公开(公告)号：US09947596B2

公开(公告)日：2018-04-17

申请号：US15227698

申请日：2016-08-03

申请人： KLA-Tencor Corporation

发明人： Hemanta Kumar Roy ,  Arpit Jain ,  Arpit Yati ,  Olivier Moreau ,  Arun Lobo

IPC分类号： H01J37/22 ,  H01J37/28 ,  H01J37/20 ,  H01L21/66

CPC分类号： H01L22/00 ,  H01J2237/24571 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20

摘要： A technique to identify non-visual defects, such as SEM non-visual defects (SNVs), includes generating an image of a layer of a wafer, evaluating at least one attribute of the image using a classifier, and identifying the non-visual defects on the layer of the wafer. A controller can be configured to identify the non-visual defects using the classifier. This controller can communicate with a defect review tool, such as a scanning electron microscope (SEM).

公开(公告)号：US20170301509A1

公开(公告)日：2017-10-19

申请号：US15165658

申请日：2016-05-26

申请人： DONGFANG JINGYUAN ELECTRON LIMITED

发明人： Weimin Ma ,  Weiqiang Sun

IPC分类号： H01J37/20 ,  H01J37/18

CPC分类号： H01J37/20 ,  G03F1/86 ,  G03F7/7065 ,  H01J37/18 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/18 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20292 ,  H01J2237/24571 ,  H01J2237/2817 ,  H01L22/12

摘要： Techniques for yield management in semiconductor inspection systems are described. According to one aspect of the present invention, columns of sensing mechanism are configured with different functions, weights and performances to inspect a sample to significantly reduce the time that would be otherwise needed when all the columns were equally applied.

公开(公告)号：US07700380B2

公开(公告)日：2010-04-20

申请号：US11151068

申请日：2005-06-13

申请人： Takeo Ushiki ,  Keizo Yamada ,  Yohsuke Itagaki ,  Tohru Tsujide

发明人： Takeo Ushiki ,  Keizo Yamada ,  Yohsuke Itagaki ,  Tohru Tsujide

IPC分类号： H01L21/66

CPC分类号： G01N21/9501 ,  G21K7/00 ,  H01J2237/24507 ,  H01J2237/24571 ,  H01J2237/24592 ,  H01L21/02063 ,  H01L22/12

摘要： A semiconductor wafer is radiated with an electron beam so that the inelastic scattering takes place in the narrow region, and current flows out from the narrow region; the amount of current is dependent on the substance or substances in the narrow region so that the analyst evaluates the degree of contamination on the basis of the substance or substances specified in the narrow region.

摘要翻译： 用电子束照射半导体晶片，使得非弹性散射发生在窄区域，电流从窄区域流出; 当前的数量取决于狭窄地区的物质或物质，以便分析人员根据狭义地区规定的物质或物质评估污染程度。

公开(公告)号：US07423277B2

公开(公告)日：2008-09-09

申请号：US11374945

申请日：2006-03-14

申请人： Alexander S. Perel ,  Phil J. Ring ,  Ronald A. Capodilupo ,  Michael A. Graf

发明人： Alexander S. Perel ,  Phil J. Ring ,  Ronald A. Capodilupo ,  Michael A. Graf

IPC分类号： H01J37/317 ,  H01J49/10

CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01J2237/24571 ,  H01J2237/30472 ,  H01J2237/30477

摘要： An image monitor system monitors characteristics of an ion beam employed in ion implantation. The monitored characteristics can include particle count, particle information, beam current intensity, beam shape, and the like. The system includes one or more image sensors that capture frames or images along a beam path of an ion beam. An image analyzer analyzes the captured frames to obtain measured characteristics. A controller determines adjustments or corrections according to the measured characteristics and desired beam characteristics.

摘要翻译： 图像监视器系统监测离子注入中使用的离子束的特性。 监测的特征可以包括粒子数，粒子信息，束电流强度，束形状等。 该系统包括一个或多个图像传感器，其捕获沿着离子束的光束路径的帧或图像。 图像分析仪分析捕获的帧以获得测量的特征。 控制器根据测量的特性和期望的波束特性来确定调整或校正。

公开(公告)号：US20070210249A1

公开(公告)日：2007-09-13

申请号：US10574868

申请日：2004-10-06

申请人： Stefano Alberici

发明人： Stefano Alberici

IPC分类号： H01J47/00

CPC分类号： H01J37/256 ,  G01N23/227 ,  H01J37/05 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/06316 ,  H01J2237/24571 ,  H01J2237/2511 ,  H01J2237/2561

摘要： An electroscope system excites a certain area of a surface of a sample to emit electrons with a characteristic distribution of kinetic energies. The analyzed area of the sample is excited by an electron beam produced by a field emission source. A monochromator energy filter for the electron beam is down-stream of the field emission source. The field emission electron source is preferably a Schottky source, and a monochromator energy filter reduces energy dispersion of the electrons of the electron beam to less than 0.2 eV. Microareas of linear dimensions on the order of ten nanometers may be analyzed while observing them. Information on the chemical state of the detected elements present at the surface of the examined microarea of the sample is gathered.

摘要翻译： 电镜系统激发样品表面的一定面积以发射具有动能特征分布的电子。 样品的分析区域由场致发射源产生的电子束激发。 用于电子束的单色器能量滤波器是场发射源的下游。 场发射电子源优选为肖特基源，单色器能量滤波器将电子束的电子的能量分散减小到小于0.2eV。 可以在观察它们的同时分析十纳米级的线性尺寸的微孔。 收集检测到的微区表面上检测到的元素的化学状态的信息。

公开(公告)号：US20070145269A1

公开(公告)日：2007-06-28

申请号：US11537062

申请日：2006-09-29

申请人： BENYAMIN BULLER ,  William Devore ,  Juergen Frosien ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler

发明人： BENYAMIN BULLER ,  William Devore ,  Juergen Frosien ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler

IPC分类号： G21K7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/244 ,  H01J2237/004 ,  H01J2237/0213 ,  H01J2237/0262 ,  H01J2237/2448 ,  H01J2237/24571

摘要： Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for example, as a current signal. Thus, for such embodiments, the baffle arrangement may double as a detector, allowing an image of surface (e.g., a mask or substrate surface) to be generated.

摘要翻译： 提供了有助于测量由防雾挡板装置收集的散射电子量的方法和装置。 对于一些实施例，通过将引线附接到挡板装置的电隔离（浮动）部分，由此收集的散射电子的量可以例如被读出为电流信号。 因此，对于这样的实施例，挡板装置可以作为检测器加倍，从而允许产生表面（例如，掩模或衬底表面）的图像。

公开(公告)号：US11903755B2

公开(公告)日：2024-02-20

申请号：US16910088

申请日：2020-06-24

申请人： Weng-Dah Ken ,  Fang-Chi Kan

发明人： Weng-Dah Ken ,  Fang-Chi Kan

IPC分类号： A61B6/00 ,  G01N37/00 ,  G01B9/02 ,  H01J37/244 ,  G01N23/20 ,  H01J37/26 ,  G01B15/00 ,  G04F5/14 ,  H01J37/04

CPC分类号： A61B6/4258 ,  A61B6/4035 ,  G01B9/02 ,  G01B15/00 ,  G01N23/20 ,  G01N37/005 ,  G04F5/14 ,  H01J37/04 ,  H01J37/244 ,  H01J37/26 ,  G01B2290/55 ,  H01J2237/06383 ,  H01J2237/24557 ,  H01J2237/24571 ,  H01J2237/24578 ,  H01J2237/24585 ,  H01J2237/2614

摘要： A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.

公开(公告)号：US11658012B2

公开(公告)日：2023-05-23

申请号：US17118987

申请日：2020-12-11

申请人： Tokyo Electron Limited

发明人： Toshiyuki Arakane ,  Tetsu Tsunamoto ,  Masanori Sato ,  Yoshinori Osaki

IPC分类号： H01J37/32

CPC分类号： H01J37/32449 ,  H01J37/32082 ,  H01J37/32577 ,  H01J2237/24571 ,  H01J2237/334

摘要： A control method includes: (a) connecting a power supply to an electrode of an electrostatic chuck inside a chamber and applying a voltage from the power supply to the electrode; (b) after (a), switching a connection between the electrode and the power supply to a non-connection state; (c) after (b), supplying a gas into the chamber to generate plasma; and (d) measuring a potential of the electrode during (c).

公开(公告)号：US09171696B2

公开(公告)日：2015-10-27

申请号：US14298249

申请日：2014-06-06

申请人： Vineet Kumar

发明人： Vineet Kumar

IPC分类号： G01N23/20 ,  G01N23/225 ,  H01J37/22 ,  G01N23/203 ,  G01N33/38 ,  H01J37/28

CPC分类号： H01J37/22 ,  G01N23/203 ,  G01N33/385 ,  H01J37/28 ,  H01J2237/24571 ,  H01J2237/2802

摘要： Methods of orientation imaging microscopy (OIM) techniques generally performed using transmission electron microscopy (TEM) for nanomaterials using dynamical theory is presented. Methods disclosed may use a wide angle convergent beam electron diffraction for performing OIM by generating a diffraction pattern having at least three diffraction discs that may provide additional information that is not available otherwise.

摘要翻译： 介绍了使用动力学理论对纳米材料进行透射电子显微镜（TEM）的定向成像显微镜（OIM）技术。 所公开的方法可以使用广角收敛束电子衍射来通过产生具有至少三个衍射盘的衍射图来执行OIM，所述衍射图可以提供另外不可用的附加信息。

公开(公告)号：US20120298865A1

公开(公告)日：2012-11-29

申请号：US13522984

申请日：2011-01-21

申请人： Seiko Omori ,  Junichi Tanaka ,  Yoshinori Nakayama ,  Keiichiro Hitomi

发明人： Seiko Omori ,  Junichi Tanaka ,  Yoshinori Nakayama ,  Keiichiro Hitomi

IPC分类号： H01J37/26

CPC分类号： G03F7/70625 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/1536 ,  H01J2237/226 ,  H01J2237/24571 ,  H01J2237/2809 ,  H01J2237/2817

摘要： Disclosed is a scanning electron microscope provided with a calculation device (403) for measuring the dimension of a pattern on a sample (413), characterized in that the amount of change of a pattern shape, caused by electron beam irradiation, is calculated and stored, and a pattern shape contour (614; 815; 1512) before the sample is irradiated with an electron beam is restored from a pattern shape contour (613; 814; 1511) in a scanning electron microscope image (612; 813; 1510) after the sample is irradiated with an electron beam using the calculated amount and, then, the pattern shape contour (614; 815; 1512) is displayed. Thus, the shrinking of a resist and/or the effect of electrostatic charge caused when a sample is irradiated with an electron beam are eliminated, so that the shape contour of a two-dimensional pattern before irradiating an electron beam can be restored with a high degree of accuracy, and the dimension of a pattern can be measured with a high degree of accuracy, using the restored image.

摘要翻译： 公开了一种具有用于测量样品（413）上的图案的尺寸的计算装置（403）的扫描电子显微镜，其特征在于，计算并存储由电子束照射引起的图案形状的变化量 在扫描电子显微镜图像（612; 813; 1510）中从扫描电子显微镜图像（612; 813; 1510）中的图案形状轮廓（613; 814; 1511）恢复在用电子束照射样品之前的图案形状轮廓（614; 815; 1512） 使用计算量用电子束照射样品，然后显示图案形状轮廓（614; 815; 1512）。 因此，消除了当用电子束照射样品时引起的抗蚀剂收缩和/或静电电荷的影响，从而能够以高的电压恢复照射电子束之前的二维图案的形状轮廓 使用恢复的图像，可以高精度地测量图案的精度和尺寸。