Abstract:
A PROCESS FOR MASKED PLANAR DIFFUSION OF GALLIUM INTO THE UNMASKED PORTION OF A BULK SEMICONDUCTOR IS DESCRIBED IN WHICH THE DIFFUSION OCCURS IN A COMPLETELY WATER-FREE INERT AMBIENT SUCH AS NITROGEN GAS. A QUARTZ BOX DIFFUSION CAPSULE IS USED WITH A CONVENTIONAL DIFFUSION FURNACE IN WHICH THE NITROGEN CIRCULATES THROUGHOUT THE PROCESS.