Display panel and display device
    7.
    发明授权

    公开(公告)号:US10379396B2

    公开(公告)日:2019-08-13

    申请号:US15718711

    申请日:2017-09-28

    摘要: The present disclosure discloses a display panel and a display device. The display panel includes an array substrate and an opposite substrate arranged opposite to each other; the array substrate includes a box alignment area facing the opposite substrate, a circuit test area located on a side of the box alignment area; the opposite substrate includes a base substrate, a conductive black matrix arranged on a side of the base substrate facing the array substrate; the display panel further includes an electrostatic discharging layer electrically connected respectively with the conductive black matrix and a GND wire in the circuit test area; the conductive black matrix is provided with a thickened area in at least an area in contact with the electrostatic discharging layer; a thickness of the thickened area of the conductive black matrix is more than a thickness of other areas of the conductive black matrix.

    THIN FILM PATTERNING METHOD AND THIN FILM PATTERNING APPARATUS
    8.
    发明申请
    THIN FILM PATTERNING METHOD AND THIN FILM PATTERNING APPARATUS 审中-公开
    薄膜图案和薄膜图案设备

    公开(公告)号:US20150360253A1

    公开(公告)日:2015-12-17

    申请号:US14527565

    申请日:2014-10-29

    IPC分类号: B05B15/04

    CPC分类号: H01L51/0011 H01L27/1288

    摘要: Disclosed herein is a thin film patterning method and a thin film patterning apparatus. The thin film patterning method comprises the steps of: disposing a mask above a substrate, wherein the mask is provided with hollow-out parts which are identical with preset deposition patterns; and covering the mask with a thin film, wherein the thin film at hollow-out parts of the mask is formed on the substrate, while the remaining area of the substrate shielded by the mask is free of the thin film, so that a patterned thin film is formed on the substrate. The thin film patterning method in the present disclosure can transfer directly patterns on the mask to the substrate through one-step deposition, omit the process steps of photolithography and etching, simplify the process flow to a large extent, and save the costs of the thin film patterning.

    摘要翻译: 本文公开了薄膜图案化方法和薄膜图案形成装置。 薄膜图案化方法包括以下步骤:在基板上设置掩模,其中掩模设置有与预设沉积图案相同的中空部分; 并用薄膜覆盖掩模,其中在掩模的中空部分处的薄膜形成在基板上,而由掩模屏蔽的基板的剩余区域没有薄膜,使得图案化的薄膜 在基板上形成膜。 本公开中的薄膜图案化方法可以通过一步沉积将掩模上的图案直接转印到基板上,省略光刻和蚀刻的工艺步骤,在很大程度上简化了工艺流程,并节省了薄的成本 电影图案