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公开(公告)号:US10239982B2
公开(公告)日:2019-03-26
申请号:US15439604
申请日:2017-02-22
发明人: Carlton Grant Willson , Gregory Blachut , Michael Maher , Yusuke Asano , Christopher John Ellison
IPC分类号: C08F297/00 , B32B5/16 , B05D3/10 , B05D7/26 , B05D7/00 , C09D153/00 , G03F7/00 , H01L21/027 , B82Y40/00
摘要: The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.
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公开(公告)号:US20170240681A1
公开(公告)日:2017-08-24
申请号:US15439604
申请日:2017-02-22
发明人: Carlton Grant Willson , Gregory Blachut , Michael Maher , Yusuke Asano , Christopher John Ellison
IPC分类号: C08F297/00 , B05D7/00 , H01L21/027 , B05D7/26 , G03F7/00 , C09D153/00 , B05D3/10
CPC分类号: C08F297/00 , B05D3/108 , B05D7/26 , B05D7/542 , B81C2201/0149 , B82Y40/00 , C09D153/00 , G03F7/0002 , H01L21/0271
摘要: The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.
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