Dual wavelength method of determining a relative position of a substrate and a template
    6.
    发明申请
    Dual wavelength method of determining a relative position of a substrate and a template 失效
    确定衬底和模板的相对位置的双波长方法

    公开(公告)号:US20040209177A1

    公开(公告)日:2004-10-21

    申请号:US10843195

    申请日:2004-05-11

    摘要: The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template.

    摘要翻译: 本发明包括一种确定基板与其间隔开的模板的相对位置的方法,该基板具有设置在其上的基板对准标记,该模板具有设置在其上的模板对准标记,该方法包括:将第一和第二通量 照亮基板和模板对准标记,其中基板和模板对准标记响应于限定第一响应的第一光束,并且响应于限定与第一响应不同的第二响应的第二光束响应; 以及处理第一和第二响应以在公共平面上形成基板和模板对准标记的聚焦图像,聚焦图像指示基板和模板的相对位置。