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公开(公告)号：US11866628B2
公开(公告)日：2024-01-09
申请号：US17227466
申请日：2021-04-12
发明人： Haowei Wang
IPC分类号： C09K11/06 , H10K85/30 , H10K50/115 , H10K50/125
CPC分类号： C09K11/06 , H10K85/326 , H10K85/331 , H10K85/361 , H10K85/371 , H10K85/381 , C09K2211/1077 , C09K2211/187 , C09K2211/188 , H10K50/115 , H10K50/125
摘要： Disclosed are a quantum dot material, a method for patterning a quantum dot film and a quantum dot light emitting device. when preparing a patterned quantum dot film, firstly, a quantum dot film is made by using the quantum dot material with the photolysis group, and a corresponding region of the quantum dot film is irradiated with ultraviolet light under the shielding of a mask template, so that the photolysis group in the corresponding region is photolyzed into the polarity change group, thereby changing the solubility of the quantum dot material in the corresponding region; and subsequently, the quantum dot film is cleaned by using a solvent which can dissolve the quantum dot material with the photolysis group, the quantum dot material in non-irradiated regions is dissolved and removed, and the quantum dot material in the corresponding region is retained to form a pattern of the quantum dot film.
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公开(公告)号：US20240237388A1
公开(公告)日：2024-07-11
申请号：US17922821
申请日：2021-12-29
发明人： Zhigao Lu , Haowei Wang , Xiaoyuan Zhang , Zhuo Chen
IPC分类号： H10K50/16 , H10K50/115 , H10K71/20 , H10K101/30 , H10K102/00
CPC分类号： H10K50/166 , H10K50/115 , H10K71/233 , H10K2101/30 , H10K2102/351
摘要： The present application provides a light emitting device and a producing method thereof, and a display device, which relates to the technical field of displaying, and may solve the problem of quantum-dot remaining. A light emitting device, wherein the light emitting device includes: a plurality of light emitting areas that are arranged in an array, and non-light emitting areas between neighboring light emitting areas; each of the light emitting areas includes an inorganic electron transporting layer, an organic electron transporting layer and a quantum-dot layer that are arranged sequentially in layer configuration; and an absolute value of a difference between an energy value of a lowest unoccupied molecular orbital of the inorganic electron transporting layer and an energy value of a lowest unoccupied molecular orbital of the organic electron transporting layer is less than or equal to a preset value.
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公开(公告)号：US20240182783A1
公开(公告)日：2024-06-06
申请号：US17760253
申请日：2021-10-28
发明人： Jingwen Feng , Wenhai Mei , Haowei Wang
IPC分类号： C09K11/56 , C09K11/66 , C09K11/70 , C09K11/88 , G03F7/004 , H10K59/12 , H10K59/35 , H10K71/13
CPC分类号： C09K11/565 , C09K11/661 , C09K11/665 , C09K11/70 , C09K11/883 , G03F7/0045 , H10K59/1201 , H10K71/13 , H10K59/35
摘要： A quantum dots material solution is provided. The quantum dots material solution includes a quantum dots material; a ligand chelated to the quantum dots material; a fast material capable of generating, upon a first irradiation, a quencher quenching the quantum dots material; a second material capable of at least partially converting the quantum dots material in a plurality of block regions from a first form into a second form. The quantum dots material in the second form has a lower solubility in a developing solution than the quantum dots material in the first form.
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公开(公告)号：US12127464B2
公开(公告)日：2024-10-22
申请号：US17429523
申请日：2020-03-18
发明人： Wenhai Mei , Zhenqi Zhang , Aidi Zhang , Xiaoyuan Zhang , Haowei Wang
IPC分类号： H10K71/00 , H10K50/125 , H10K50/115
CPC分类号： H10K71/00 , H10K50/125 , H10K50/115
摘要： Embodiments of the present disclosure provide a quantum dot light emitting device, a preparation method thereof and a quantum dot display panel, the method includes: forming a first function layer; forming a first sacrificial layer and a first photoresist layer; patterning the first photoresist layer; patterning the first sacrificial layer, the first function layer includes a first part and a second part, and the first sacrificial layer pattern and the first photoresist pattern are stacked on the first part, the second part is exposed by the first sacrificial layer pattern and the first photoresist pattern; forming a first quantum dot material layer; stripping the first sacrificial layer pattern to remove the first sacrificial layer pattern, the first photoresist pattern and the first quantum dot material layer on the first sacrificial layer pattern, retaining the first quantum dot material layer on the second part of the first function layer.
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公开(公告)号：US11958999B2
公开(公告)日：2024-04-16
申请号：US17286428
申请日：2020-09-11
发明人： Wenhai Mei , Zhenqi Zhang , Aidi Zhang , Xiaoyuan Zhang , Haowei Wang
IPC分类号： C09K11/02 , B82Y20/00 , B82Y40/00 , C07C59/90 , C09D11/037 , C09D11/50 , C09K11/88 , H10K50/115 , H10K71/13 , H10K85/30
CPC分类号： C09K11/025 , C07C59/90 , C09D11/037 , C09D11/50 , C09K11/883 , H10K85/381 , B82Y20/00 , B82Y40/00 , H10K50/115 , H10K71/13
摘要： The present disclosure relates to a ligand for a quantum dot, a ligand quantum dot, a quantum dot layer and a method for patterning the same. The surface of the ligand quantum dot of the present disclosure is connected with the cleavage-type ligand including a first ligand unit A, a cleavage unit B, and an adhesion adjusting unit C. The method includes: providing a substrate; coating a mixture containing the ligand quantum dot on the substrate to form a quantum dot film; exposing a preset region of the quantum dot film to ultraviolet light, so that the cleavage unit B in the cleavage-type ligand undergoes a photolysis reaction, and a molecular segment containing the adhesion adjusting unit C and obtained after decomposition is detached from a surface of the quantum dot; and washing off an unexposed region of the quantum dot film with an organic solvent, followed by drying.
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公开(公告)号：US20220310983A1
公开(公告)日：2022-09-29
申请号：US17429523
申请日：2020-03-18
发明人： Wenhai Mei , Zhenqi Zhang , Aidi Zhang , Xiaoyuan Zhang , Haowei Wang
摘要： Embodiments of the present disclosure provide a quantum dot light emitting device, a preparation method thereof and a quantum dot display panel, the method includes: forming a first function layer; forming a first sacrificial layer and a first photoresist layer; patterning the first photoresist; patterning the first sacrificial layer, the first function layer includes a first part and a second part, and the first sacrificial layer pattern and the first photoresist pattern are stacked on the first part, the second part is exposed by the first sacrificial layer pattern and the first photoresist pattern; forming a first quantum dot material layer; stripping the first sacrificial layer pattern to remove the first sacrificial layer pattern, the first photoresist pattern and the first quantum dot material layer on the first sacrificial layer pattern, retaining the first quantum dot material layer on the second part of the first function layer.
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