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公开(公告)号:US20200370193A1
公开(公告)日:2020-11-26
申请号:US16987978
申请日:2020-08-07
发明人: Robert H. Coridan , James M. Lowe
IPC分类号: C25D9/08 , H01L31/0224 , C25D9/00 , C25D5/48 , C25D7/12 , H01L21/288 , H01L21/321 , H05K3/02
摘要: A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.
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公开(公告)号:US20190177867A1
公开(公告)日:2019-06-13
申请号:US16327732
申请日:2017-08-29
发明人: Robert H. Coridan , James M. Lowe
IPC分类号: C25D9/08 , H05K3/02 , H01L21/288 , H01L21/321 , C25D7/12
摘要: A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.
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公开(公告)号:US11214885B2
公开(公告)日:2022-01-04
申请号:US16987978
申请日:2020-08-07
发明人: Robert H. Coridan , James M. Lowe
IPC分类号: C25D9/08 , C25D5/02 , C25D7/12 , H01L31/0224 , C25D9/00 , C25D5/48 , C25D5/00 , H01L21/288 , H01L21/321 , H05K3/02
摘要: A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.
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公开(公告)号:US10793965B2
公开(公告)日:2020-10-06
申请号:US16327732
申请日:2017-08-29
发明人: Robert H. Coridan , James M. Lowe
IPC分类号: C25D9/08 , H01L31/0224 , C25D9/00 , C25D5/48 , C25D7/12 , H01L21/288 , H01L21/321 , H05K3/02
摘要: A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.
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