7/12 ,  C25D5/02

Abstract: Described herein is a cobalt electrodeposition composition including cobalt ions, and particular leveling agents including X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, where X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11— and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, and X11 is a divalent C1 to C15 alkandiyl group.

公开(公告)号：US20190309429A1

公开(公告)日：2019-10-10

申请号：US16468467

申请日：2017-12-19

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Dieter MAYER ,  Marco ARNOLD ,  Alexandra HAAG ,  Charlotte EMNET ,  Alexander FLUEGEL

IPC: C25D3/32 ,  C25D3/38 ,  C25D7/12 ,  H01L21/288

Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.

公开(公告)号：US20250051950A1

公开(公告)日：2025-02-13

申请号：US18721238

申请日：2022-12-20

Applicant: BASF SE

Inventor： Charlotte EMNET ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

IPC: C25D3/38 ,  C25D5/02 ,  C25D7/12 ,  H01L21/768 ,  H01L23/532

Abstract: Disclosed herein is a composition for depositing copper on a semiconductor substrate, the composition including (a) copper ions; (b) an additive of formula S1 (c) a complexing agent; and (d) optionally a buffer or base to adjust the pH to a pH of from 7 to 13; where the pH of the composition is from 7 to 13 and where the composition is free of any cyanide.

公开(公告)号：US20230142238A1

公开(公告)日：2023-05-11

申请号：US17995186

申请日：2021-03-24

Applicant: BASF SE

Inventor： Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Nadine ENGELHARDT

IPC: C25D3/38

CPC classification number: C25D3/38

Abstract: Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1


[A-B-A′-Z]n[Y—Z]m  (L1)

where
B is a diacid fragment of formula L2




A, A′ are amine fragments independently selected from the group consisting of formula L3a






and formula L3b








Y is a co-monomer fragment;

Z is a coupling fragment of formula L4





n is an integer of from 1 to 400; and

m is 0 or an integer of from 1 to 400.

公开(公告)号：US20210079548A1

公开(公告)日：2021-03-18

申请号：US16954333

申请日：2018-12-10

Applicant: BASF SE

Inventor： Alexander FLUEGEL ,  Marco ARNOLD ,  Marcel Patrik KIENLE ,  Nadine ENGELHARDT

IPC: C25D3/32 ,  C25D3/60 ,  C25D7/12

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I where X1, X2 are independently selected from a linear or branched C1-C12 alkanediyl, R11 is a monovalent group of formula —(O—CH2—CHR41)m—OR42, R12, R13, R14 are independently selected from H, R11, and R40; R15 is selected from H, R11, R40 and —X4—N(R21)2, X4 is a divalent group selected from (a) a linear or branched C1 to C12 alkanediyl, and (b) formula —(O—CH2—CHR41)o—, R21 is selected from R11 and R40, R40 is a linear or branched C1-C20 alkyl, R41 is selected from H and a linear or branched C1 to C5 alkyl, R42 is selected from H and a linear or branched C1-C20 alkyl, n is an integer of from 1 to 6, m is an integer of from 2 to 250, and o is an integer of from 1 to 250.

公开(公告)号：US20210040635A1

公开(公告)日：2021-02-11

申请号：US17082765

申请日：2020-10-28

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET

IPC: C25D3/16 ,  C25D7/12 ,  C25D3/18 ,  H01L21/288 ,  H01L23/532 ,  H01L21/768 ,  H01L23/522

Abstract: A composition comprising (a) cobalt ions, and (b) an additive of formula I wherein R1 is selected from X-Y; R2 is selected from R1 and R3; X is selected from linear or branched C1 to C10 alkanediyl, linear or branched C2 to C10 alkenediyl, linear or branched C2 to C10 alkynediyl, and (C2H3R6—O)m—H; Y is selected from OR3, NR3R4, N+R3R4R5 and NH—(C═O)—R3; R3, R4, R5 are the same or different and are selected from (i) H, (ii) C5 to C20 aryl, (iii) C1 to C10 alkyl (iv) C6 to C20 arylalkyl, (v) C6 to C20 alkylaryl, which may be substituted by OH, SO3H, COOH or a combination thereof, and (vi) (C2H3R6—O)n—H, and wherein R3 and R4 may together form a ring system, which may be interrupted by O or NR7; m, n are integers independently selected from 1 to 30; R6 is selected from H and C1 to C5 alkyl; R7 is selected from R6 and

公开(公告)号：US20250051949A1

公开(公告)日：2025-02-13

申请号：US18720906

申请日：2022-12-20

Applicant: BASF SE

Inventor： Charlotte EMNET ,  Lucas Benjamin HENDERSON ,  Alexander FLUEGEL ,  Sathana KITAYAPORN ,  Nadine ENGELHARDT

IPC: C25D3/38 ,  C25D5/00 ,  C25D7/12

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including
(a) copper ions;
(b) a grain refiner of formula G1a or G1b or salts thereof; (c) a complexing agent; and
(d) optionally a buffer or a base to adjust the pH to a pH of from 7 to 13;
wherein
RG1 is selected from one or more H, C1 to C4 carboxyl, C1 to C4 alkyl, C1 to C6 alkoxy, halogen, and CN;
RG2 is selected from one or more H, C1 to C4 carboxyl, C1 to C4 alkyl, C1 to C6 alkoxy, halogen, and CN; and
XG1 is selected from C1 to 6 alkanediyl or a group —XG11—C(O)—O—XG12—;
XG11 is selected from a chemical bond or C1 to C4 alkandiyl;
XG12 is selected from a chemical bond or C1 to C4 alkandiyl; and wherein RG1 or RG2, comprises at least one C1 to C4 carboxyl group, or group XG1 is —XG11—C(O)—O—)—XG12—; wherein the pH of the composition is from 7 to 13.

公开(公告)号：US20230235471A1

公开(公告)日：2023-07-27

申请号：US18001078

申请日：2021-06-07

Applicant: BASF SE

Inventor： Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Nadine ENGELHARDT

IPC: C25D3/38 ,  C08G73/02 ,  C08K3/08 ,  C08K5/3415 ,  C25D7/12

CPC classification number: C25D3/38 ,  C08G73/024 ,  C08K3/08 ,  C08K5/3415 ,  C25D7/12 ,  C08K2003/085

Abstract: Disclosed herein is a A polyalkanolamine including the structure of formula L1









A
L




n






B
L




m





wherein

AL is





BL is




-






O-X


L21





o

-,














XL1, XL2, XL3 are independently selected from a C1 to C6 alkanediyl;
ArL is a 5 or 6 membered N-heteroaromatic ring system including from 1 to 4 N atoms, which may be unsubstituted or substituted by C1 to C6 alkyl;
n is an integer of from 2 to 350;
m is 0 or an integer of from 1 to 600;
o is 1 or an integer of from 2 to 25;
BL1 is a continuation of the backbone BL by branching;
XL11, XL12, XL13 are independently selected from a C1 to C6 alkanediyl;
XL21 is a C1 to C6 alkanediyl;

and derivatives thereof obtainable by N-protonation, N-quaternization, substitution, or polyalkoxylation.