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    Beam exposure writing strategy system and method
    3.
    发明申请
    Beam exposure writing strategy system and method 失效
    光束曝光写作策略系统及方法

    公开(公告)号：US20070075275A1

    公开(公告)日：2007-04-05

    申请号：US11243304

    申请日：2005-10-03

    申请人： Benyamin Buller ,  Richard Lozes

    发明人： Benyamin Buller ,  Richard Lozes

    IPC分类号： H01J37/302

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/30488 ,  H01J2237/30494

    摘要： A beam exposure writing strategy method and system are disclosed for exposing a desired pattern on a substrate, by raster scanning a beam such as a particle beam, across a major field on the substrate. The beam is also vector scanned across a minor field of the substrate superimposed along the major field raster scan. The beam is selectively blanked and unblanked as the beam is being scanned. The unblanked flashes of the beam are modulated in coordination with the raster and vector scanning to expose the desired pattern on the substrate. The disclosed system and method generating an adjustable length microvector having a maximum range of at least about N time a nominal length λ, where N is equal to four and λ is substantially equal to a dimension of a nominal flash area, the nominal flash location dimension being substantially greater than a major field cell dimension.

    摘要翻译： 公开了一种束曝光写入策略方法和系统，用于通过在衬底上的主场上光栅扫描诸如粒子束的光束来在衬底上暴露期望的图案。 光束也沿着主场光栅扫描叠加的衬底的次视场矢量扫描。 当光束被扫描时，光束被选择性地消隐并且被清除。 与光栅和矢量扫描协调地调制光束的未闪烁闪光以暴露衬底上的期望图案。 所公开的系统和方法产生可调长度的微向量，其具有至少约N倍的标称长度λ的最大范围，其中N等于4，并且λ基本上等于标称闪光区域的尺寸，标称闪光位置尺寸 远远大于主要的电池尺寸。

    Writing a circuit design pattern with shaped particle beam flashes
    5.
    发明申请
    Writing a circuit design pattern with shaped particle beam flashes 失效
    编写具有成形粒子束闪光的电路设计图案

    公开(公告)号：US20070085032A1

    公开(公告)日：2007-04-19

    申请号：US11243299

    申请日：2005-10-03

    申请人： Benyamin Buller ,  Richard Lozes ,  Robert Sills

    发明人： Benyamin Buller ,  Richard Lozes ,  Robert Sills

    IPC分类号： G01N23/00

    CPC分类号： H01J37/302 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776 ,  Y10S430/143

    摘要： A shaped particle beam writing strategy can be used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary polygons. The writing strategy comprises transforming and fracturing the arbitrary polygons into a plurality of restricted polygons, each restricted polygon being represented by a location coordinate, at least two dimension coordinates, and at least one external edge indicator. Thereafter, the restricted polygons are tiled into a set of tiles comprising interior tiles and external edge tiles. Flash data is assigned for each tile such that the interior tiles are assigned a first flash area and the external edge tiles are assigned a second flash area that is smaller than the first flash area. The flash data is arranged in a selected order to write the pattern with a modulated particle beam, such as an electron beam, on a substrate.

    摘要翻译： 可以使用成形的粒子束写入策略来将具有粒子束的图案写入到衬底上。 该图案包括断裂成多个任意多边形的电路设计。 写入策略包括将任意多边形变换和压缩成多个受限多边形，每个受限多边形由位置坐标，至少两个维度坐标以及至少一个外部边缘指示符表示。 此后，将限制的多边形平铺成包括内部瓦片和外部边缘瓦片的一组瓦片。 为每个瓦片指定闪存数据，使得内部瓦片被分配第一闪光区域，并且外部边缘瓦片被分配比第一闪光区域小的第二闪光区域。 闪光数据以选定的顺序排列，以便在衬底上用诸如电子束的调制的粒子束来写入图案。

    Placement effects correction in raster pattern generator
    6.
    发明申请
    Placement effects correction in raster pattern generator 失效
    栅格图案生成器中的放置效果校正

    公开(公告)号：US20070085031A1

    公开(公告)日：2007-04-19

    申请号：US11241887

    申请日：2005-09-30

    申请人： Richard Lozes ,  Benyamin Buller

    发明人： Richard Lozes ,  Benyamin Buller

    IPC分类号： G21G5/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31769 ,  H01J2237/31796 ,  Y10S430/143

    摘要： A method for generating a flash. The method includes computing a displacement vector to resist charging. The displacement vector is defined as {right arrow over (δ)}c=dP{circle around (x)}{right arrow over (K)}, where {right arrow over (δ)}crepresents the displacement vector, d represents dose correction multipliers, P represents a pattern and {right arrow over (K)} represents a Poisson kernel converted to a spatial domain. The method further includes using the displacement vector to modify the positioning of the flash.

    摘要翻译： 一种产生闪光灯的方法。 该方法包括计算位移矢量以抵抗充电。 位移矢量被定义为{右箭头（（delta）） = dP {圆周（x {向右箭头（K，其中{右箭头（（delta）}） / SUB>表示位移矢量，d表示剂量校正乘数，P表示图案，{右箭头（K表示转换为空间域的泊松核），该方法还包括使用位移矢量修改闪光灯的位置 。

    ELECTROSTATIC PARTICLE BEAM DEFLECTOR
    7.
    发明申请
    ELECTROSTATIC PARTICLE BEAM DEFLECTOR 失效
    静电颗粒光束偏转器

    公开(公告)号：US20070075887A1

    公开(公告)日：2007-04-05

    申请号：US11242976

    申请日：2005-10-03

    申请人： Scott Stovall ,  Richard Lozes

    发明人： Scott Stovall ,  Richard Lozes

    IPC分类号： H03M1/12

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00

    摘要： An electrostatic deflector for a particle beam apparatus comprises opposing deflector plates that face one another across a particle beam gap and are electrostatically chargeable. Each deflector plate comprises its own voltage driver, which has a DAC and amplifier. Digital electronics receives an input digital code that expresses the complementary voltages to be applied to opposing deflector plates. When the input digital code is determined to provide a non-linear output response voltage from a DAC, the digital electronics provides an output digital code with a different digital code that provides a linear response from the DAC while providing the same differential voltage between the first and second deflector plates.

    摘要翻译： 用于粒子束装置的静电偏转器包括相对的偏转板，其相对于颗粒束间隙彼此面对并且可静电充电。 每个偏转板包括其自身的电压驱动器，其具有DAC和放大器。 数字电子设备接收一个输入数字代码，表示要施加到相对的偏转板上的互补电压。 当确定输入数字代码以提供来自DAC的非线性输出响应电压时，数字电子设备提供具有不同数字代码的输出数字代码，其提供来自DAC的线性响应，同时在第一 和第二偏转板。