公开(公告)号：US20070000527A1

公开(公告)日：2007-01-04

申请号：US11172162

申请日：2005-06-30

申请人： Brian Aegerter ,  Daniel Woodruff ,  Coby Grove ,  Gregory Wilson

发明人： Brian Aegerter ,  Daniel Woodruff ,  Coby Grove ,  Gregory Wilson

IPC分类号： B08B3/00

CPC分类号： H01L21/68728 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67751 ,  H01L21/68785

摘要： A workpiece support apparatus for use in a process vessel and process system for treating semiconductor workpieces. The process vessel is to be utilized in an integrated tool for wet chemical treatment of a semiconductor workpiece. The workpiece support apparatus includes a rotor having a central cavity and guide pins mounted at an outer perimeter. A workpiece support having extendable workpiece support fingers is connected to the rotor. The extendable workpiece support fingers are moveable from a first position to a second position. A bellows seal connects the workpiece support to the rotor. A fluid delivery tube is positioned in the central cavity of the rotor and connected to a supply of fluid. When the extendable workpiece support fingers are in the first position, the guide pins of the rotor cannot interfere with the loading of a workpiece onto the extendable workpiece support fingers, and when the extendable workpiece support fingers are in the second position, a pressurized fluid is delivered through the delivery tube to create a low pressure region adjacent an inner surface of the workpiece, lifting the workpiece off the extendable workpiece support fingers, exposing the entire backside of the workpiece for processing.

摘要翻译： 用于处理容器的工件支撑装置和用于处理半导体工件的处理系统。 该处理容器用于半导体工件的湿化学处理的集成工具中。 工件支撑装置包括具有安装在外周的中心腔和导销的转子。 具有可延伸的工件支撑指的工件支撑件连接到转子。 可伸展工件支撑指可从第一位置移动到第二位置。 波纹管密封将工件支撑件连接到转子。 流体输送管定位在转子的中心空腔中并连接到流体供应源。 当可延伸的工件支撑指状件处于第一位置时，转子的引导销不会干扰工件对可延伸的工件支撑指的加载，并且当可延伸的工件支撑指状件处于第二位置时，加压流体是 通过输送管输送以产生邻近工件的内表面的低压区域，将工件从可延伸的工件支撑指状物上提起，暴露工件的整个背面进行处理。

公开(公告)号：US06930046B2

公开(公告)日：2005-08-16

申请号：US10690864

申请日：2003-10-21

申请人： Kyle M. Hanson ,  Eric Lund ,  Coby Grove ,  Steven L. Peace ,  Paul Z. Wirth ,  Scott A. Bruner ,  Jonathan Kuntz

发明人： Kyle M. Hanson ,  Eric Lund ,  Coby Grove ,  Steven L. Peace ,  Paul Z. Wirth ,  Scott A. Bruner ,  Jonathan Kuntz

IPC分类号： H01L21/00 ,  H01L21/3213 ,  H01L21/311

CPC分类号： H01L21/6715 ,  H01L21/32134 ,  H01L21/67017 ,  Y10S438/906 ,  Y10S438/907 ,  Y10S438/913

摘要： A system and method for processing a workpiece, includes workpiece processors. A robot is moveable within an enclosure to load and unload workpieces into and out of the processors. A processor includes an upper rotor having a central air flow opening. The upper rotor is magnetically driven into engagement with a lower rotor to form a workpiece processing chamber. A moveable drain mechanism aligns different drain paths with the processing chamber so that different processing fluids may be removed from the processing chamber via different drain paths. A moveable nozzle positioned in the air flow opening distributes processing fluid to the workpiece. The processing fluid is distributed across the workpiece surface, via centrifugal force generated by spinning the processing chamber, and removed from the processing chamber via the moveable drain mechanism.

摘要翻译： 用于处理工件的系统和方法包括工件处理器。 机器人可以在机箱内移动，以将工件加载和卸载进出处理器。 处理器包括具有中心气流开口的上转子。 上转子被磁力驱动与下转子接合以形成工件处理室。 可移动排水机构使不同的排放路径与处理室对准，使得不同的处理流体可以经由不同的排出路径从处理室移除。 位于空气流通口中的可移动喷嘴将处理流体分配到工件。 处理液通过旋转处理室产生的离心力分布在工件表面上，并通过可移动的排水机构从处理室中移出。